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1. 发明授权

US06246053B1 Non-contact autofocus height detector for lithography systems 失效
标题翻译：用于光刻系统的非接触自动对焦高度检测器
公开(公告)号：US06246053B1
公开(公告)日：2001-06-12
申请号：US09273785
申请日：1999-03-22
申请人： Rodney Arthur Kendall , Gary J. Johnson , David J. Pinckney
发明人： Rodney Arthur Kendall , Gary J. Johnson , David J. Pinckney
IPC分类号： H01J27304
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F9/703 , G03F9/7053 , H01J37/304 , H01J2237/21 , H01J2237/3175
摘要： In a particle beam lithography system, focus adjustment is controlled by a measurement of the gap between the workpiece being processed and a reference surface, such as the bottom surface of the focus lens, using a pair of capacitive sensors mounted on an arm that rotates to place one sensor on the beam axis to measure the workpiece height and the other displaced from the beam aperture to measure the height of the reference surface. The sum of the two readings is constant (for a given gap dimension), so that the accuracy of the measurement is not affected by the position of the arm within the gap.
摘要翻译：在粒子束光刻系统中，通过使用安装在臂上的一对电容传感器来测量被处理的工件之间的间隙和诸如焦点透镜的底面的参考表面之间的间隙来控制焦点调节。将一个传感器放置在光束轴上以测量工件高度，另一个传感器从光束孔径移位，以测量参考表面的高度。两个读数的总和是恒定的（对于给定的间隙尺寸），使得测量的精度不受臂在间隙内的位置的影响。

2. 发明授权

US06353231B1 Pinhole detector for electron intensity distribution 失效
标题翻译：针孔检测器用于电子强度分布
公开(公告)号：US06353231B1
公开(公告)日：2002-03-05
申请号：US09143999
申请日：1998-08-31
申请人： Steven Douglas Golladay , Rodney Arthur Kendall , Michael Stuart Gordon , Carl Emil Bohnenkamp
发明人： Steven Douglas Golladay , Rodney Arthur Kendall , Michael Stuart Gordon , Carl Emil Bohnenkamp
IPC分类号： H01J37304
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/244 , H01J2237/30433
摘要： An instrument for measurement of illumination intensity distribution of an Electron Beam Projection System (EBPS) comprises a reticle with a clear subfield, a pinhole plate comprising a block of a low atomic number material with a high aspect ratio pinhole therethrough, the pinhole plate being positioned at the image plane of the EBPS. Means is provided for detecting electrons passing through the pinhole, and means is provided for moving, scanning, the pinhole with respect to a fixed electron intensity distribution or scanning the electron intensity distribution with respect to pinhole when held in a fixed position.

3. 发明授权

US06153885A Toroidal charged particle deflector with high mechanical stability and accuracy 有权
标题翻译：环形带电粒子偏转器具有高机械稳定性和精度
公开(公告)号：US06153885A
公开(公告)日：2000-11-28
申请号：US324899
申请日：1999-06-03
申请人： Rodney Arthur Kendall
发明人： Rodney Arthur Kendall
IPC分类号： G03F7/20 , H01J37/147 , H01J37/305 , H01J49/20 , H01L21/027
CPC分类号： H01J49/20
摘要： A semiconductor manufacturing tool for charged particle lithography systems such as an EBPS comprises a magnetic deflector with a hub comprising a cylinder mounted on flange. The hub has an opening for a particle beam. Grooves on the surface of the flange at the base of the cylinder and slots in the edge of the cylinder support several deflection coil vanes. Each of the vanes is formed of substrate comprising a thin plate which has a left surface and a right surface. Complementary electrical coils are wound as a planar spirals on the left surface and on the right surface of the vanes with a via connection through the plate interconnecting the coils. The series connected, spiral coils are patterned as mirror images so that the magnetic fields from the coils are additive. To accommodate vanes carrying large currents, the plate is quartz and complementary copper conductor spirals are bonded to the sides of the quartz plate.
摘要翻译：用于带电粒子光刻系统（例如EBPS）的半导体制造工具包括具有包括安装在凸缘上的圆筒的轮毂的磁偏转器。轮毂具有用于粒子束的开口。在圆柱体底部的法兰表面上的凹槽和圆柱体边缘中的槽支撑多个偏转线圈叶片。每个叶片由包括具有左表面和右表面的薄板的基板形成。互补电线圈在叶片的左表面和右表面上作为平面螺旋缠绕，通过连接线圈的板的通孔连接。串联连接，螺旋线圈被图案化为镜像，使得来自线圈的磁场是相加的。为了容纳承载大电流的叶片，板是石英，互补的铜导体螺旋结合到石英板的侧面。

