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1. 发明申请

US20130160523A1 DEVICE AND USE OF THE DEVICE FOR MEASURING THE DENSITY AND/OR THE ELECTRON TEMPERATURE AND/OR THE COLLISION FREQUENCY OF A PLASMA 有权
标题翻译：用于测量等离子体和/或电子温度和/或等离子体的碰撞频率的装置的装置和用途
公开(公告)号：US20130160523A1
公开(公告)日：2013-06-27
申请号：US13821184
申请日：2011-10-06
申请人： Ralf Peter Brinkmann , Jens Oberrath , Peter Awakowicz , Martin Lapke , Thomas Musch , Thomas Mussenbrock , Ilona Rolfes , Christian Schulz , Robert Storch , Tim Styrnoll , Christian Zietz
发明人： Ralf Peter Brinkmann , Jens Oberrath , Peter Awakowicz , Martin Lapke , Thomas Musch , Thomas Mussenbrock , Ilona Rolfes , Christian Schulz , Robert Storch , Tim Styrnoll , Christian Zietz
IPC分类号： H05H1/00
CPC分类号： H05H1/0037 , H01P3/085 , H01P5/10 , H05H1/0012 , H05H1/0081
摘要： The invention relates to a device and method for measuring the density of a plasma by determining an impulse response to a high-frequency signal coupled into a plasma. The density, electron temperature and/or collision frequency as a function of the impulse response can be determined. A probe having a probe head and a probe shaft can be introduced into the plasma, wherein the probe shaft is connected to a signal generator for electrically coupling a high-frequency signal into the probe head. The probe core is enclosed by the jacket and has at its surface mutually insulated electrode areas of opposite polarity. A balun is arranged at the transition between the probe head and an electrically unbalanced high-frequency signal feed to convert electrically unbalanced signals into balanced signals.
摘要翻译：本发明涉及通过确定耦合到等离子体中的高频信号的脉冲响应来测量等离子体密度的装置和方法。可以确定作为脉冲响应的函数的密度，电子温度和/或碰撞频率。可以将具有探针头和探针轴的探头引入等离子体中，其中探针轴连接到信号发生器，用于将高频信号电耦合到探头中。探针芯由护套封闭，并在其表面具有相反极性的相互绝缘的电极区域。平衡 - 不平衡转换器设置在探针头和电气不平衡高频信号馈送之间的转换处，以将电不平衡信号转换为平衡信号。

2. 发明申请

US20110248634A1 METHOD FOR CONTROLLING ION ENERGY IN RADIO FREQUENCY PLASMAS 失效
标题翻译：用于控制无线电频率离子能量的方法
公开(公告)号：US20110248634A1
公开(公告)日：2011-10-13
申请号：US12864123
申请日：2008-07-11
申请人： Brian George Heil , Uwe Czarnetzki , Ralf Peter Brinkmann , Thomas Mussenbrock
发明人： Brian George Heil , Uwe Czarnetzki , Ralf Peter Brinkmann , Thomas Mussenbrock
IPC分类号： H05H1/46
CPC分类号： H01J37/04 , H01J37/32009 , H01J37/32091 , H01J37/32146 , H01J37/32165 , H01J37/32706
摘要： A method of establishing a DC bias in front of at least one electrode in a plasma operating apparatus by applying an RF voltage with at least two harmonic frequency components with a controlled relative phase between the components, where at least one of the higher frequency components is established as an even multiple of the lower frequency component.
摘要翻译：一种在等离子体操作装置中的至少一个电极前面建立直流偏压的方法，该方法是通过施加具有至少两个谐波频率分量的RF电压，所述至少两个谐波频率分量在组件之间具有受控的相对相位，其中至少一个较高频率分量是建立为低频分量的偶数倍。

