会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Systems and methods for bonding using microwave energy
    • 使用微波能量接合的系统和方法
    • US08714225B2
    • 2014-05-06
    • US13371384
    • 2012-02-10
    • Nasser K. Budraa
    • Nasser K. Budraa
    • B29C65/14
    • H01L21/67092H01L21/67115H01L25/50H01L2924/0002H01L2924/00
    • Disclosed are systems and methods for bonding wafers by use of microwave energy. Various components that facilitate relatively quick and efficient bonding provided by microwave energy are disclosed. In certain embodiments, devices and methods for applying desirable compression to the wafers can be implemented. In certain embodiments, devices and methods for providing a controlled gas environment such as vacuum can be implemented. In certain embodiments, devices and methods for maintaining the integrity of microwave mode of operation during the bonding process can be implemented. In certain embodiments, devices and methods for increasing throughput of the bonding process can be implemented.
    • 公开了通过使用微波能量来接合晶片的系统和方法。 公开了通过微波能量提供的促进相对快速和高效接合的各种部件。 在某些实施例中,可以实现用于对晶片施加期望压缩的装置和方法。 在某些实施例中,可以实现用于提供受控气体环境例如真空的装置和方法。 在某些实施例中,可以实现用于在接合过程期间维持微波操作模式的完整性的装置和方法。 在某些实施例中,可以实现用于增加绑定过程的吞吐量的装置和方法。
    • 3. 发明授权
    • Systems and methods for bonding materials using microwave energy
    • 使用微波能量接合材料的系统和方法
    • US07985657B1
    • 2011-07-26
    • US11684553
    • 2007-03-09
    • Nasser K. BudraaBoon Ng
    • Nasser K. BudraaBoon Ng
    • H01L21/30
    • H01L21/187
    • Systems and methods are disclosed for bonding of semiconductor, metal, metal-ceramic or combinations of these substrates using microwave energy. In some embodiments, metal-ceramic substrates carrying semiconductor substrates can be bonded simultaneously through a thin interlayer metal to a metal substrate by using microwave energy. In some embodiments, other substrate combinations can be bonded by using microwave energy. High intensity microwave energy is applied to the substrate assembly positioned within a microwave cavity. A process of selective heating can occur in the thin interlayer metal enhanced by the presence of third microwave absorbing substrate, resulting in melting of the thin interlayer metal to facilitate bonding of the two substrates. Some of the advantages associated with such bonding process are disclosed.
    • 公开了用于使用微波能量接合半导体,金属,金属陶瓷或这些衬底的组合的系统和方法。 在一些实施例中,携带半导体衬底的金属陶瓷衬底可以通过使用微波能量通过薄的夹层金属同时结合到金属衬底。 在一些实施方案中,可以通过使用微波能量来结合其它底物组合。 将高强度微波能量施加到位于微波腔内的衬底组件。 通过存在第三微波吸收衬底而增强的薄层间金属可以发生选择性加热的过程,导致薄层间金属的熔化,以促进两个衬底的结合。 公开了与这种接合方法相关的一些优点。
    • 4. 发明申请
    • SYSTEMS AND METHODS FOR BONDING USING MICROWAVE ENERGY
    • 用微波能量联结的系统和方法
    • US20120138220A1
    • 2012-06-07
    • US13371384
    • 2012-02-10
    • Nasser K. Budraa
    • Nasser K. Budraa
    • B32B37/06B32B37/14
    • H01L21/67092H01L21/67115H01L25/50H01L2924/0002H01L2924/00
    • Disclosed are systems and methods for bonding wafers by use of microwave energy. Various components that facilitate relatively quick and efficient bonding provided by microwave energy are disclosed. In certain embodiments, devices and methods for applying desirable compression to the wafers can be implemented. In certain embodiments, devices and methods for providing a controlled gas environment such as vacuum can be implemented. In certain embodiments, devices and methods for maintaining the integrity of microwave mode of operation during the bonding process can be implemented. In certain embodiments, devices and methods for increasing throughput of the bonding process can be implemented.
    • 公开了通过使用微波能量来接合晶片的系统和方法。 公开了通过微波能量提供的促进相对快速和高效接合的各种部件。 在某些实施例中,可以实现用于对晶片施加期望压缩的装置和方法。 在某些实施例中,可以实现用于提供受控气体环境例如真空的装置和方法。 在某些实施例中,可以实现用于在接合过程期间维持微波操作模式的完整性的装置和方法。 在某些实施例中,可以实现用于增加绑定过程的吞吐量的装置和方法。