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1. 发明授权

US08809482B2 Silsesquioxane resins 有权
标题翻译：倍半硅氧烷树脂
公开(公告)号：US08809482B2
公开(公告)日：2014-08-19
申请号：US13133032
申请日：2009-10-19
申请人： Peng-Fei Fu , Eric Moyer , Craig Yeakle
发明人： Peng-Fei Fu , Eric Moyer , Craig Yeakle
IPC分类号： C08G77/06
CPC分类号： C08G77/14 , C08G77/04 , C08G77/12 , C09D183/06 , G03F7/0752 , G03F7/091
摘要： This invention pertains to silsesquioxane resins useful in antireflective coatings wherein the silsesquioxane resin comprises the units (Ph(CH2)rSiO(3-x)/2(OR′)x)m (HSiO(3-x)/2(OR′)x)n (MeSiO(3-x)/2(OR′)x)o (RSiO(3-x)/2(OR′)x)p (R1SiO(3-x)/2(OR′)x)q where Ph is a phenyl group, Me is a methyl group; R′ is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selected from a carboxylic acid group, a carboxylic acid forming group, and mixtures thereof; and R1 is selected from substituted phenyl groups, ester groups, polyether groups; mercapto groups, sulfur-containing organic functional groups, hydroxyl producing group, aryl sulphonic ester groups, and reactive or curable organic functional groups; and r has a value of 0, 1, 2, 3, or 4; x has a value of 0, 1 or 2; wherein in the resin m has a value of 0 to 0.90; n has a value of 0.05 to 0.99; o has a value of 0 to 0.95; p has a value of 0.01 to 0.5; q has a value of 0 to 0.5; and m+n+o+p+q≈1.
摘要翻译：本发明涉及可用于抗反射涂料的倍半硅氧烷树脂，其中倍半硅氧烷树脂包含单元（Ph（CH 2）r SiO（3-x）/ 2（OR'）x）m（HSiO（3-x）/ 2（OR' x）n（MeSiO（3-x）/ 2（OR'）x）o（RSiO（3-x）/ 2（OR'）x）p（R1SiO（3-x）/ 2（OR' 其中Ph是苯基，Me是甲基; R'是氢原子或具有1至4个碳原子的烃基; R选自羧酸基团，羧酸形成基团及其混合物; 并且R 1选自取代的苯基，酯基，聚醚基团; 巯基，含硫有机官能团，羟基产生基团，芳基磺酸酯基团和反应性或可固化的有机官能团; 并且r的值为0,1,2,3或4; x的值为0,1或2; 其中在树脂中m为0至0.90; n的值为0.05〜0.99; o的值为0〜0.95; p的值为0.01〜0.5; q的值为0〜0.5; 和m + n + o + p +q≈1。

2. 发明申请

US20140023970A1 Photo-Patternable and Developable Silsesquioxane Resins for Use in Device Fabrication 有权
标题翻译：用于器件制造的可光刻图案和可开发的倍半硅氧烷树脂
公开(公告)号：US20140023970A1
公开(公告)日：2014-01-23
申请号：US14007671
申请日：2012-03-28
申请人： Peng-Fei Fu , Eric S. Moyer , Jason Suhr
发明人： Peng-Fei Fu , Eric S. Moyer , Jason Suhr
IPC分类号： G03F7/075
CPC分类号： G03F7/0757
摘要： A coatable resin solution capable of forming a coating when applied to the surface of a substrate that is photo-patternable and developable as a dielectric material upon exposure to ultraviolet radiation is provided. The resin solution comprises a silsequioxane-based (SSQ-based) resin, at least one initiator, and an organic solvent. The SSQ-based resin includes both a hydride component and at least one photo-curable component. The resulting coating exhibits a dielectric constant that is less than or equal to about 3.5.
摘要翻译：提供了一种可涂覆的树脂溶液，当涂布在基材的表面上时，其可以在曝光于紫外线照射下作为电介质材料可光刻图形显影。树脂溶液包含基于硅氧烷的（SSQ）树脂，至少一种引发剂和有机溶剂。 SSQ型树脂包括氢化物组分和至少一种可光固化组分。所得涂层的介电常数小于或等于约3.5。

3. 发明授权

US08507179B2 Switchable antireflective coatings 有权
标题翻译：可切换防反射涂层
公开(公告)号：US08507179B2
公开(公告)日：2013-08-13
申请号：US13133175
申请日：2009-10-19
申请人： Peng-Fei Fu , Eric Moyer , Jason Suhr
发明人： Peng-Fei Fu , Eric Moyer , Jason Suhr
IPC分类号： G03F7/00 , G03F7/11
CPC分类号： C09D183/04 , C08G77/14 , C08G77/18 , G02B1/111
摘要： An antireflective coating compositions comprising (I) a silsesquioxane resin (II) a compound selected from photo-acid generators and thermal acid generators; and (III) a solvent wherein in the silsesquioxane resin contains a carboxylic acid forming group or a sulfuric acid forming group.
摘要翻译：一种抗反射涂料组合物，其包含（I）倍半硅氧烷树脂（II）选自光酸产生剂和热酸发生剂的化合物; 和（III）溶剂，其中在倍半硅氧烷树脂中含有羧酸形成基团或形成硫酸的基团。

