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2. 发明授权

US6007638A Detergent composition and cleaning method using the same 失效
标题翻译：洗涤剂组成和清洗方法使用相同
公开(公告)号：US6007638A
公开(公告)日：1999-12-28
申请号：US799660
申请日：1997-02-11
申请人： Akira Shinohara , Hirotoshi Ushiyama , Miwa Sugano , Naoaki Sakurai , Noriko Okoshi , Toshiharu Nakagawa
发明人： Akira Shinohara , Hirotoshi Ushiyama , Miwa Sugano , Naoaki Sakurai , Noriko Okoshi , Toshiharu Nakagawa
IPC分类号： G02F1/13 , C03C17/32 , C03C23/00 , C11D1/72 , G02F1/1337
CPC分类号： C03C23/0075 , C03C17/32
摘要： A detergent composition for cleaning the surface of a substrate prior to or after application of an organic or inorganic thin film thereon, comprises: (A) a compound selected from the compounds represented by the formula: R.sub.1 --O--(A.sub.1 O).sub.n --R.sub.2 (wherein R.sub.1 represents an alkyl or alkenyl group having 1 to 7 carbon atoms or a phenyl group; A.sub.1 represents an alkylene group having 2 to 4 carbon atoms; R.sub.2 represents an alkyl or alkenyl group having 1 to 6 carbon atoms or a hydrogen atom; and n is a numerical value ranging from 1 to 6); (B) a compound selected from at least one of those represented by the formulas: R.sub.3 --O--(A.sub.2 O).sub.m --H and R.sub.4 --O--(A.sub.3 O).sub.m --H (wherein R.sub.3 represents an alkylphenyl or alkenylphenyl group having 12 to 25 carbon atoms; A.sub.2 represents an alkylene group having 2 to 4 carbon atoms; R.sub.4 represents an alkyl or alkenyl group having 8 to 25 carbon atoms; A.sub.3 represents an alkylene group having 2 to 4 carbon atoms; and m is a numerical value ranging from 5 to 25). The detergent composition is effective for cleaning the surface of a substrate prior to or after forming an organic or inorganic thin film thereon during LCD production processes.
摘要翻译：一种用于在其上施用有机或无机薄膜之前或之后清洁基材表面的洗涤剂组合物，包括：（A）选自下式的化合物：R1-O-（A1O）n-R2 （其中R1表示碳原子数1〜7的烷基或烯基或苯基; A1表示碳原子数2〜4的亚烷基，R2表示碳原子数1〜6的烷基或烯基或氢原子） n为1〜6的数值）; （B）选自由下式表示的至少一种的化合物：R3-O-（A2O）mH和R4-O-（A3O）mH（其中R3表示具有12-25个碳原子的烷基苯基或烯基苯基; A2表示碳原子数2〜4的亚烷基，R4表示碳原子数8〜25的烷基或烯基，A3表示碳原子数2〜4的亚烷基，m表示5〜25的数值）。洗涤剂组合物在LCD生产过程中在其上形成有机或无机薄膜之前或之后对基材的表面进行清洁是有效的。

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