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1. 发明授权

US09555420B2 Gas stream treatment process 有权
标题翻译：气流处理工艺
公开(公告)号：US09555420B2
公开(公告)日：2017-01-31
申请号：US12756491
申请日：2010-04-08
申请人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
发明人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
IPC分类号： B03C3/017 , B01D53/02 , B01D53/64 , B03C3/011
CPC分类号： B03C3/017 , B01D53/02 , B01D53/64 , B01D2253/106 , B01D2253/1128 , B01D2253/25 , B01D2257/602 , B01D2258/0283 , B01D2258/0291 , B03C3/011
摘要： A process of treating a gas stream containing mercury is disclosed. The method comprises: applying a sorbent into said gas stream ahead of a particulate matter collection device, in order to adsorb at least a portion of a mercury containing compound, wherein said sorbent contains a composition comprising a compound having the following formula (SiO2)x(OH)yMzSaF: wherein M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01-100%; and wherein the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x/z is equal to 3-300, and the molar ratio of a/z is 1-5.
摘要翻译：公开了一种处理含有汞的气流的方法。该方法包括：将吸附剂施加到颗粒物质收集装置之前的所述气流中，以便吸附至少一部分含汞化合物，其中所述吸附剂含有包含具有下式（SiO 2）x的化合物的组合物（OH）yMzSaF：其中M是以下金属或准金属阳离子中的至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; 其中S是选自以下至少一种的硫基物质：硫化物盐，二硫代氨基甲酸盐，基于聚合物的二硫代氨基甲酸盐和多硫化物盐; 其中F任选存在并且所述F是以下至少一种：表面积覆盖率为0.01-100％的官能化有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷; 并且其中y / x的摩尔比等于0.01-0.5，x / z的摩尔比等于3-300，并且a / z的摩尔比为1-5。

2. 发明授权

US08845991B2 Silica particle manufacturing process 有权
标题翻译：二氧化硅颗粒制造工艺
公开(公告)号：US08845991B2
公开(公告)日：2014-09-30
申请号：US12756526
申请日：2010-04-08
申请人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna , Brett M. Showalter
发明人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna , Brett M. Showalter
IPC分类号： C01B33/12 , C01B33/141 , C01B33/18
CPC分类号： C01B33/18 , C01B33/1415 , C01P2006/12 , C01P2006/14 , C01P2006/16
摘要： Methods of forming a silica-based products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (c) adjusting the pH of the solution to greater than 7; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 1c; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (d) adjusting the pH of the solution to greater than 7; (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 2d; (f) optionally filtering and drying the SCP; and (g) optionally reacting the dried product from step f with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product.
摘要翻译：公开了形成二氧化硅基产品的方法。一种方法包括：（a）提供pH小于或等于7的溶液中含有的含二氧化硅的前体（SCP）; （b）任选地用一种或多种金属物质掺杂SCP，其中当溶液的pH小于或等于pH7时，发生所述掺杂; （c）将溶液的pH调节至大于7; （d）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS，其中所述添加发生在步骤1c中的pH调节之前，同时或之后，（e）任选地过滤和干燥SCP; 和（f）任选地使来自步骤e的干燥产物与官能团反应，任选地其中所得官能化干燥产物是以下至少一种：官能化金属氧化物掺杂或金属硫化物掺杂二氧化硅产物。另一种方法包括：（a）提供包含在pH大于7的溶液中的含二氧化硅的前体（SCP）; （b）将溶液的pH调节至小于或等于7; （c）任选地用一种或多种金属物质掺杂SCP，其中当溶液的pH小于或等于pH7时，发生所述掺杂; （d）将溶液的pH调节至大于7; （e）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS，其中所述添加发生在步骤2d中的pH调节之前，同时或之后; （f）任选地过滤和干燥SCP; 和（g）任选地使来自步骤f的干燥产物与官能团反应，任选地其中所得官能化干燥产物是以下至少一种：官能化金属氧化物掺杂或金属硫化物掺杂二氧化硅产物。