3. 发明授权

US06524448B2 Configuration for the execution of a plasma based sputter process 有权
标题翻译：用于执行基于等离子体的溅射工艺的配置
公开(公告)号：US06524448B2
公开(公告)日：2003-02-25
申请号：US09832988
申请日：2001-04-11
申请人： Ralf-Peter Brinkmann , Alfred Kersch
发明人： Ralf-Peter Brinkmann , Alfred Kersch
IPC分类号： C23C1435
CPC分类号： H01J37/32623 , C23C14/351 , C23C16/50 , H01J37/3266
摘要： The present invention relates to a system for executing a plasma-based sputtering method, such as for example a PVD (Physical Vapor Deposition) method. In a process chamber (1), a plasma (2) is produced in order to accelerate ionized particles, carried away from a sputter target (21), through the plasma (2) towards a substrate (3), using an electrical field. In the process chamber (1), between the plasma (2) and the substrate (3) a magnetic field component (6) is produced by that is situated parallel to a substrate surface (5). Through the magnetic field component (6), the angular distribution of the ionized particles is deflected from its flight path perpendicular to the substrate surface, so that impact angles are produced that have a greater angular scattering.
摘要翻译：本发明涉及一种用于执行等离子体溅射方法的系统，例如PVD（物理气相沉积）方法。在处理室（1）中，产生等离子体（2），以便使用电场将离子化的颗粒从溅射靶（21）传送通过等离子体（2）朝基板（3）移动。在处理室（1）中，在等离子体（2）和衬底（3）之间，通过平行于衬底表面（5）的方式制造磁场分量（6）。通过磁场分量（6），电离粒子的角分布从垂直于衬底表面的飞行路径偏转，从而产生具有较大角度散射的冲击角。

4. 发明授权

US08643280B2 Method for controlling ion energy in radio frequency plasmas 失效
标题翻译：控制射频等离子体离子能量的方法
公开(公告)号：US08643280B2
公开(公告)日：2014-02-04
申请号：US12864123
申请日：2008-07-11
申请人： Brian George Heil , Uwe Czarnetzki , Ralf Peter Brinkmann , Thomas Mussenbrock
发明人： Brian George Heil , Uwe Czarnetzki , Ralf Peter Brinkmann , Thomas Mussenbrock
IPC分类号： H01J7/24 , H05B31/26 , H01J13/48 , H01J15/04 , H01J17/36 , H05B37/00 , H05B39/00 , H05B41/00
CPC分类号： H01J37/04 , H01J37/32009 , H01J37/32091 , H01J37/32146 , H01J37/32165 , H01J37/32706
摘要： A method of establishing a DC bias in front of at least one electrode in a plasma operating apparatus by applying an RF voltage with at least two harmonic frequency components with a controlled relative phase between the components, where at least one of the higher frequency components is established as an even multiple of the lower frequency component.
摘要翻译：一种在等离子体操作装置中在至少一个电极前面建立直流偏压的方法，该方法是通过施加具有至少两个谐波频率分量的RF电压，该至少两个谐波频率分量与组件之间具有受控的相对相位，其中至少一个较高频率分量为建立为低频分量的偶数倍。

5. 发明授权

US07878045B2 Apparatus and use of the apparatus for the determination of the density of a plasma 有权
标题翻译：用于确定等离子体密度的装置和用途
公开(公告)号：US07878045B2
公开(公告)日：2011-02-01
申请号：US12294322
申请日：2007-03-23
申请人： Ralf-Peter Brinkmann
发明人： Ralf-Peter Brinkmann
IPC分类号： G01N9/32
CPC分类号： H05H1/0037
摘要： Device for determining the density of a plasma, with of a probe (1) which can be immersed into the plasma, with a probe head (2) in form of a three-axis ellipsoid, and a handle (3) connected to the probe head (2), wherein the probe head (2) has a sheath (4) and a probe core (5, 5a) surrounded by the sheath (4), wherein the surface (8) of the probe core (5, 5a) has electrode areas (9, 10) of opposite polarity which are insulated from each other. The probe core consists of electrodes (6, 7), to which a signal is applied. The absorption of that signal is measured and evaluated as a function of the frequency. Based on a multipole expansion, a mathematical model is constructed with which the absorption spectrum of the probe can be unambiguously evaluated. For a particular design of the probe, the response can be restricted to a single resonance, from which the electron density of the plasma (to be inferred from the resonance frequency) can be found by an unambiguous evaluation algorithm.
摘要翻译：用于通过具有三轴椭圆形式的探针头（2）和可连接到探针的手柄（3），用可以浸入等离子体的探针（1）来确定等离子体的密度的装置头部（2），其中所述探针头（2）具有护套（4）和由所述护套（4）围绕的探针芯部（5,5a），其中所述探针芯部（5,5a）的所述表面（8）具有彼此绝缘的相反极性的电极区域（9,10）。探针芯由施加信号的电极（6,7）组成。测量和评估该信号的吸收作为频率的函数。基于多极膨胀，构建了可以明确评估探针的吸收光谱的数学模型。对于探针的特定设计，响应可以限于单个共振，通过明确的评估算法可以从该谐振中发现等离子体的电子密度（从谐振频率推断）。