4. 发明授权

US5742065A Heater for membrane mask in an electron-beam lithography system 失效
标题翻译：电子束光刻系统中的膜掩模加热器
公开(公告)号：US5742065A
公开(公告)日：1998-04-21
申请号：US787069
申请日：1997-01-22
申请人： Michael Stuart Gordon , Rodney Arthur Kendall , David John Pinckney , James Louis Speidell
发明人： Michael Stuart Gordon , Rodney Arthur Kendall , David John Pinckney , James Louis Speidell
IPC分类号： G21K5/04 , G03F1/20 , G03F1/22 , H01J37/09 , H01L21/027 , H01J31/08
CPC分类号： G03F1/20 , G03F1/22 , H01J37/09 , H01J2237/022 , H01J2237/0453 , H01J2237/3175
摘要： A method for reducing contamination in a silicon membrane mask in a lithography system is described. The method includes: doping the top surface of the silicon membrane mask with boron to lower the electrical resistance of the mask; subsequently metalizing the surface of the mask to further lower its electrical resistance; and, finally, applying a voltage between opposite surfaces of the mask, the voltage generating an electric field that passes through the membrane mask, heating the membrane mask. The method further includes: calculating distortions in the shape of each of the patterns within the mask caused by heating the membrane mask; compensating for the proximity of other shapes positioned in the vicinity of each of the patterns; and appropriately modifying the shape of each of the patterns. The above described method can be equally applied to an e-beam system or to an ion-beam lithography system, and both, to stencil masks and to scattering masks.
摘要翻译：描述了一种在光刻系统中减少硅膜掩模中污染的方法。该方法包括：用硼掺杂硅膜掩模的顶表面以降低掩模的电阻; 随后金属化掩模的表面以进一步降低其电阻; 并且最后，在掩模的相对表面之间施加电压，产生通过膜掩模的电场的电压，加热膜掩模。该方法还包括：通过加热膜掩模来计算掩模内的每个图案的形状的变形; 补偿位于每个图案附近的其它形状的接近; 并适当地修改每个图案的形状。上述方法可以同样地应用于电子束系统或离子束光刻系统，并且可以应用于模板掩模和散射掩模。

5. 发明授权

US06252339B1 Removable bombardment filament-module for electron beam projection systems 失效
标题翻译：用于电子束投影系统的可拆卸轰击灯丝组件
公开(公告)号：US06252339B1
公开(公告)日：2001-06-26
申请号：US09156544
申请日：1998-09-17
申请人： Rodney Arthur Kendall
发明人： Rodney Arthur Kendall
IPC分类号： H01J100
CPC分类号： H01J5/52 , H01J9/50 , H01J37/248 , Y02W30/828
摘要： This method and apparatus permit installing and removing an electron beam generating element comprising a filament or a cathode in a rapidly replaceable module. The apparatus is an electron gun system having an electron gun enclosure, a feed-through element extending through the electron gun enclosure, an electron beam generating element housed within a filament module housing and connected to the feed-through element, an electron gun column and a connector port in the gun enclosure for direct removal and replacement of the filament. The feed-through element and the filament module housing are removed, through the connector port, from the gun enclosure and then the filament is removed and replaced. A load-lock is provided above the connector port to avoid venting into the gun. A bellows can be used to facilitate removal of the gun with minimal exposure to ambient atmospheric gases.
摘要翻译：该方法和装置允许在可快速更换的模块中安装和去除包括灯丝或阴极的电子束产生元件。该装置是具有电子枪外壳的电子枪系统，延伸穿过电子枪外壳的馈通元件，容纳在灯丝模组外壳内并连接到馈通元件的电子束产生元件，电子枪柱和枪壳中的连接器端口用于直接移除和更换灯丝。穿通元件和灯丝模块外壳通过连接器端口从枪壳中移除，然后将灯丝拆下并更换。在连接器端口上方设有一个装载锁，以避免排放到枪内。可以使用波纹管，以最小限度地暴露于环境大气中的气体去除喷枪。