3. 发明申请

US20130036946A1 SILICA PARTICLE MANUFACTURING PROCESS 有权
标题翻译：二氧化硅颗粒制造工艺
公开(公告)号：US20130036946A1
公开(公告)日：2013-02-14
申请号：US13269159
申请日：2011-10-07
申请人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna , Brett Showalter , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna , Brett Showalter , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C09C1/30
CPC分类号： C01B33/12 , C01B33/1415 , C01B33/18 , C01B33/187 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C01P2006/16 , C09C1/02 , C09C1/3081
摘要： Methods of forming a silica-containing products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species; (d) adjusting the pH of the solution to greater than 7; and (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (f) optionally filtering and drying the SCP; The SCP is then added to a hygroscopic solid such that the resulting product comprises a metal oxide-doped or metal sulfide-doped silica-containing product deposited on a substrate selected from hydrated alkaline earth oxide, lanthanide oxide, and combinations thereof.
摘要翻译：公开了形成含二氧化硅的产品的方法。一种方法包括：（a）提供pH小于或等于7的溶液中含有的含二氧化硅的前体（SCP）; （b）任选地用一种或多种金属物质掺杂SCP; （d）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS; （e）任选地过滤和干燥SCP; 和（f）任选地使来自步骤e的干燥产物与官能团反应。另一种方法包括：（a）提供包含在pH大于7的溶液中的含二氧化硅的前体（SCP）; （b）将溶液的pH调节至小于或等于7; （c）任选地用一种或多种金属物质掺杂SCP; （d）将溶液的pH调节至大于7; 和（e）向溶液中加入有效量的盐，使溶液的电导率大于或等于4mS; （f）任选地过滤和干燥SCP; 然后将SCP加入到吸湿固体中，使得所得产物包含沉积在选自水合碱土金属氧化物，镧系元素氧化物及其组合的底物上的金属氧化物掺杂或金属硫化物掺杂的含二氧化硅的产物。

4. 发明授权

US08974762B2 Silica particle manufacturing process 有权
标题翻译：二氧化硅颗粒制造工艺
公开(公告)号：US08974762B2
公开(公告)日：2015-03-10
申请号：US13269159
申请日：2011-10-07
申请人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna , Brett Showalter , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna , Brett Showalter , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C01B33/02 , C01F7/00 , C01B33/12 , C01B33/141 , C01B33/18 , C09C1/02 , C09C1/30 , C01B33/187
CPC分类号： C01B33/12 , C01B33/1415 , C01B33/18 , C01B33/187 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C01P2006/16 , C09C1/02 , C09C1/3081
摘要： Methods of forming a silica-containing products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species; (d) adjusting the pH of the solution to greater than 7; and (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (f) optionally filtering and drying the SCP. The SCP is then added to a hygroscopic solid such that the resulting product comprises a metal oxide-doped or metal sulfide-doped silica-containing product deposited on a substrate selected from hydrated alkaline earth oxide, lanthanide oxide, and combinations thereof.
摘要翻译：公开了形成含二氧化硅的产品的方法。一种方法包括：（a）提供pH小于或等于7的溶液中含有的含二氧化硅的前体（SCP）; （b）任选地用一种或多种金属物质掺杂SCP; （d）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS; （e）任选地过滤和干燥SCP; 和（f）任选地使来自步骤e的干燥产物与官能团反应。另一种方法包括：（a）提供包含在pH大于7的溶液中的含二氧化硅的前体（SCP）; （b）将溶液的pH调节至小于或等于7; （c）任选地用一种或多种金属物质掺杂SCP; （d）将溶液的pH调节至大于7; 和（e）向溶液中加入有效量的盐，使溶液的电导率大于或等于4mS; （f）可选地过滤和干燥SCP。然后将SCP加入到吸湿固体中，使得所得产物包含沉积在选自水合碱土金属氧化物，镧系元素氧化物及其组合的底物上的金属氧化物掺杂或金属硫化物掺杂的含二氧化硅的产物。

