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1. 发明授权

US09746743B1 Electro-optic optical modulator devices and method of fabrication 有权
公开(公告)号：US09746743B1
公开(公告)日：2017-08-29
申请号：US15224546
申请日：2016-07-30
申请人： Payam Rabiei
发明人： Payam Rabiei
IPC分类号： G02F1/225 , G02B6/132 , G02B6/136 , G02B6/12 , G02B6/122 , G02F1/21
CPC分类号： G02F1/2255 , G02B6/12009 , G02B6/122 , G02B6/1223 , G02B6/1225 , G02B6/132 , G02B6/136 , G02B2006/1204 , G02B2006/12045 , G02B2006/12061 , G02B2006/12142 , G02B2006/12173 , G02F2001/212 , G02F2202/07
摘要： A novel electro-optic optical modulator device and a related method for creating the novel optical modulator device are disclosed. In one embodiment, the novel optical modulator comprises a high index contrast optical waveguide, a mesa region, electrical modulation electrodes, RF transmission lines, and interconnection layers. The high index contrast optical waveguide comprises an electro-optic slab core region and a high index ridge core region. A mesa section which includes the core regions can be formed, and electrical modulation electrodes are placed on etched sidewalls of the mesa section to achieve electro-optical index modulation of the electro-optic slab core region. The RF transmission lines include RF electrodes that connected to the electrical modulation electrodes. The interconnection layers connect the modulation electrodes with the RF electrodes by using etched vias. The novel optical modulator can also incorporate foldable modulation arms for poling in the electro-optic slab core region.

2. 发明授权

US09746608B1 Integrated optical assembly apparatus and integrated fabrication method for coupling optical energy 有权
公开(公告)号：US09746608B1
公开(公告)日：2017-08-29
申请号：US14967196
申请日：2015-12-11
申请人： Payam Rabiei
发明人： Payam Rabiei
IPC分类号： G02B6/32 , G02B6/124 , G02B6/42 , G02B6/122 , G03F7/00 , G03F7/20 , G03F7/16 , G02B6/12
CPC分类号： G02B6/124 , G02B6/1223 , G02B6/1228 , G02B6/4203 , G02B6/4214 , G02B2006/12104 , G02B2006/12107 , G03F7/0005 , G03F7/16 , G03F7/2022
摘要： A novel optical assembly apparatus for coupling optical energy and a related method for creating the novel optical assembly apparatus are disclosed. In one embodiment, the novel optical assembly apparatus includes a high-index contrast waveguide constructed on a semiconductor die or another base substrate with an aligned optical coupling section, a grating coupler etched onto a surface, a micro mirror with an acute angle relative to the surface, and a waveguide taper that narrows an optical beam width. A light ray entered into the optical coupling section is redirected by the micro mirror to form a perpendicular ray entry angle with the grating coupler. The grating coupler then efficiently couples the light ray with the waveguide taper, which in turn narrows the optical beam width. The light ray may originate from a semiconductor die or from an optical fiber, which is purposefully aligned with the high-index contrast waveguide.

3. 发明授权

US09229158B2 Method for production of optical waveguides and coupling and devices made from the same 有权
标题翻译：用于生产光波导和耦合的方法及由其制成的器件
公开(公告)号：US09229158B2
公开(公告)日：2016-01-05
申请号：US14682803
申请日：2015-04-09
申请人： Payam Rabiei
发明人： Payam Rabiei
IPC分类号： G02B6/122 , G02B6/10 , G02B6/02 , G02B6/036 , C23C14/34
CPC分类号： G02B6/02295 , B82Y20/00 , B82Y40/00 , C23C14/34 , G02B6/03677 , G02B6/107 , G02B6/12033 , G02B6/1223 , G02B6/136 , G02B2006/1204 , G02B2006/12045 , G02B2006/12054 , G02B2006/12057 , G02B2006/12097 , G02B2207/101 , G02F1/035 , G02F1/225 , G02F1/3558 , G02F2201/30 , G02F2202/20 , H01J37/32366
摘要： Novel processing methods for production of high-refractive index contrast and low loss optical waveguides are disclosed. In one embodiment, a novel waveguide is produced by first depositing or growing a first low refractive index material layer as a cladding layer on top of a base substrate. Then, a first high refractive index material layer is deposited or transferred to the top of the cladding layer to form a slab core region. Subsequently, a second high refractive index material layer is deposited on top of the slab core region, and an etch mask layer is formed. Furthermore, the second high refractive index material layer is selectively etched by utilizing a dry-etching tool with high selectivity to the etch mask layer, and a second low refractive index material layer is deposited as a top cladding layer to encapsulate the second high refractive index material layer on top of lower cladding layers.
摘要翻译：公开了用于生产高折射率对比度和低损耗光波导的新型加工方法。在一个实施例中，通过首先沉积或生长第一低折射率材料层作为基底衬底顶部上的包覆层来制造新的波导。然后，将第一高折射率材料层沉积或转移到包覆层的顶部以形成板芯区域。随后，在板芯区域的顶部上沉积第二高折射率材料层，并且形成蚀刻掩模层。此外，通过利用对蚀刻掩模层具有高选择性的干蚀刻工具来选择性地蚀刻第二高折射率材料层，并且沉积第二低折射率材料层作为顶部包层以封装第二高折射率材料层在下包层的顶部。

