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1. 发明申请

US20070299702A1 Implement IT service management processes 审中-公开
标题翻译：实施IT服务管理流程
公开(公告)号：US20070299702A1
公开(公告)日：2007-12-27
申请号：US11472451
申请日：2006-06-22
申请人： Roxanne R. Rigdon , Jennifer L. Hartsock , Ronald S. Owdom , Richard D. Getz , Richard E. Munge
发明人： Roxanne R. Rigdon , Jennifer L. Hartsock , Ronald S. Owdom , Richard D. Getz , Richard E. Munge
IPC分类号： G06F17/50
CPC分类号： G06Q10/10 , G06Q10/06315
摘要： Consistent with an aspect of the present disclosure, customer IT-related requests are used to identify and prioritize standardized IT processes, such as those specified in the ITIL. In particular, based on the customer requests and associated correlation values, defined customer requirements are ranked, and those with the highest ranking are assigned corresponding metrics. Based on the metrics and additional correlation values, standardized IT processes, such as ITIL sub-functions, are assigned priority values and ranked accordingly. Those IT processes having the highest rankings, i.e., those that are most closely aligned with the customer's requests, are preferentially carried out.
摘要翻译：根据本公开的一个方面，客户IT相关请求用于识别和标准化IT流程的优先级，例如ITIL中指定的那些。特别地，基于客户请求和相关联的相关值，定义的客户需求被排序，并且具有最高排名的那些被分配相应的度量。基于指标和附加相关值，标准化IT流程（如ITIL子功能）被分配优先级值并进行排名。优先执行具有最高排名的那些IT流程，即与客户的请求最接近的那些IT流程。

2. 发明授权

US06224726B1 Cathodic arc coating apparatus 有权
标题翻译：阴极电弧涂层设备
公开(公告)号：US06224726B1
公开(公告)日：2001-05-01
申请号：US09217714
申请日：1998-12-21
申请人： Russell A. Beers , Robert E. Hendricks , Richard D. Getz
发明人： Russell A. Beers , Robert E. Hendricks , Richard D. Getz
IPC分类号： C23C1432
CPC分类号： H01J37/32055 , H01J37/3266
摘要： An apparatus for applying material by cathodic arc vapor deposition to a substrate is provided which includes a vessel, a disk-shaped cathode, a platter for supporting the substrate, apparatus for maintaining a vacuum in the vessel, and apparatus for selectively sustaining an arc of electrical energy between the cathode and an anode. The disk-shaped cathode has a first end surface, a second end surface, and an evaporative surface extending between the first and second end surfaces, and the cathode is mounted on a pedestal positioned inside the vessel. The platter has a slot for receiving the pedestal, thereby enabling the platter to be movable into and out of the vessel.
摘要翻译：提供了一种通过阴极电弧气相沉积将材料施加到基底上的装置，其包括容器，盘形阴极，用于支撑基底的盘片，用于在容器中保持真空的装置，以及用于选择性地保持弧形的装置阴极和阳极之间的电能。盘形阴极具有第一端面，第二端面和在第一和第二端面之间延伸的蒸发表面，并且阴极安装在位于容器内部的基座上。盘片具有用于接收基座的槽，从而使得盘可以移入和移出容器。

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