5. 发明授权

US08377194B2 Sulfur containing silica particle 有权
标题翻译：含硫二氧化硅颗粒
公开(公告)号：US08377194B2
公开(公告)日：2013-02-19
申请号：US13242618
申请日：2011-09-23
申请人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C01B33/00 , C01B33/113 , C01B17/00 , C09D1/00
CPC分类号： C09C1/28 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C08K3/36 , C09C1/3054 , C09D7/61 , C09D7/69
摘要： A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF.B. M comprises at least one metal or metalloid cation S is a sulfur-based species. F optionally exists and F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300 or from about 0.5 to about 100, and the molar ratio of a/z is about 0.5 to about 5. B is a hygroscopic solid at a water to solid molar ratio of 0.1-6 and preferably comprises at least one alkaline earth oxide or lanthanide oxide.
摘要翻译：公开了含二氧化硅的组合物。组合物包含具有下式的化合物：（SiO 2）x（OH）yMzSaF.B。 M包含至少一种金属或准金属阳离子S是基于硫的物质。 F任选存在，F是以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷，其表面积为约0.01至约100％。 y / x的摩尔比等于约0.01至约0.5，x / z的摩尔比等于约0.5至约300或约0.5至约100，并且a / z的摩尔比为约0.5 B是水与固体摩尔比为0.1-6的吸湿性固体，优选包含至少一种碱土金属氧化物或镧系元素氧化物。

6. 发明授权

US09682383B2 Gas stream treatment process 有权
公开(公告)号：US09682383B2
公开(公告)日：2017-06-20
申请号：US13269206
申请日：2011-10-07
申请人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna
发明人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna
IPC分类号： B03C3/017 , B01D53/02 , B01D53/64 , B03C3/011
CPC分类号： B03C3/017 , B01D53/02 , B01D53/64 , B01D2253/106 , B01D2253/1128 , B01D2253/25 , B01D2257/602 , B01D2258/0283 , B01D2258/0291 , B03C3/011
摘要： A process of treating a gas stream containing at least one mercury compound or species, the process comprising: applying a composition into said gas stream ahead of a particulate matter collection device, wherein said composition contains a compound having the following formula (SiO2)x(OH)yMzSaF, wherein (i) SiO2 is an optional component; (ii) M comprises at least one of the following: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; (iii) S comprises a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; (iii) F is an optional component and comprises at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane.

7. 发明授权

US08932549B2 Sulfur containing silica particle 有权
标题翻译：含硫二氧化硅颗粒
公开(公告)号：US08932549B2
公开(公告)日：2015-01-13
申请号：US13269116
申请日：2011-10-07
申请人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C01B33/18 , C01B33/12 , A23L2/80 , B01J37/03 , B01J21/08 , B01J21/12 , B01J35/10 , B82Y30/00 , C08K9/06 , C08K3/36 , C08K5/548
CPC分类号： A23L2/80 , B01J21/08 , B01J21/12 , B01J35/1019 , B01J35/1042 , B01J35/1047 , B01J35/1061 , B01J37/03 , B82Y30/00 , C01B33/12 , C01B33/18 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/14 , C08K3/36 , C08K5/548 , C08K9/06 , C08K2201/006
摘要： A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzOaF.B: wherein M is at least one of the following: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein F optionally exists and comprises at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300, and the molar ratio of a/z is dependent on the nature of the metal oxide. B comprises a hygroscopic solid and preferably comprises at least one alkaline earth oxide, lanthanide oxide, or combinations thereof.
摘要翻译：公开了含二氧化硅的组合物。组合物包含具有下式的化合物：（SiO 2）x（OH）yMzOaF.B：其中M是以下至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; 其中F任选地存在并且包含以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷，其表面积覆盖率为约0.01至约100％。 y / x的摩尔比等于约0.01至约0.5，x / z的摩尔比等于约0.5至约300，并且a / z的摩尔比取决于金属氧化物的性质。 B包含吸湿性固体，优选包含至少一种碱土金属氧化物，镧系元素氧化物或其组合。