4. 发明申请

US20080165565A1 Ferroelectric Thin Films and Devices Comprising Thin Ferroelectric Films 审中-公开
标题翻译：铁电薄膜和包含薄铁电薄膜的器件
公开(公告)号：US20080165565A1
公开(公告)日：2008-07-10
申请号：US10597052
申请日：2004-06-17
申请人： Peter Gunter , Payam Rabiei
发明人： Peter Gunter , Payam Rabiei
IPC分类号： G11C11/22 , B29C65/00 , H01L41/00 , G02B6/10 , B29D11/00
CPC分类号： G02B6/29355 , G02B6/12007 , G02B6/29394 , G02F1/035 , G02F1/3551 , G02F1/377 , G02F2001/392 , G11C11/22 , H01L21/02197 , H01L21/2007 , H01L21/31691 , H01L21/76254 , H01L37/02 , H01L41/312
摘要： A method of producing a device with a ferroelectric crystal thin film on a first substrate including the steps of providing a ferroelectric crystal, of irradiating a first surface of the ferroelectric crystal with ions so that a damaged layer is created underneath the first surface, of bonding a block of material including the first substrate to the ferroelectric crystal to create a bonded element, wherein an interface is formed between the first surface and a second surface of the block, and of heating the bonded element and separating it at the damaged layer, so that a ferroelectric crystal layer remains supported by the first substrate. By this method, very thin films—down to thicknesses of a fraction of a micrometer—of ferroelectric crystals may be fabricated without jeopardizing the monocrystalline structure.
摘要翻译：一种在第一基板上制造具有铁电晶体薄膜的器件的方法，包括以下步骤：提供铁电晶体，用离子照射铁电晶体的第一表面，使得在第一表面下方产生损伤层，包括第一衬底到铁电晶体以形成结合元件的材料块，其中在块的第一表面和第二表面之间形成界面，并且加热粘合元件并将其在损伤层处分离，因此铁电晶体层保持由第一衬底支撑。通过这种方法，可以制造非常薄的薄膜，其厚度小于一微米的铁电晶体的一部分，而不会危害单晶结构。

5. 发明申请

US20150323737A1 METHOD FOR PRODUCTION OF OPTICAL WAVEGUIDES AND COUPLING AND DEVICES MADE FROM THE SAME 有权
标题翻译：用于生产光波导和耦合的方法及其装置
公开(公告)号：US20150323737A1
公开(公告)日：2015-11-12
申请号：US14682803
申请日：2015-04-09
申请人： Payam Rabiei
发明人： Payam Rabiei
IPC分类号： G02B6/02 , C23C14/34 , G02B6/036
CPC分类号： G02B6/02295 , B82Y20/00 , B82Y40/00 , C23C14/34 , G02B6/03677 , G02B6/107 , G02B6/12033 , G02B6/1223 , G02B6/136 , G02B2006/1204 , G02B2006/12045 , G02B2006/12054 , G02B2006/12057 , G02B2006/12097 , G02B2207/101 , G02F1/035 , G02F1/225 , G02F1/3558 , G02F2201/30 , G02F2202/20 , H01J37/32366
摘要： Novel processing methods for production of high-refractive index contrast and low loss optical waveguides are disclosed. In one embodiment, a novel waveguide is produced by first depositing or growing a first low refractive index material layer as a cladding layer on top of a base substrate. Then, a first high refractive index material layer is deposited or transferred to the top of the cladding layer to form a slab core region. Subsequently, a second high refractive index material layer is deposited on top of the slab core region, and an etch mask layer is formed. Furthermore, the second high refractive index material layer is selectively etched by utilizing a dry-etching tool with high selectivity to the etch mask layer, and a second low refractive index material layer is deposited as a top cladding layer to encapsulate the second high refractive index material layer on top of lower cladding layers.
摘要翻译：公开了用于生产高折射率对比度和低损耗光波导的新型加工方法。在一个实施例中，通过首先沉积或生长第一低折射率材料层作为基底衬底顶部上的包覆层来制造新的波导。然后，将第一高折射率材料层沉积或转移到包覆层的顶部以形成板芯区域。随后，在板芯区域的顶部上沉积第二高折射率材料层，并且形成蚀刻掩模层。此外，通过利用对蚀刻掩模层具有高选择性的干蚀刻工具来选择性地蚀刻第二高折射率材料层，并且沉积第二低折射率材料层作为顶部包层以封装第二高折射率材料层在下包层的顶部。

