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1. 发明授权

US07126699B1 Systems and methods for multi-dimensional metrology and/or inspection of a specimen 有权
标题翻译：用于多维计量和/或检验样本的系统和方法
公开(公告)号：US07126699B1
公开(公告)日：2006-10-24
申请号：US10688503
申请日：2003-10-17
申请人： Tim Wihl , Stephen Hiebert , Frank Kole , Richard Schmidley
发明人： Tim Wihl , Stephen Hiebert , Frank Kole , Richard Schmidley
IPC分类号： G01B11/02
CPC分类号： G01B11/0608 , G01N21/9501
摘要： Systems and methods for multi-dimensional metrology and inspection of a specimen such as a bumped wafer are provided. One method includes scanning the specimen with partial oblique illumination to form an image of the structure, either through the normal collection angle or through an oblique collection angle. The method also includes integrating an intensity of the image and determining a height of the structure from the integrated intensity. The integrated intensity may be approximately proportional or inversely proportional to the height of the structure. In addition, the method may include scanning the specimen with bright field illumination to form a bright field image of the specimen. The method may also include determining a lateral dimension of the structure from the bright field image. Furthermore, the method may include detecting defects on the specimen from the bright field image or the obliquely-illuminated image.
摘要翻译：提供了诸如凸起晶片之类的样本的多维计量和检查的系统和方法。一种方法包括用部分倾斜照射扫描样品，以通过正常收集角度或通过倾斜收集角度形成结构图像。该方法还包括整合图像的强度并根据积分强度确定结构的高度。积分强度可以与结构的高度大致成比例或成反比。此外，该方法可以包括用亮场照明扫描样品以形成样品的明场图像。该方法还可以包括从亮场图像确定结构的横向尺寸。此外，该方法可以包括从亮场图像或倾斜照明图像检测样本上的缺陷。

2. 发明授权

US06917421B1 Systems and methods for multi-dimensional inspection and/or metrology of a specimen 有权
标题翻译：用于样本的多维检查和/或计量的系统和方法
公开(公告)号：US06917421B1
公开(公告)日：2005-07-12
申请号：US10266333
申请日：2002-10-08
申请人： Tim Wihl , Stephen Hiebert , Richard Schmidley
发明人： Tim Wihl , Stephen Hiebert , Richard Schmidley
IPC分类号： G01B11/06 , G01N21/00 , G01N21/95
CPC分类号： G01N21/9501 , G01B11/0608
摘要： Systems and methods for assessing a dimension of a feature on a specimen are provided. A system may include an illumination system configured to scan the specimen with light at multiple focal planes substantially simultaneously. The system may also include a collection system that may include multiple collectors. Approximately all light returned from one of the multiple focal planes may be collected by one of the multiple collectors. In addition, the system may include a processor configured to determine a relative intensity of the collected light. The processor may also be configured to assess a dimension of the feature on the specimen in a direction substantially perpendicular to an upper surface of the specimen using the relative intensity.
摘要翻译：提供了用于评估试样上特征尺寸的系统和方法。系统可以包括被配置为基本上同时在多个焦平面上用光扫描样本的照明系统。系统还可以包括可以包括多个收集器的收集系统。从多个焦平面中的一个返回的大致的所有光可以由多个收集器之一收集。另外，该系统可以包括被配置为确定所收集的光的相对强度的处理器。处理器还可以被配置为使用相对强度来评估样本上的特征在基本上垂直于样品的上表面的方向上的尺寸。

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