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1. 发明授权

US06198600B1 Thin film magnetic head and manufacturing method thereof 失效
标题翻译：薄膜磁头及其制造方法
公开(公告)号：US06198600B1
公开(公告)日：2001-03-06
申请号：US09327447
申请日：1999-06-08
申请人： Mitsuhiro Kitao , Hiroki Nakazawa , Keiichi Shibata , Monjiro Momoi , Noboru Yamanaka
发明人： Mitsuhiro Kitao , Hiroki Nakazawa , Keiichi Shibata , Monjiro Momoi , Noboru Yamanaka
IPC分类号： G11B2121
CPC分类号： G11B5/6005 , G11B5/3106 , G11B5/3116 , G11B5/3163 , G11B21/21
摘要： The present invention is directed to a thin film magnetic head and its manufacturing method. A slider 1 is provided with base body surfaces 13 and 14 at its surface facing opposite a medium. An inductive thin film magnetic transducer 2 is provided with a first pole tip P1 and a second pole tip P2 whose front ends emerge at the base body surfaces 13 and 14 and indented portions 4 and 5 provided at the base body surfaces 13 and 14. A protective film 10 covers the base body surfaces 13 and 14 and indented portions 4 and 5. The thickness of the protective film 10 at the indented portions 4 and 5 is larger than the thickness at the base body surfaces 13 and 14. The magnetic films constituting the pole tips P1 and P2 can thus be reliably protected from oxidation, corrosion and the like, while minimizing the spacing loss.
摘要翻译：本发明涉及一种薄膜磁头及其制造方法。滑块1在其与介质相对的表面上设置有基体表面13和14。感应薄膜磁换能器2设置有第一极尖P1和第二极尖P2，其前端在基体表面13和14处出现，凹部4和5设置在基体表面13和14处。保护膜10覆盖基体表面13,14以及凹入部分4和5.在凹陷部分4和5处的保护膜10的厚度大于基体表面13和14处的厚度。构成因此能够可靠地防止极尖P1和P2免于氧化，腐蚀等，同时最小化间隔损耗。

2. 发明申请

US20080217287A1 METHOD OF MANUFACTURING A THIN-FILM MAGNETIC HEAD, THIN-FILM MAGNETIC HEAD MANUFACTURING APPARATUS, AND THIN-FILM MAGNETIC HEAD MANUFACTURING SYSTEM 有权
标题翻译：制造薄膜磁头，薄膜磁头制造装置和薄膜磁头制造系统的方法
公开(公告)号：US20080217287A1
公开(公告)日：2008-09-11
申请号：US11683611
申请日：2007-03-08
申请人： Hiroo SAWADA , Jun SHOUJI , Mitsuhiro KITAO , Eiji YAMADA
发明人： Hiroo SAWADA , Jun SHOUJI , Mitsuhiro KITAO , Eiji YAMADA
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/3163 , G11B5/3193
摘要： A method of manufacturing a thin-film magnetic head works a part to be worked to a target length by carrying out an etching process on an object to be worked using an etching apparatus. The method carries out a measuring process that measures a length before working of a part to be worked using a measuring apparatus and a calculation process that calculates the processing time of the etching process required to work the part to be worked from the length before working to the target length based on a first calculation result correcting parameter obtained in advance corresponding to the measuring apparatus, a second calculation result correcting parameter obtained in advance corresponding to a position of the part to be worked, a third calculation result correcting parameter obtained in advance corresponding to a value of a current supplied to an electrode of the etching apparatus during the etching process, a fourth calculation result correcting parameter obtained in advance corresponding to a total usage time of the electrode, the length before working, and the target length. The etching process is carried out on the object to be worked for the calculated processing time.
摘要翻译：制造薄膜磁头的方法通过使用蚀刻装置对待加工物体进行蚀刻处理，将要加工的部分加工成目标长度。该方法执行测量过程，该测量过程使用测量装置测量待加工零件的工作长度，以及计算过程，该计算过程计算从工作前的工作期间将待加工零件所需的蚀刻工艺的处理时间从基于与测量装置相对应地预先获得的第一计算结果校正参数的目标长度，对应于待加工部位的位置预先获得的第二计算结果校正参数，预先获得的第三计算结果校正参数相对于在蚀刻处理期间提供给蚀刻装置的电极的电流的值，对应于电极的总使用时间，加工前的长度和目标长度，预先获得的第四计算结果校正参数。在计算出的处理时间内对被加工物进行蚀刻处理。

3. 发明授权

US07892442B2 Method of manufacturing a thin-film magnetic head, thin-film magnetic head manufacturing apparatus, and thin-film magnetic head manufacturing system 有权
标题翻译：薄膜磁头制造方法，薄膜磁头制造装置以及薄膜磁头制造系统
公开(公告)号：US07892442B2
公开(公告)日：2011-02-22
申请号：US11683611
申请日：2007-03-08
申请人： Hiroo Sawada , Jun Shouji , Mitsuhiro Kitao , Eiji Yamada
发明人： Hiroo Sawada , Jun Shouji , Mitsuhiro Kitao , Eiji Yamada
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/3163 , G11B5/3193
摘要： A method of manufacturing a thin-film magnetic head works a part to be worked to a target length by carrying out an etching process on an object to be worked using an etching apparatus. The method carries out a measuring process that measures a length before working of a part to be worked using a measuring apparatus and a calculation process that calculates the processing time of the etching process required to work the part to be worked from the length before working to the target length based on a first calculation result correcting parameter obtained in advance corresponding to the measuring apparatus, a second calculation result correcting parameter obtained in advance corresponding to a position of the part to be worked, a third calculation result correcting parameter obtained in advance corresponding to a value of a current supplied to an electrode of the etching apparatus during the etching process, a fourth calculation result correcting parameter obtained in advance corresponding to a total usage time of the electrode, the length before working, and the target length. The etching process is carried out on the object to be worked for the calculated processing time.
摘要翻译：制造薄膜磁头的方法通过使用蚀刻装置对待加工物体进行蚀刻处理，将要加工的部分加工成目标长度。该方法执行测量过程，该测量过程使用测量装置测量待加工零件的工作长度，以及计算过程，该计算过程计算从工作前的工作期间将待加工零件所需的蚀刻工艺的处理时间从基于与测量装置相对应地预先获得的第一计算结果校正参数的目标长度，对应于待加工部位的位置预先获得的第二计算结果校正参数，预先获得的第三计算结果校正参数相对于在蚀刻处理期间提供给蚀刻装置的电极的电流的值，对应于电极的总使用时间，加工前的长度和目标长度，预先获得的第四计算结果校正参数。在计算出的处理时间内对被加工物进行蚀刻处理。

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