6. 发明申请

US20150001175A1 Method for Production of Optical Waveguides and Coupling and Devices Made from the Same 有权
标题翻译：用于制造光波导和耦合的方法及其制造
公开(公告)号：US20150001175A1
公开(公告)日：2015-01-01
申请号：US14273002
申请日：2014-05-08
申请人： Payam Rabiei
发明人： Payam Rabiei
IPC分类号： G02B6/10 , H01J37/32
CPC分类号： G02B6/02295 , B82Y20/00 , B82Y40/00 , C23C14/34 , G02B6/03677 , G02B6/107 , G02B6/12033 , G02B6/1223 , G02B6/136 , G02B2006/1204 , G02B2006/12045 , G02B2006/12054 , G02B2006/12057 , G02B2006/12097 , G02B2207/101 , G02F1/035 , G02F1/225 , G02F1/3558 , G02F2201/30 , G02F2202/20 , H01J37/32366
摘要： Novel processing methods for production of high-refractive index contrast and low loss optical waveguides are disclosed. In one embodiment, a “channel” waveguide is produced by first depositing a lower cladding material layer with a low refractive index on a base substrate and a refractory metal layer. Then, an etch mask layer is deposited on the refractory layer, followed by selective etching of the refractory metal layer with a dry-etch tool with high selectivity to the etch mask layer. Then, the refractory metal layer is oxidized to form an oxidized refractory metal region, and a top cladding layer made of a second low refractive index material to encapsulate the oxidized refractory metal region. In another embodiment, a “ridge” waveguide is produced by using similar process steps with an added step of depositing a high-refractive-index material layer and an optional optically-transparent layer.
摘要翻译：公开了用于生产高折射率对比度和低损耗光波导的新型加工方法。在一个实施例中，通过在基底衬底和难熔金属层上首先沉积具有低折射率的下覆层材料层来制造“通道”波导。然后，将蚀刻掩模层沉积在耐火层上，然后用对蚀刻掩模层具有高选择性的干蚀刻工具选择性地蚀刻难熔金属层。然后，将难熔金属层氧化形成氧化的难熔金属区域，以及由第二低折射率材料制成的顶部包覆层以包封氧化的难熔金属区域。在另一个实施例中，通过使用类似的工艺步骤，通过沉积高折射率材料层和可选的光学透明层的附加步骤来制造“脊”波导。

7. 发明授权

US08900899B2 Method for production of optical waveguides and coupling and devices made from the same 有权
标题翻译：用于生产光波导和耦合的方法及由其制成的器件
公开(公告)号：US08900899B2
公开(公告)日：2014-12-02
申请号：US13931530
申请日：2013-06-28
申请人： Payam Rabiei
发明人： Payam Rabiei
IPC分类号： H01L21/00 , H01L21/4763 , H01L21/44 , H01L21/26 , H01L21/42 , H01L21/28 , H01L21/02 , H01L21/70 , H01L29/78 , G02B6/13 , G02B6/136 , G02B6/122 , G02B6/12
CPC分类号： G02B6/13 , B82Y20/00 , G02B6/1223 , G02B6/136 , G02B2006/1204 , G02B2006/12045 , G02B2006/12054 , G02B2006/12057 , G02B2006/12097
摘要： Novel processing methods for production of high-refractive index contrast and low loss optical waveguides are disclosed. In one embodiment, a “channel” waveguide is produced by first depositing a lower cladding material layer with a low refractive index on a base substrate, a refractory metal layer, and a top diffusion barrier layer. Then, a trench is formed with an open surface to the refractory metal layer. The open surface is subsequently oxidized to form an oxidized refractory metal region, and the top diffusion barrier layer and the non-oxidized refractory metal region are removed. Then, a low-refractive-index top cladding layer is deposited on this waveguide structure to encapsulate the oxidized refractory metal region. In another embodiment, a “ridge” waveguide is produced by using similar process steps with an added step of depositing a high-refractive-index material layer and an optional optically-transparent layer.
摘要翻译：公开了用于生产高折射率对比度和低损耗光波导的新型加工方法。在一个实施例中，通过在基底衬底，难熔金属层和顶部扩散阻挡层上首先沉积具有低折射率的下覆层材料层来制造“通道”波导。然后，形成具有开口表面的难熔金属层的沟槽。随后将开放的表面氧化以形成氧化的难熔金属区域，并且去除顶部扩散阻挡层和未氧化的难熔金属区域。然后，在该波导结构上沉积低折射率顶层，以封装氧化的难熔金属区域。在另一个实施例中，通过使用类似的工艺步骤，通过沉积高折射率材料层和可选的光学透明层的附加步骤来制造“脊”波导。