6. 发明授权

US06437347B1 Target locking system for electron beam lithography 失效
标题翻译：用于电子束光刻的目标锁定系统
公开(公告)号：US06437347B1
公开(公告)日：2002-08-20
申请号：US09290785
申请日：1999-04-13
申请人： John George Hartley , Rodney Arthur Kendall
发明人： John George Hartley , Rodney Arthur Kendall
IPC分类号： H01J37304
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J2237/31754 , H01J2237/31766 , Y10S977/887
摘要： An e-beam lithographic system capable of in situ registration. The system has an optics section such as a VAIL lens. A controllable stage moves a substrate with respect to the beam axis to place substrate writing fields beneath the beam. A field locking target between the optics section and the stage has an aperture sized to permit the beam to write a target field on the substrate. The field locking target includes alignment or registration marks around the aperture. A differential interferometric system measures the relative positions of the field locking target and the stage and controls stage position. The beam patterns the substrate on a field by field basis. As the stage is moving into position for each field, the beam is swept until it hits the alignment marks, thereby checking system alignment. The beam control data, i.e., coil currents necessary to hit the marks are stored, and drift correction values calculated from the beam control data. Meanwhile, pattern beam control is compensated by the drift correction values.
摘要翻译：一种能够进行原位配准的电子束光刻系统。该系统具有诸如VAIL透镜的光学部分。可控阶段相对于光束轴移动衬底，以将衬底写入字段放置在光束下方。在光学部分和舞台之间的场锁定目标具有一个孔径，其尺寸允许光束在基底上写入目标场。场锁定目标包括孔周围的对准或对准标记。差分干涉测量系统测量场锁定目标和平台的相对位置并控制舞台位置。光束以场为单位对基板进行图案化。当舞台正在移动到每个场的位置时，梁被扫掠直到它撞到对准标记，从而检查系统对准。存储光束控制数据，即击中标记所需的线圈电流，以及从光束控制数据计算的漂移校正值。同时，模式波束控制由漂移校正值补偿。

7. 发明授权

US6053241A Cooling method and apparatus for charged particle lenses and deflectors 有权
标题翻译：带电粒子透镜和偏转器的冷却方法和装置
公开(公告)号：US6053241A
公开(公告)日：2000-04-25
申请号：US156007
申请日：1998-09-17
申请人： Rodney Arthur Kendall
发明人： Rodney Arthur Kendall
IPC分类号： H01J37/24 , F28F13/00 , G02B7/18 , G03F7/20 , H01J37/141 , H01J37/147 , H01L21/027 , F28D15/00
CPC分类号： H01J37/147 , F28F13/00 , G02B7/1815 , H01J37/141 , H01J2237/002
摘要： A method of cooling a deflection system for a particle beam, containing vibration sensitive deflection devices comprises providing a vibrating cooled heat exchange structure spaced away from the vibration sensitive deflection devices. The technique used is transmission of the heat away from the vibration sensitive devices to the heat exchange structure through a high thermal conductivity structure such as a cold plate. The heat is transmitted from a static heat exchange structure with a static, inert fluid through cold plates to a vibrating heat exchanger cooled by turbulent liquid passing through a cooling coil in the heat exchanger.
摘要翻译：一种冷却包含振动敏感偏转装置的粒子束偏转系统的方法包括提供与振动敏感偏转装置间隔开的振动冷却热交换结构。所使用的技术是通过诸如冷板的高导热性结构将热量从振动敏感装置传递到热交换结构。热量由具有静态惰性流体的静态热交换结构通过冷板传递到由通过热交换器中的冷却盘管的湍流液体冷却的振动热交换器。

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