4. 发明申请

US20130189495A1 Nanoscale Photolithography 审中-公开
标题翻译：纳米级光刻
公开(公告)号：US20130189495A1
公开(公告)日：2013-07-25
申请号：US13877227
申请日：2011-11-07
申请人： Peng-Fei Fu , Lingjie Jay Guo , Eric Scott Moyer , Carlos Pina-Hernandez
发明人： Peng-Fei Fu , Lingjie Jay Guo , Eric Scott Moyer , Carlos Pina-Hernandez
IPC分类号： B05D1/36
CPC分类号： B05D1/36 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/165 , G03F7/405 , Y10T428/24479 , Y10T428/24612
摘要： A simple and practical method that can reduce the feature size of a patterned structure bearing surface hydroxyl groups is described. The patterned structure can be obtained by any patterning technologies, such as photo-lithography, e-beam lithography, nano-imprinting lithography. The method includes: (1) initially converting the hydroxyl or silanol-rich surface into an amine-rich surface with the treatment of an amine agent, preferably a cyclic compound; (2) coating an epoxy material on the top of the patterned structure; (3) forming an extra layer when applied heat via a surface-initiated polymerization; (4) applying an amine coupling agent to regenerate the amine-rich surface; (5) coating an epoxy material on the top of the patterned structure to form the next layer; (6) repeating step 4 and 5 to form multiple layers; This method allows the fabrication of feature sizes of various patterns and contact holes that are difficult to reach by conventional lithographic methods.
摘要翻译：描述了一种可以减小带有表面羟基的图案结构的特征尺寸的简单实用的方法。图案化结构可以通过任何图案化技术获得，例如光刻，电子束光刻，纳米压印光刻。该方法包括：（1）通过处理胺剂，优选环状化合物，首先将羟基或硅烷醇富含表面转化为富含胺的表面; （2）在图案化结构的顶部涂覆环氧树脂材料; （3）通过表面引发聚合施加热量时形成额外的层; （4）施加胺偶联剂以再生富含胺的表面; （5）在图案化结构的顶部涂覆环氧树脂材料以形成下一层; （6）重复步骤4和5以形成多层; 该方法允许制造通过常规光刻方法难以达到的各种图案和接触孔的特征尺寸。

5. 发明授权

US08293354B2 UV curable silsesquioxane resins for nanoprint lithography 有权
标题翻译：用于纳米压印光刻的UV可固化倍半硅氧烷树脂
公开(公告)号：US08293354B2
公开(公告)日：2012-10-23
申请号：US12421333
申请日：2009-04-09
申请人： Peng-Fei Fu , Lingjie Jay Guo
发明人： Peng-Fei Fu , Lingjie Jay Guo
IPC分类号： B32B3/30 , B32B9/04
CPC分类号： C08G77/04 , B82Y10/00 , B82Y40/00 , C08G77/14 , C08G77/24 , C09D183/08 , G03F7/0002 , G03F7/038 , G03F7/0757 , Y10T428/24355 , Y10T428/24479 , Y10T428/2457 , Y10T428/24612 , Y10T428/26 , Y10T428/269 , Y10T428/31663
摘要： Radiation-curable silsesquioxane resin materials are employed for micro- and nanolithography. The resin materials can include a radiation-curable silsesquioxane resin and a photo-initiator having low viscosity. The low viscosity of the liquid system allows imprinting with low pressure and low temperature; e.g. room temperature. The resist's dry etching resistance is increased and the cured film is more easily separated from the mask. Due to its high modulus after cure, the material allows the fabrication of micro- and nano-features having high aspect ratios while providing a high throughput. Various pattern sizes, for example, ranging from tens of microns to as small as a few nanometers, may be achieved with the UV-curable material system.
摘要翻译：可辐照固化的倍半硅氧烷树脂材料用于微观和纳米光刻。树脂材料可以包括可辐射固化的倍半硅氧烷树脂和具有低粘度的光引发剂。液体系统的低粘度允许在低压和低温下进行压印; 例如室内温度。抗蚀剂的抗干蚀刻性提高，并且固化膜更容易与掩模分离。由于其固化后的高模量，该材料允许制造具有高纵横比的微米和纳米特征，同时提供高通量。可用UV可固化材料体系实现各种图案尺寸，例如从数十微米到少至几毫米的范围。

