会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明授权
    • Method for on the fly positioning and continuous monitoring of a substrate in a chamber
    • 用于在室中的基板的飞行定位和连续监测的方法
    • US07813832B2
    • 2010-10-12
    • US11923516
    • 2007-10-24
    • Satish Sundar
    • Satish Sundar
    • G06F7/00B65G49/07
    • H01L21/68707H01L21/681Y10S414/136
    • A method and apparatus for positioning a substrate in a substrate processing chamber. The method includes placing the substrate on a substrate transfer blade, moving the substrate transfer blade to a first position located in a transfer chamber, and capturing at least one image that includes at least a portion of the substrate transfer blade and at least a portion of the substrate. The method also includes processing the image to determine a position of a predetermined portion of the substrate transfer blade and a position of predetermined portion of the substrate. The method further includes determining an offset between the position of the predetermined portion of the substrate transfer blade and the position of the predetermined portion of the substrate, and moving the substrate transfer blade to a second position located in the substrate processing chamber, wherein the second position is adjusted to account for the offset.
    • 一种用于将衬底定位在衬底处理室中的方法和装置。 该方法包括将衬底放置在衬底转移刀片上,将衬底转移刀片移动到位于转移腔室中的第一位置,以及捕获包括至少一部分衬底转移刀片的至少一个图像,以及至少一部分 底物。 该方法还包括处理图像以确定衬底转移刀片的预定部分的位置和衬底的预定部分的位置。 该方法还包括确定衬底转移刀片的预定部分的位置与衬底的预定部分的位置之间的偏移,以及将衬底转移刀片移动到位于衬底处理室中的第二位置,其中第二 位置被调整以考虑偏移量。
    • 8. 发明申请
    • METHOD AND APPARATUS FOR ON THE FLY POSITIONING AND CONTINUOUS MONITORING OF A SUBSTRATE IN A CHAMBER
    • 用于室内基板的飞行定位和连续监测的方法和装置
    • US20080077271A1
    • 2008-03-27
    • US11923516
    • 2007-10-24
    • Satish Sundar
    • Satish Sundar
    • G06F19/00
    • H01L21/68707H01L21/681Y10S414/136
    • A method and apparatus for positioning a substrate in a substrate processing chamber. The method includes placing the substrate on a substrate transfer blade, moving the substrate transfer blade to a first position located in a transfer chamber, and capturing at least one image that includes at least a portion of the substrate transfer blade and at least a portion of the substrate. The method also includes processing the image to determine a position of a predetermined portion of the substrate transfer blade and a position of predetermined portion of the substrate. The method further includes determining an offset between the position of the predetermined portion of the substrate transfer blade and the position of the predetermined portion of the substrate, and moving the substrate transfer blade to a second position located in the substrate processing chamber, wherein the second position is adjusted to account for the offset.
    • 一种用于将衬底定位在衬底处理室中的方法和装置。 该方法包括将衬底放置在衬底转移刀片上,将衬底转移刀片移动到位于转移腔室中的第一位置,以及捕获包括至少一部分衬底转移刀片的至少一个图像,以及至少一部分 底物。 该方法还包括处理图像以确定衬底转移刀片的预定部分的位置和衬底的预定部分的位置。 该方法还包括确定衬底转移刀片的预定部分的位置与衬底的预定部分的位置之间的偏移,以及将衬底转移刀片移动到位于衬底处理室中的第二位置,其中第二 位置被调整以考虑偏移量。