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    • 1. 发明申请
    • High density lithographic process
    • 高密度光刻工艺
    • US20080102380A1
    • 2008-05-01
    • US11590495
    • 2006-10-30
    • Pawitter S. Mangat
    • Pawitter S. Mangat
    • G03F1/00C23F1/00B44C1/22C03C15/00C03C25/68
    • C03C15/00C03C17/34C03C2218/33
    • A method is provided for patterning monolithically integrated features having a 1:1 ratio. The method comprises forming a first etch barrier layer (18) over a base layer (14) and applying (52) a template (20) to pattern (52) first printed features (26) in the first etch barrier layer (18). The first etch barrier layer (18) is etched (54) to form second printed features (32) in the base layer (14). A second etch barrier layer (34) is formed over the base layer (14) and the template (20) is applied to pattern (58) third printed features (38) in the second etch barrier layer (34). The second etch barrier layer (34) is etched (60) to form fourth printed features (42) in the base layer (14).
    • 提供了一种用于图形化具有1:1比例的单片集成特征的方法。 该方法包括在基底层(14)上形成第一蚀刻阻挡层(18),并在第一蚀刻阻挡层(18)中施加(52)模板(20)以图形(52)第一印刷特征(26)。 第一蚀刻阻挡层(18)被蚀刻(54)以在基底层(14)中形成第二印刷特征(32)。 第二蚀刻阻挡层(34)形成在基底层(14)上,并且模板(20)被施加到第二蚀刻阻挡层(34)中的图案(58)第三印刷特征(38)。 第二蚀刻阻挡层(34)被蚀刻(60)以在基底层(14)中形成第四印刷特征(42)。
    • 3. 发明申请
    • SMUDGE REMOVAL FROM ELECTRONIC DEVICE DISPLAYS
    • 从电子设备显示屏去除电源
    • US20080266766A1
    • 2008-10-30
    • US11741463
    • 2007-04-27
    • John J. D'UrsoPawitter S. Mangat
    • John J. D'UrsoPawitter S. Mangat
    • H05K5/00B08B1/02B08B7/04
    • B08B17/06G06F3/041H04M1/18
    • An apparatus and method is provided for removing smudges (624) including oils and dust from portable electronic displays (110, 150, 200, 300, 334). The apparatus comprises a display device (600, 700, 800, 900) positioned within a housing (102, 104), having a surface (601) viewable through an opening in the housing (102, 104) and a susceptibility to receiving contaminants (624). Gradients are formed on the display device (600, 700, 800, 900) for providing a differential surface tension that causes the smudges (624) to migrate across the viewable surface of the display device (600, 700, 800, 900). The gradients may be, for example, thermal (604, 605), electrical (702, 708), optical (804), or surface wettability (904).
    • 提供了一种用于从便携式电子显示器(110,150,200,300,334)去除包括油和灰尘的污迹(624)的装置和方法。 该装置包括定位在壳体(102,104)内的显示装置(600,700,800,900),其具有通过壳体(102,104)中的开口可以观察到的表面(601)和容纳污染物 624)。 梯度形成在显示装置(600,700,800,900)上,用于提供导致污迹(624)跨过显示装置(600,700,800,900,900)的可视表面移动的差动表面张力。 梯度可以是例如热(604,605),电(702,708),光学(804)或表面润湿性(904)。
    • 4. 发明授权
    • Mask, its method of formation, and a semiconductor device made thereby
    • 掩模,其形成方法以及由此制成的半导体器件
    • US06355384B1
    • 2002-03-12
    • US09519739
    • 2000-03-06
    • William J. DauksherPawitter S. Mangat
    • William J. DauksherPawitter S. Mangat
    • G03F900
    • B82Y10/00B82Y40/00G03F1/20H01J37/3174H01J2237/0453H01J2237/31791
    • A method for fabricating a patterning mask is disclosed in which a membrane layer is deposited on a first surface of a substrate. Patterned and unpatterned portions of the substrate are then defined on a second surface of the substrate. A majority of the thickness of substrate in the unpatterned portions is then dry etched to partially define a strut having sidewalls that are substantially perpendicular to the first surface. Wet etching is then performed to etch through the remaining thickness of the substrate to expose the bottom surface of the membrane layer and completely define the strut. Scattering elements may then be formed over the membrane layer. In one embodiment, the substrate is silicon and has a (110) orientation and an edge of the silicon struts is aligned to a {111} plane. In another embodiment, an edge of the silicon struts is aligned to a {221} plane.
    • 公开了一种用于制造图形掩模的方法,其中膜层沉积在基板的第一表面上。 然后将衬底的图案化和未图案化部分限定在衬底的第二表面上。 然后干法蚀刻未图案化部分中的基底厚度的大部分,以部分地限定具有基本上垂直于第一表面的侧壁的支柱。 然后进行湿蚀刻以蚀刻通过衬底的剩余厚度以暴露膜层的底表面并完全限定支柱。 然后可以在膜层上形成散射元件。 在一个实施例中,衬底是硅并且具有(110)取向,并且硅支柱的边缘与{111}平面对准。 在另一个实施例中,硅支柱的边缘与{221}平面对齐。