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1. 发明申请

US20130017376A1 NEGATIVE RESIST COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING THE SAME, AND ELECTRONIC COMPONENT USING THE SAME 有权
标题翻译：负极性组合物，使用其的产生缓冲图案的方法和使用其的电子元件
公开(公告)号：US20130017376A1
公开(公告)日：2013-01-17
申请号：US13637101
申请日：2011-03-24
申请人： Kenichi Okuyama , Satoru Kanke
发明人： Kenichi Okuyama , Satoru Kanke
IPC分类号： G03F7/004 , B32B3/10 , G03F7/20
CPC分类号： G03F7/0382 , G03F7/038 , Y10T428/24802
摘要： An object of the present invention is to provide a negative resin composition which can produce a pattern with high sensitivity, high resolution and low line edge roughness in pattern formation by exposure to electron beams or EUV, a method for producing a relief pattern and an electronic component using the negative resist composition.Disclosed is a negative resist composition comprising a phenolic compound (A) which has: two or more phenolic hydroxyl groups per molecule; one or more substituents of one or more kinds selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group per molecule in the ortho-position of any of the phenolic hydroxyl groups; and a molecular weight of 400 to 2,500, wherein the content of the phenolic compound (A) is 70% by weight or more of the total solid content of the negative resist composition.
摘要翻译：本发明的目的是提供一种负型树脂组合物，它可以通过暴露于电子束或EUV而产生图案形成中具有高灵敏度，高分辨率和低线边缘粗糙度的图案，制造浮雕图案的方法和电子使用负光刻胶组合物的组分。公开了一种负性抗蚀剂组合物，其包含酚类化合物（A），其每分子具有两个或更多个酚羟基; 一个或多个选自羟基甲基和烷氧基甲基中的一种或多种在任何酚羟基的邻位的取代基; 分子量为400〜2,500，其中酚类化合物（A）的含量为负性抗蚀剂组合物的总固体成分的70重量％以上。

2. 发明授权

US08198007B2 Negative-working resist composition and pattern forming method using the same 有权
标题翻译：负性抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US08198007B2
公开(公告)日：2012-06-12
申请号：US12741246
申请日：2008-11-05
申请人： Kenichi Okuyama , Satoru Kanke
发明人： Kenichi Okuyama , Satoru Kanke
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0382
摘要： This disclosure provides a negative-working resist composition comprising a calix resorcinarene derivative (A) of specific structure, an acid generator (B) which directly or indirectly generates an acid when exposed to an active energy ray having a wavelength of 248 nm or less, and a cross-linking agent (C).
摘要翻译：该公开内容提供了一种负性抗蚀剂组合物，其包含特定结构的杯状间苯二酚衍生物（A），当暴露于波长为248nm或更小的活性能量射线时直接或间接产生酸的酸产生剂（B）和交联剂（C）。

3. 发明授权

US09651864B2 Negative resist composition, method for producing relief pattern using the same, and electronic component using the same 有权
公开(公告)号：US09651864B2
公开(公告)日：2017-05-16
申请号：US13637101
申请日：2011-03-24
申请人： Kenichi Okuyama , Satoru Kanke
发明人： Kenichi Okuyama , Satoru Kanke
IPC分类号： G03F7/004 , B32B3/10 , G03F7/20 , G03F7/038
CPC分类号： G03F7/0382 , G03F7/038 , Y10T428/24802
摘要： An object of the present invention is to provide a negative resin composition which can produce a pattern with high sensitivity, high resolution and low line edge roughness in pattern formation by exposure to electron beams or EUV, a method for producing a relief pattern and an electronic component using the negative resist composition.Disclosed is a negative resist composition comprising a phenolic compound (A) which has: two or more phenolic hydroxyl groups per molecule; one or more substituents of one or more kinds selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group per molecule in the ortho-position of any of the phenolic hydroxyl groups; and a molecular weight of 400 to 2,500, wherein the content of the phenolic compound (A) is 70% by weight or more of the total solid content of the negative resist composition.

4. 发明申请

US20100239980A1 NEGATIVE-WORKING RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
标题翻译：负极工作组合物和使用其的图案形成方法
公开(公告)号：US20100239980A1
公开(公告)日：2010-09-23
申请号：US12741246
申请日：2008-11-05
申请人： Kenichi Okuyama , Satoru Kanke
发明人： Kenichi Okuyama , Satoru Kanke
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0382
摘要： The object of the present invention is to provide a negative-working resist composition that forms a well-shaped pattern with no decrease in resolution at high sensitivity, and a pattern forming method using the negative-working resist composition.This object has been achieved by a negative-working resist composition comprising a calix resorcinarene derivative (A) of specific structure, an acid generator (B) which directly or indirectly generates an acid when exposed to an active energy ray having a wavelength of 248 nm or less, and a cross-linking agent (C).
摘要翻译：本发明的目的是提供一种在高灵敏度下分辨率不降低的情况下形成良好形状的图案的负性抗蚀剂组合物，以及使用负性抗蚀剂组合物的图案形成方法。该目的已经通过含有特定结构的杯状间苯二酚衍生物（A）的负性抗蚀剂组合物，当暴露于波长为248nm的活性能量射线时直接或间接产生酸的酸产生剂（B）或更少，和交联剂（C）。

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