6. 发明授权

US08263312B2 Antireflective coating material 失效
标题翻译：防反射涂料
公开(公告)号：US08263312B2
公开(公告)日：2012-09-11
申请号：US12160325
申请日：2006-12-07
申请人： Peng-Fei Fu , Eric Scott Moyer
发明人： Peng-Fei Fu , Eric Scott Moyer
IPC分类号： G03F7/00
CPC分类号： G03F7/091 , G03F7/0752 , Y10T428/31663
摘要： Antireflective coatings comprising (i) a silsesquioxane resin having the formula (PhSiO(3-x)/2(OH)x)mHSiO(3-x)/2(OH)x)n(MeSiO(3-x)/2(OH)x)p where Ph is a phenyl group, Me is a methyl group, x has a value of 0, 1 or 2; m has a value of 0.01 to 0.99, n has a value of 0.01 to 0.99, p has a value of 0.01 to 0.99, and m+n+p=1; (ii) a polyethylene oxide fluid; and (iii) a solvent; and a method of forming said antireflective coatings on an electronic device.
摘要翻译：抗反射涂层，其包含（i）具有式（PhSiO（3-x）/ 2（OH）x）mHSiO（3-x）/ 2（OH）x）n（MeSiO（3-x）/ 2 OH）x）p，其中Ph是苯基，Me是甲基，x具有0,1或2的值; m的值为0.01〜0.99，n为0.01〜0.99，p为0.01〜0.99，m + n + p = 1。（ii）聚环氧乙烷流体; 和（iii）溶剂; 以及在电子设备上形成所述抗反射涂层的方法。

7. 发明申请

US20110003480A1 Silsesquioxane Resins 有权
标题翻译：倍半硅氧烷树脂
公开(公告)号：US20110003480A1
公开(公告)日：2011-01-06
申请号：US12919052
申请日：2009-02-03
申请人： Peng-Fei Fu , Eric Scott Moyer
发明人： Peng-Fei Fu , Eric Scott Moyer
IPC分类号： H01L21/3205 , C08G77/12 , C08L83/05 , C08L43/04 , C08K5/101 , F21V9/00
CPC分类号： C09D183/04 , C08G77/04 , C08G77/045 , C08G77/12 , C08G77/14 , C08G77/70 , G02B1/111 , G03F7/0752 , G03F7/091
摘要： This invention pertains to silsesquioxane resins useful in antireflective coatings wherein the silsesquioxane resin is comprised of the units (Ph(CH2)rSiO(3−x)/2(OR′)x)m (HSiO(3−x)/2(OR′)x)n (MeSiO(3−x)/2(OR′)x)o (RSiO(3−x)/2(OR′)x)p (R1SiO(3−x)/2(OR′)x)q where Ph is a phenyl group, Me is a methyl group; R′ is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selected from a hydroxyl producing group; and R1 is selected from substituted phenyl groups, ester groups, polyether groups; mercapto groups, and reactive or curable organic functional groups; and r has a value of 0, 1, 2, 3, or 4; x has a value of 0, 1 or 2; wherein in the resin m has a value of 0 to 0.95; n has a value of 0.05 to 0.95; o has a value of 0.05 to 0.95; p has a value of 0.05 to 0.5; q has a value of 0 to 0.5; and m+n+o+p+q≈1.
摘要翻译：本发明涉及可用于抗反射涂料的倍半硅氧烷树脂，其中倍半硅氧烷树脂由单元（Ph（CH 2）r SiO（3-x）/ 2（OR'）x）m（HSiO（3-x）/ 2 '（x'）x（x）n（MeSiO（3-x）/ 2（OR'）x）o（RSiO（3-x）/ 2 其中Ph是苯基，Me是甲基; R'是氢原子或具有1至4个碳原子的烃基; R选自羟基生成基团; 并且R 1选自取代的苯基，酯基，聚醚基团; 巯基，以及活性或可固化的有机官能团; 并且r的值为0,1,2,3或4; x的值为0,1或2; 其中，所述树脂m的值为0〜0.95; n的值为0.05〜0.95; o的值为0.05〜0.95; p的值为0.05〜0.5; q的值为0〜0.5; 和m + n + o + p +q≈1。

