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    • 2. 发明申请
    • SOLID ELECTROLYTIC CAPACITOR
    • 固体电解电容器
    • US20100246100A1
    • 2010-09-30
    • US12720876
    • 2010-03-10
    • Takashi UMEMOTONobuhiko Hayashi
    • Takashi UMEMOTONobuhiko Hayashi
    • H01G9/08
    • H01G9/08H01G9/012H01G9/15
    • A solid electrolytic capacitor includes at least one capacitor element in which the other end of an anode lead extends beyond an exposed portion of an electrolyte layer exposed from a cathode layer. The solid electrolytic capacitor further includes: an anode terminal connected to the other end of the anode lead, a cathode terminal connected to the cathode layer, a resin layer and a resin outer package covering the capacitor element and the resin layer. The resin layer covering the exposed portion of the electrolyte layer, the other end of the anode lead, and a connecting part between the other end of the anode lead and the anode terminal. The resin layer includes a first resin layer covering the exposed portion and a second resin layer covering the first resin layer, the first resin layer being softer than the second resin layer.
    • 固体电解电容器包括至少一个电容器元件,其中阳极引线的另一端延伸超过暴露于阴极层的电解质层的暴露部分。 固体电解电容器还包括:连接到阳极引线的另一端的阳极端子,连接到阴极层的阴极端子,覆盖电容器元件和树脂层的树脂层和树脂外部封装。 覆盖电解质层的暴露部分的树脂层,阳极引线的另一端以及阳极引线和阳极端子的另一端之间的连接部分。 树脂层包括覆盖暴露部分的第一树脂层和覆盖第一树脂层的第二树脂层,第一树脂层比第二树脂层软。
    • 5. 发明申请
    • Nitride-based semiconductor element and method of forming nitride-based semiconductor
    • 基于氮化物的半导体元件和形成氮化物基半导体的方法
    • US20080224151A1
    • 2008-09-18
    • US12071978
    • 2008-02-28
    • Masayuki HataTatsuya KunisatoNobuhiko Hayashi
    • Masayuki HataTatsuya KunisatoNobuhiko Hayashi
    • H01L33/00
    • B82Y20/00H01L21/0237H01L21/02378H01L21/02381H01L21/0242H01L21/02433H01L21/0254H01L21/02576H01L21/02639H01L21/02647H01L33/007H01S5/0207H01S5/22H01S5/2214H01S5/227H01S5/34333H01S2304/12
    • A nitride-based semiconductor element having superior mass productivity and excellent element characteristics is obtained. This nitride-based semiconductor element comprises a substrate comprising a surface having projection portions, a mask layer formed to be in contact with only the projection portions of the surface of the substrate, a first nitride-based semiconductor layer formed on recess portions of the substrate and the mask layer and a nitride-based semiconductor element layer, formed on the first nitride-based semiconductor layer, having an element region. Thus, the first nitride-based semiconductor layer having low dislocation density is readily formed on the projection portions of the substrate and the mask layer through the mask layer serving for selective growth. When the nitride-based semiconductor element layer having the element region is grown on the first nitride-based semiconductor layer having low dislocation density, a nitride-based semiconductor element having excellent element characteristics can be readily obtained. The first nitride-based semiconductor layer is formed through only single growth on the substrate, whereby a nitride-based semiconductor element having excellent mass productivity is obtained.
    • 获得具有优异的质量生产率和优异的元件特性的氮化物基半导体元件。 该氮化物系半导体元件包括基板,该基板包括具有突出部的表面,形成为仅与基板的表面的突出部接触的掩模层,形成在基板的凹部的第一氮化物系半导体层 以及形成在具有元件区域的第一氮化物系半导体层上的掩模层和氮化物系半导体元件层。 因此,具有低位错密度的第一氮化物基半导体层通过用于选择生长的掩模层容易地形成在衬底和掩模层的突出部分上。 当在具有低位错密度的第一氮化物基半导体层上生长具有元素区域的氮化物基半导体元件层时,可以容易地获得具有优异元素特性的氮化物基半导体元件。 第一氮化物基半导体层仅通过基板上的单一生长形成,从而获得具有优异的批量生产率的氮化物基半导体元件。