6. 发明授权

US09113543B2 Device and use of the device for measuring the density and/or the electron temperature and/or the collision frequency of a plasma 有权
标题翻译：用于测量等离子体的密度和/或电子温度和/或碰撞频率的装置的装置和用途
公开(公告)号：US09113543B2
公开(公告)日：2015-08-18
申请号：US13821184
申请日：2011-10-06
申请人： Ralf Peter Brinkmann , Jens Oberrath , Peter Awakowicz , Martin Lapke , Thomas Musch , Thomas Mussenbrock , Ilona Rolfes , Christian Schulz , Robert Storch , Tim Styrnoll , Christian Zietz
发明人： Ralf Peter Brinkmann , Jens Oberrath , Peter Awakowicz , Martin Lapke , Thomas Musch , Thomas Mussenbrock , Ilona Rolfes , Christian Schulz , Robert Storch , Tim Styrnoll , Christian Zietz
IPC分类号： G01N9/00 , H05H1/00 , H01P3/08 , H01P5/10
CPC分类号： H05H1/0037 , H01P3/085 , H01P5/10 , H05H1/0012 , H05H1/0081
摘要： The invention relates to a device and method for measuring the density of a plasma by determining an impulse response to a high-frequency signal coupled into a plasma. The density, electron temperature and/or collision frequency as a function of the impulse response can be determined. A probe having a probe head and a probe shaft can be introduced into the plasma, wherein the probe shaft is connected to a signal generator for electrically coupling a high-frequency signal into the probe head. The probe core is enclosed by the jacket and has at its surface mutually insulated electrode areas of opposite polarity. A balun is arranged at the transition between the probe head and an electrically unbalanced high-frequency signal feed to convert electrically unbalanced signals into balanced signals.
摘要翻译：本发明涉及通过确定耦合到等离子体中的高频信号的脉冲响应来测量等离子体的密度的装置和方法。可以确定作为脉冲响应的函数的密度，电子温度和/或碰撞频率。可以将具有探针头和探针轴的探头引入等离子体中，其中探针轴连接到信号发生器，用于将高频信号电耦合到探头中。探针芯由护套封闭，并在其表面具有相反极性的相互绝缘的电极区域。平衡 - 不平衡转换器设置在探针头和电气不平衡高频信号馈送之间的转换处，以将电不平衡信号转换为平衡信号。