8. 发明申请

US20090123701A1 Method for Forming Anti-Reflective Coating 有权
标题翻译：形成防反射涂层的方法
公开(公告)号：US20090123701A1
公开(公告)日：2009-05-14
申请号：US11666823
申请日：2005-09-29
申请人： Peng-Fei Fu , Eric Scott Moyer , Craig Rollin Yeakle
发明人： Peng-Fei Fu , Eric Scott Moyer , Craig Rollin Yeakle
IPC分类号： D21H27/40
CPC分类号： C23C18/1295 , C08G77/12 , C09D183/04 , C23C18/06 , C23C18/122 , G03F7/091 , H01L21/02137 , H01L21/02282 , H01L21/3124 , Y10T428/24463 , Y10T428/31663
摘要： Silsesquioxane resins useful in forming the antireflective coating having the formula (PhSiO(3-x)/2(OH)x)mHSiO(3-x)/2(OH)x)n(MeSiO(3-x)/2(OH)x)p(RSiO(3-x)/2(OH)x)q where Ph is a phenyl group, Me is a methyl group, R is selected from ester groups and polyether groups, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95, p has a value of 0.05 to 0.95, q has a value of 0.01 to 0.30 and m+n+p+q≈1.
摘要翻译：可用于形成具有式（PhSiO（3-x）/ 2（OH）x）mHSiO（3-x）/ 2（OH）x）n（MeSiO（3-x）/ 2（OH））的抗反射涂层的倍半硅氧烷树脂）x）p（RSiO（3-x）/ 2（OH）x）q其中Ph是苯基，Me是甲基，R选自酯基和聚醚基团，x的值为0,1 或2; m的值为0.05〜0.95，n为0.05〜0.95，p为0.05〜0.95，q为0.01〜0.30，m + n + p +q≈1。

9. 发明申请

US20080273561A1 Method for Forming Anti-Reflective Coating 失效
标题翻译：形成防反射涂层的方法
公开(公告)号：US20080273561A1
公开(公告)日：2008-11-06
申请号：US11666813
申请日：2005-02-22
申请人： Peng-Fei Fu , Eric Scott Moyer , Craig Rollin Yeakle
发明人： Peng-Fei Fu , Eric Scott Moyer , Craig Rollin Yeakle
IPC分类号： H01S3/04
CPC分类号： H01S5/02415 , C09D183/04 , G03F7/0757 , G03F7/091 , H01S5/0612
摘要： A system and method of minimizing the amount of power that is used by an optoelectronic module is disclosed. The system uses a thermoelectric cooler (TEC) to maintain a case temperature of the module at about 50° C. This allows the TEC to operate in the much more efficient heating mode, thus minimizing the amount of current being used to maintain the module temperature. The method includes the steps of determining a temperature range and operating temperature for an optoelectronic module, such that a maximum current level is not exceeded. In one exemplary embodiment, an operating temperature of about 50° C. with a temperature range of from about −5° C. to about 75° C. allows a maximum current of about 300 mA.
摘要翻译：公开了一种使由光电子模块使用的功率最小化的系统和方法。该系统使用热电冷却器（TEC）将模块的外壳温度保持在约50°C。这允许TEC以更有效的加热模式运行，从而最小化用于维持模块温度的电流量。该方法包括确定光电子模块的温度范围和工作温度的步骤，使得不超过最大电流水平。在一个示例性实施例中，温度范围为约-5℃至约75℃的约50℃的操作温度允许约300mA的最大电流。

10. 发明申请

US20080014335A1 Method for Forming Anti-Reflective Coating 有权
标题翻译：形成防反射涂层的方法
公开(公告)号：US20080014335A1
公开(公告)日：2008-01-17
申请号：US11666822
申请日：2005-09-29
申请人： Peng-Fei Fu , Eric Moyer , Craig Yeakle
发明人： Peng-Fei Fu , Eric Moyer , Craig Yeakle
IPC分类号： B05D5/12 , C07F7/18
CPC分类号： C09D183/04 , G03F7/0757 , G03F7/091
摘要： A method of forming an antireflective coating on an electronic device comprising (A) applying to an electronic device an ARC composition comprising (i) a silsesquioxane resin having the formula (PhSiO(3-x)/2(OH)x)m HSiO(3-x)/2(OH)x)n(MeSiO(3-x)/2(OH)x)p where Ph is a phenyl group, Me is a methyl group, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95, p has a value of 0.05 to 0.95, and m+n+p≈1; and (ii) a solvent; and (B) removing the solvent and curing the silsesquioxane resin to form an antireflective coating on the electronic device.
摘要翻译：一种在电子设备上形成抗反射涂层的方法，包括：（A）向电子器件施加ARC组合物，其包含（i）具有式的线性公式描述=“在线公式”的倍半硅氧烷树脂= （3-x）/ 2（OH）x（x）x（x）x（x）（OH）x（x）x（x）x（x）x（x）其中Ph是苯基，Me是甲基，x具有一个或多个基团，值为0，1或2; m的值为0.05〜0.95，n为0.05〜0.95，p为0.05〜0.95，m + n +p≈1; 和（ii）溶剂; 和（B）除去溶剂并固化倍半硅氧烷树脂以在电子器件上形成抗反射涂层。

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