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    • 1. 发明授权
    • Photocatalyst
    • 光催化剂
    • US06743749B2
    • 2004-06-01
    • US10181918
    • 2002-07-26
    • Takeshi MorikawaTakahiro ShigaRyoji AsahiTakeshi OhwakiYasunori Taga
    • Takeshi MorikawaTakahiro ShigaRyoji AsahiTakeshi OhwakiYasunori Taga
    • B01J2300
    • B01J21/063B01J21/06B01J23/26B01J27/24B01J35/002B01J35/004B01J37/347
    • A Ti—O—N film is formed on an SiO2 substrate by sputtering. For example, TiO2 is used as a target and nitrogen gas is introduced into the atmosphere. Crystallization is carried out by a post-sputtering heat treatment. Then a charge separation material such as Pt is supported on the Ti—O—N film. With the fabricated TiO2 crystals, the Ti—O—N film containing nitrogen exhibits a good catalytic reaction by using visible light as acting light. Since the charge separation material captures electrons or positive holes, recombination of electrons and positive holes is effectively prevented, and consequently more efficient photocatalytic reaction is performed. It is preferable to form a photocatalyst material film (Ti—Cr—O—N film) by sputtering the SiO2 substrate by use of TiO2 and Cr as the target in a nitrogen atmosphere. Crystallization is performed by a post-sputtering heat treatment.
    • 通过溅射在SiO 2衬底上形成Ti-O-N膜。 例如,将TiO 2用作靶,将氮气引入大气中。 通过后溅射热处理进行结晶。 然后在Ti-O-N膜上负载诸如Pt的电荷分离材料。 通过制备的TiO 2晶体,通过使用可见光作为光,含氮的Ti-O-N膜表现出良好的催化反应。 由于电荷分离材料捕获电子或正空穴,因此有效地防止电子和空穴的复合,因此进行更有效的光催化反应。 优选通过在氮气气氛中通过使用TiO 2和Cr作为靶来溅射SiO 2基板来形成光催化剂材料膜(Ti-Cr-O-N膜)。 通过后溅射热处理进行结晶。