7. 发明申请

US20120097641A1 METHOD AND DEVICE FOR PLASMA TREATMENT OF A FLAT SUBSTRATE 审中-公开
标题翻译：用于等离子体处理平板基板的方法和装置
公开(公告)号：US20120097641A1
公开(公告)日：2012-04-26
申请号：US13127497
申请日：2009-11-04
申请人： Rudolf Beckmann , Michael Geisler , Arndt Zeuner , Marks Fiedler , Gunter Grabosch , Andreas Pflug , Uwe Czarnetzki , Ralf-Peter Brinkmann , Michael Siemers
发明人： Rudolf Beckmann , Michael Geisler , Arndt Zeuner , Marks Fiedler , Gunter Grabosch , Andreas Pflug , Uwe Czarnetzki , Ralf-Peter Brinkmann , Michael Siemers
IPC分类号： B44C1/22 , C23C16/50
CPC分类号： H01J37/32165 , H01J37/32091
摘要： Method and device for the plasma treatment of a substrate in a plasma device, wherein—the substrate (110) is arranged between an electrode (112) and a counter-electrode (108) having a distance d between a surface area of the substrate to be treated and the electrode, —a capacitively coupled plasma discharge is excited, forming a DC self-bias between the electrode (112) and the counter-electrode (108), —in an area of the plasma discharge between the surface area to be treated and the electrode having a quasineutral plasma bulk (114), a quantity of at least one activatable gas species, to which a surface area of the substrate to be treated is subjected, is present —it is provided that a plasma discharge is excited, —wherein the distance d has a value comparable to s=se+sg, where se denotes a thickness of a plasma boundary layer (119) in front of the electrode, and sg denotes a thickness of a plasma boundary layer (118) in front of the substrate surface to be treated or —wherein the quasineutral plasma bulk (114) between the surface area to be treated and the electrode has a linear extension dp, where dp
摘要翻译：用于等离子体装置中的基板的等离子体处理的方法和装置，其中 - 所述基板（110）布置在电极（112）和相对电极（108）之间，所述电极与对电极（108）之间的距离为d，并且电极 - 电容耦合等离子体放电被激发，在电极（112）和对电极（108）之间形成DC自偏压，在等离子体放电的面积为存在电极，其具有准中等离子体体积（114），一定量的待处理衬底的表面积经受的至少一种可活化气体种类，其条件是等离子体放电被激发， - 其中距离d具有与s = se + sg相当的值，其中se表示电极前面的等离子体边界层（119）的厚度，sg表示前面的等离子体边界层（118）的厚度的待处理基材表面或其中在待处理表面积和电极之间的准中性等离子体体积（114）中具有线性延伸dp，其中dp <1dd，dp

8. 发明申请

US20090133471A1 Apparatus and Use of the Apparatus for the Determination of the Density of a Plasma 有权
标题翻译：用于测定等离子体密度的装置和用途
公开(公告)号：US20090133471A1
公开(公告)日：2009-05-28
申请号：US12294322
申请日：2007-03-23
申请人： Ralf-Peter Brinkmann
发明人： Ralf-Peter Brinkmann
IPC分类号： G01N9/00
CPC分类号： H05H1/0037
摘要： Device for determining the density of a plasma, with of a probe (1) which can be immersed into the plasma, with a probe head (2) in form of a three-axis ellipsoid, and a handle (3) connected to the probe head (2), wherein the probe head (2) has a sheath (4) and a probe core (5, 5a) surrounded by the sheath (4), wherein the surface (8) of the probe core (5, 5a) has electrode areas (9, 10) of opposite polarity which are insulated from each other. The probe core consists of electrodes (6, 7), to which a signal is applied. The absorption of that signal is measured and evaluated as a function of the frequency. Based on a multipole expansion, a mathematical model is constructed with which the absorption spectrum of the probe can be unambiguously evaluated. For a particular design of the probe, the response can be restricted to a single resonance, from which the electron density of the plasma (to be inferred from the resonance frequency) can be found by an unambiguous evaluation algorithm.
摘要翻译：用于通过具有三轴椭圆形式的探针头（2）和可连接到探针的手柄（3），用可以浸入等离子体的探针（1）来确定等离子体的密度的装置头部（2），其中所述探头（2）具有护套（4）和由所述护套（4）围绕的探针芯部（5,5a），其中所述探针芯部（5,5a）的所述表面（8）具有彼此绝缘的相反极性的电极区域（9,10）。探针芯由施加信号的电极（6,7）组成。测量和评估该信号的吸收作为频率的函数。基于多极膨胀，构建了可以明确评估探针的吸收光谱的数学模型。对于探针的特定设计，响应可以限于单个共振，通过明确的评估算法可以从该谐振中发现等离子体的电子密度（从谐振频率推断）。

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