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1. 发明授权

US5204711A Projection exposure device 失效
标题翻译：投影曝光装置
公开(公告)号：US5204711A
公开(公告)日：1993-04-20
申请号：US712100
申请日：1991-06-07
申请人： Minoru Takubo , Toshio Fukasawa , Masahiro Miyashita , Yousuke Takagi
发明人： Minoru Takubo , Toshio Fukasawa , Masahiro Miyashita , Yousuke Takagi
IPC分类号： G03F7/20
CPC分类号： G03F7/70058 , G03F7/70241 , G03F7/70716 , G03F7/70975
摘要： In a projection exposure device in which an exposure light from a light source device is transmitted through a mask having a predetermined pattern formed therein and then an image of a mask pattern is focused by a projection lens on an exposure member held by a holding mechanism, an exposure light is emitted from the light source device along a horizontal optical axis. The mask, the projection lens and the exposure member are disposed on the horizontal optical axis and the holding mechanism is formed such that the exposure member is movable at least within a plane perpendicular to the horizontal optical axis. The distortion of the exposure member can be prevented to enable exposure at high accuracy and, also, with high throughput by holding the exposure member vertically, mask alignment is facilitated, the effect of heat from the light source can be minimized, and the size and the cost of the device can be reduced.
摘要翻译：在其中通过具有形成在其中的预定图案的掩模透射来自光源装置的曝光光，然后通过投影透镜将掩模图案的图像聚焦在由保持机构保持的曝光构件上的投影曝光装置中，沿着水平光轴从光源装置发出曝光光。掩模，投影透镜和曝光构件设置在水平光轴上，并且保持机构形成为使得曝光构件至少在垂直于水平光轴的平面内是可移动的。可以防止暴露部件的变形，能够高精度地进行曝光，并且通过垂直地保持曝光部件的高通过率，也能够进行掩模对准，可以将来自光源的热量的效果最小化，可以降低设备的成本。

2. 发明授权

US5061956A Optically imaging method and apparatus 失效
标题翻译：光学成像方法和装置
公开(公告)号：US5061956A
公开(公告)日：1991-10-29
申请号：US491505
申请日：1990-03-12
申请人： Minoru Takubo , Toshio Fukasawa , Tatsuo Yamanaka
发明人： Minoru Takubo , Toshio Fukasawa , Tatsuo Yamanaka
IPC分类号： G03F1/76 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70091 , G03F7/70241 , G03F7/70425
摘要： An optically imaging method and an apparatus therefor are disclosed. The illuminating lens and first imaging lens of an optical lens system comprising the four lenses of first and second illuminating lenses and first and second imaging lenses sandwich a pattern source. Moving the second illuminating lens and first imaging lens in unit with a distance therebetween fixed can image a pattern image at a desired magnification at an image point of the second imaging lens falling within an allowable object space focal depth and produce an illuminant image of an illuminant falling within an allowable entrance pupil position range of a projection lens so that an opening ratio of the illuminant image falls within a predetermined range. An illuminant image of a high contrast and a good telecentricity is produced. In a magnification adjustment of the pattern image, a distance between the second imaging lens and projection lens need not be corrected but the second illuminating lens and first imaging lens may be simply moved in unit.
摘要翻译：公开了一种光学成像方法及其装置。包括第一和第二照明透镜的四个透镜以及第一和第二成像透镜的光学透镜系统的照明透镜和第一成像透镜夹着图案源。将第二照明透镜和第一成像透镜以固定的距离单位移动可以在第二成像透镜的允许对象空间焦深内的图像点处以期望的倍率对图案图像进行成像，并且产生光源的光源图像落在投影透镜的容许入射光瞳位置范围内，使得照明图像的开口率落在预定范围内。产生高对比度和良好远心度的光源图像。在图案图像的倍率调整中，不需要校正第二成像透镜和投影透镜之间的距离，而是可以简单地移动第二照明透镜和第一成像透镜。

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