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1. 发明授权

US08470519B2 Method for removing photoresist pattern 失效
标题翻译：去除光刻胶图案的方法
公开(公告)号：US08470519B2
公开(公告)日：2013-06-25
申请号：US13024678
申请日：2011-02-10
申请人： Dong-Jin Byun , Sam-Seok Jang , Bum-Joon Kim , Jung-Geun Jhin , Sang-Il Kim , Do-Han Lee
发明人： Dong-Jin Byun , Sam-Seok Jang , Bum-Joon Kim , Jung-Geun Jhin , Sang-Il Kim , Do-Han Lee
IPC分类号： G03F7/36
CPC分类号： G03F7/42
摘要： Disclosed is a method of removing a photoresist pattern, which includes radiating light onto a substrate having a photoresist pattern formed thereon and implanted with a predetermined dopant so that the temperature of the substrate is increased to be equal to or higher than a temperature able to remove the photoresist pattern, and by which the photoresist pattern formed on the substrate can be almost completely removed using a simple process for radiating light onto the substrate so that the temperature of the substrate is increased to be equal to or higher than a temperature able to the photoresist pattern.
摘要翻译：公开了去除光致抗蚀剂图案的方法，其包括将光照射到其上形成有光刻胶图案的基板上并注入预定的掺杂剂，使得基板的温度升高至等于或高于能够去除的温度光致抗蚀剂图案，并且通过使用用于将光照射到基板上的简单工艺几乎可以完全去除在基板上形成的光致抗蚀剂图案，使得基板的温度升高到等于或高于能够光刻胶图案。

2. 发明申请

US20110200951A1 METHOD FOR REMOVING PHOTORESIST PATTERN 失效
标题翻译：去除光电子图案的方法
公开(公告)号：US20110200951A1
公开(公告)日：2011-08-18
申请号：US13024678
申请日：2011-02-10
申请人： Dong-Jin Byun , Sam-Seok Jang , Bum-Joon Kim , Jung-Geun Jhin , Sang-Il Kim , Do-Han Lee
发明人： Dong-Jin Byun , Sam-Seok Jang , Bum-Joon Kim , Jung-Geun Jhin , Sang-Il Kim , Do-Han Lee
IPC分类号： G03F7/00
CPC分类号： G03F7/42
摘要： Disclosed is a method of removing a photoresist pattern, which includes radiating light onto a substrate having a photoresist pattern formed thereon and implanted with a predetermined dopant so that the temperature of the substrate is increased to be equal to or higher than a temperature able to remove the photoresist pattern, and by which the photoresist pattern formed on the substrate can be almost completely removed using a simple process for radiating light onto the substrate so that the temperature of the substrate is increased to be equal to or higher than a temperature able to the photoresist pattern.
摘要翻译：公开了去除光致抗蚀剂图案的方法，其包括将光照射到其上形成有光刻胶图案的基板上并注入预定的掺杂剂，使得基板的温度升高至等于或高于能够去除的温度光致抗蚀剂图案，并且通过使用用于将光照射到基板上的简单工艺几乎可以完全去除在基板上形成的光致抗蚀剂图案，使得基板的温度升高到等于或高于能够光刻胶图案。

3. 发明申请

US20090300879A1 DOOR STOPPER FOR VEHICLES 审中-公开
标题翻译：车门停车
公开(公告)号：US20090300879A1
公开(公告)日：2009-12-10
申请号：US12336438
申请日：2008-12-16
申请人： Sam Seok JANG
发明人： Sam Seok JANG
IPC分类号： E05F5/00
CPC分类号： E05F7/005 , E05Y2900/531 , Y10T16/61
摘要： A door stopper for a vehicle may include a male stopper mounted to a vehicle body and having an insert end portion; a female stopper mounted to a vehicle door and having a receiving space therein with an opening so that the insert end portion of the male stopper is removably inserted into the receiving space through the opening; and a rotary slider rotatably provided in the receiving space of the female stopper such that the rotary slider is rotated by the insert end portion of the male stopper being inserted into the receiving space and thus a sidewall of the insert end portion is pushed by the rotary slider toward the female stopper.
摘要翻译：用于车辆的门挡件可以包括安装到车身并具有插入件端部的阳塞子; 安装在车门上并在其中具有开口的容纳空间的阴止动件，使得阳塞子的插入端部通过开口可移除地插入到容纳空间中; 以及旋转滑动件，其可旋转地设置在所述阴止动件的容纳空间中，使得所述旋转滑块通过插入所述容纳空间中的所述阳塞的插入端部旋转，因此所述插入端部的侧壁被所述旋转滑块朝向女性止动器。

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