8. 发明申请

US20140004638A1 Method for Production of Optical Waveguides and Coupling and Devices Made from the Same 有权
标题翻译：用于制造光波导和耦合的方法及其制造
公开(公告)号：US20140004638A1
公开(公告)日：2014-01-02
申请号：US13931530
申请日：2013-06-28
申请人： Payam Rabiei
发明人： Payam Rabiei
IPC分类号： G02B6/13
CPC分类号： G02B6/13 , B82Y20/00 , G02B6/1223 , G02B6/136 , G02B2006/1204 , G02B2006/12045 , G02B2006/12054 , G02B2006/12057 , G02B2006/12097
摘要： Novel processing methods for production of high-refractive index contrast and low loss optical waveguides are disclosed. In one embodiment, a “channel” waveguide is produced by first depositing a lower cladding material layer with a low refractive index on a base substrate, a refractory metal layer, and a top diffusion barrier layer. Then, a trench is formed with an open surface to the refractory metal layer. The open surface is subsequently oxidized to form an oxidized refractory metal region, and the top diffusion barrier layer and the non-oxidized refractory metal region are removed. Then, a low-refractive-index top cladding layer is deposited on this waveguide structure to encapsulate the oxidized refractory metal region. In another embodiment, a “ridge” waveguide is produced by using similar process steps with an added step of depositing a high-refractive-index material layer and an optional optically-transparent layer.
摘要翻译：公开了用于生产高折射率对比度和低损耗光波导的新型加工方法。在一个实施例中，通过在基底衬底，难熔金属层和顶部扩散阻挡层上首先沉积具有低折射率的下覆层材料层来制造“通道”波导。然后，形成具有开口表面的难熔金属层的沟槽。随后将开放的表面氧化以形成氧化的难熔金属区域，并且去除顶部扩散阻挡层和未氧化的难熔金属区域。然后，在该波导结构上沉积低折射率顶层，以封装氧化的难熔金属区域。在另一个实施例中，通过使用类似的工艺步骤，通过沉积高折射率材料层和可选的光学透明层的附加步骤来制造“脊”波导。

9. 发明授权

US09111730B2 Method for production of optical waveguides and coupling and devices made from the same 有权
标题翻译：用于生产光波导和耦合的方法及由其制成的器件
公开(公告)号：US09111730B2
公开(公告)日：2015-08-18
申请号：US14273002
申请日：2014-05-08
申请人： Payam Rabiei
发明人： Payam Rabiei
IPC分类号： G02B6/42 , H01J37/32 , B82Y20/00 , G02B6/122 , G02B6/136 , G02B6/12 , G02B6/10
CPC分类号： G02B6/02295 , B82Y20/00 , B82Y40/00 , C23C14/34 , G02B6/03677 , G02B6/107 , G02B6/12033 , G02B6/1223 , G02B6/136 , G02B2006/1204 , G02B2006/12045 , G02B2006/12054 , G02B2006/12057 , G02B2006/12097 , G02B2207/101 , G02F1/035 , G02F1/225 , G02F1/3558 , G02F2201/30 , G02F2202/20 , H01J37/32366
摘要： Novel processing methods for production of high-refractive index contrast and low loss optical waveguides are disclosed. In one embodiment, a “channel” waveguide is produced by first depositing a lower cladding material layer with a low refractive index on a base substrate and a refractory metal layer. Then, an etch mask layer is deposited on the refractory layer, followed by selective etching of the refractory metal layer with a dry-etch tool with high selectivity to the etch mask layer. Then, the refractory metal layer is oxidized to form an oxidized refractory metal region, and a top cladding layer made of a second low refractive index material to encapsulate the oxidized refractory metal region. In another embodiment, a “ridge” waveguide is produced by using similar process steps with an added step of depositing a high-refractive-index material layer and an optional optically-transparent layer.
摘要翻译：公开了用于生产高折射率对比度和低损耗光波导的新型加工方法。在一个实施例中，通过在基底衬底和难熔金属层上首先沉积具有低折射率的下覆层材料层来制造“通道”波导。然后，将蚀刻掩模层沉积在耐火层上，然后用对蚀刻掩模层具有高选择性的干蚀刻工具选择性地蚀刻难熔金属层。然后，将难熔金属层氧化形成氧化的难熔金属区域，以及由第二低折射率材料制成的顶部包覆层以包封氧化的难熔金属区域。在另一个实施例中，通过使用类似的工艺步骤，通过沉积高折射率材料层和可选的光学透明层的附加步骤来制造“脊”波导。

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