8. 发明申请

US20120245025A1 SULFUR CONTAINING SILICA PARTICLE 有权
标题翻译：含硫硅胶颗粒
公开(公告)号：US20120245025A1
公开(公告)日：2012-09-27
申请号：US13242618
申请日：2011-09-23
申请人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Cheng
发明人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Cheng
IPC分类号： B01J20/10 , B82Y30/00
CPC分类号： C09C1/28 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C08K3/36 , C09C1/3054 , C09D7/61 , C09D7/69
摘要： A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF.B, M comprises at least one metal or metalloid cation. S is a sulfur-based species. F optionally exists and F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300 or from about 0.5 to about 100, and the molar ratio of a/z is about 0.5 to about 5. B is a hygroscopic solid at a water to solid molar ratio of 0.1-6 and preferably comprises at least one alkaline earth oxide or lanthanide oxide.
摘要翻译：公开了含二氧化硅的组合物。组合物包含具有下式的化合物：（SiO 2）x（OH）y M z S a F B，M包含至少一种金属或准金属阳离子。 S是硫类物质。 F任选存在，F是以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷，其表面积为约0.01至约100％。 y / x的摩尔比等于约0.01至约0.5，x / z的摩尔比等于约0.5至约300或约0.5至约100，并且a / z的摩尔比为约0.5 B是水与固体摩尔比为0.1-6的吸湿性固体，优选包含至少一种碱土金属氧化物或镧系元素氧化物。

9. 发明授权

US08936772B2 Silica containing particle 有权
标题翻译：含二氧化硅的颗粒
公开(公告)号：US08936772B2
公开(公告)日：2015-01-20
申请号：US12756548
申请日：2010-04-08
申请人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
发明人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
IPC分类号： C01B33/18 , C01B33/12 , B01J37/03 , A23L2/80 , B01J21/08 , B01J21/12 , B01J35/10 , B82Y30/00 , C09D1/02
CPC分类号： B01J37/03 , A23L2/80 , B01J21/08 , B01J21/12 , B01J35/1019 , B01J35/1042 , B01J35/1047 , B01J35/1061 , B82Y30/00 , C01B33/12 , C01B33/18 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/14 , C09D1/02
摘要： A silica containing composition is disclosed. The silica composition comprising a compound having the following formula (SiO2)x(OH)yMzOaF: wherein M optionally exists and said M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01-100%; and wherein the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x/z is equal to 0.1-300, and the molar ratio of a/z is dependent on the nature of the metal oxide formed.
摘要翻译：公开了含二氧化硅的组合物。二氧化硅组合物包含具有下式（SiO 2）x（OH）y M z O a F的化合物：其中M任选存在，并且所述M是以下金属或准金属阳离子中的至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; 其中F任选存在并且所述F是以下至少一种：表面积覆盖率为0.01-100％的官能化有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷; 并且其中y / x的摩尔比等于0.01-0.5，x / z的摩尔比等于0.1-300，并且a / z的摩尔比取决于形成的金属氧化物的性质。

10. 发明授权

US08333835B2 Sulfur containing silica particle 有权
标题翻译：含硫二氧化硅颗粒
公开(公告)号：US08333835B2
公开(公告)日：2012-12-18
申请号：US13242599
申请日：2011-09-23
申请人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna
发明人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna
IPC分类号： C01B33/00 , C01B33/113 , C01B17/00 , C09D1/00
CPC分类号： C09C1/28 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C08K3/36 , C09C1/3045 , C09D7/61 , C09D7/69
摘要： A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF. M comprises at least one metal or metalloid cation S is a sulfur-based species optionally exists and F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300 or from about 0.5 to about 100, and the molar ratio of a/z is about 0.5 to about 5.
摘要翻译：公开了含二氧化硅的组合物。组合物包含具有下式的化合物：（SiO 2）x（OH）yMzSaF。 M包括至少一种金属或准金属阳离子S是任选存在的基于硫的物质，F是以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷在约0.01至约100％的表面积覆盖范围内。 y / x的摩尔比等于约0.01至约0.5，x / z的摩尔比等于约0.5至约300或约0.5至约100，并且a / z的摩尔比为约0.5 至约5。

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