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1. 发明授权

US07361604B2 Method for reducing dimensions between patterns on a hardmask 有权
标题翻译：减少硬掩模上图案之间尺寸的方法
公开(公告)号：US07361604B2
公开(公告)日：2008-04-22
申请号：US10465852
申请日：2003-06-20
申请人： Henry Wei-Ming Chung , Shin-Yi Tsai , Ming-Chung Liang
发明人： Henry Wei-Ming Chung , Shin-Yi Tsai , Ming-Chung Liang
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： G03F7/405 , H01L21/0274 , H01L21/0332 , H01L21/0335 , H01L21/0338
摘要： A semiconductor manufacturing method that includes depositing a first layer over a substrate, providing a layer of hardmask over the first layer, patterning and defining the hardmask layer to form at least two hardmask structures, wherein each hardmask structure includes at least one substantially vertical sidewall and one substantially horizontal top, and wherein the hardmask structures are separated by a first space, depositing a photo-insensitive material over the at least two hardmask structures and the first layer, wherein an amount of the photo-insensitive material deposited on the top of the hardmask structures is substantially greater than an amount of the photo-insensitive material deposited on the at least one sidewall of the hardmask structures, wherein the hardmask structures with the photo-insensitive layer on the sidewalls thereof are separated by a second space, and wherein the first space is greater than the second space.
摘要翻译：一种半导体制造方法，包括在衬底上沉积第一层，在所述第一层上提供硬掩模层，图案化和限定所述硬掩模层以形成至少两个硬掩模结构，其中每个硬掩模结构包括至少一个基本垂直的侧壁和一个基本上水平的顶部，并且其中所述硬掩模结构由第一空间分开，在所述至少两个硬掩模结构和所述第一层上沉积光敏材料，其中一定量的光敏材料沉积在硬掩模结构基本上大于沉积在硬掩模结构的至少一个侧壁上的不敏感光材料的量，其中在其侧壁上具有光不敏感层的硬掩模结构被第二空间隔开，并且其中第一空间大于第二空间。

2. 发明授权

US07033948B2 Method for reducing dimensions between patterns on a photoresist 有权
公开(公告)号：US07033948B2
公开(公告)日：2006-04-25
申请号：US10739049
申请日：2003-12-19
申请人： Henry Wei-Ming Chung , Shin-Yi Tsai , Ming-Chung Liang
发明人： Henry Wei-Ming Chung , Shin-Yi Tsai , Ming-Chung Liang
IPC分类号： H01L21/302
CPC分类号： H01L21/0274 , G03F7/405 , H01L21/0332 , H01L21/0335 , H01L21/0338 , Y10S438/947 , Y10S438/951
摘要： A semiconductor manufacturing method that includes defining a substrate, depositing a polysilicon layer over the substrate, depositing a layer of photoresist over the polysilicon layer, patterning and defining the photoresist layer, depositing a layer of inorganic material over the patterned and defined photoresist layer, wherein the layer of inorganic material is conformal and photo-insensitive, and anisotropic etching the layer of inorganic material and the layer of semiconductor material.

3. 发明授权

US07303995B2 Method for reducing dimensions between patterns on a photoresist 有权
标题翻译：降低光致抗蚀剂图案之间尺寸的方法
公开(公告)号：US07303995B2
公开(公告)日：2007-12-04
申请号：US10465850
申请日：2003-06-20
申请人： Henry Wei-Ming Chung , Shin-Yi Tsai , Ming-Chung Liang
发明人： Henry Wei-Ming Chung , Shin-Yi Tsai , Ming-Chung Liang
IPC分类号： H01L21/311 , H01L21/302
CPC分类号： G03F7/405 , H01L21/0274 , H01L21/0332 , H01L21/0335 , H01L21/0338
摘要： A semiconductor manufacturing method that includes providing a substrate, providing a layer of material over the substrate, providing a layer of photoresist over the material layer, patterning and defining the photoresist layer, depositing a layer of polymer over the patterned and defined photoresist layer, wherein the layer of polymer is conformal and photo-insensitive, and etching the layer of polymer and the layer of material.
摘要翻译：一种半导体制造方法，其包括提供衬底，在所述衬底上提供材料层，在所述材料层上提供光致抗蚀剂层，图案化和限定所述光致抗蚀剂层，在所述图案化和限定的光致抗蚀剂层上沉积聚合物层，其中聚合物层是共形和不敏感的，并且蚀刻聚合物层和材料层。

4. 发明授权

US06750150B2 Method for reducing dimensions between patterns on a photoresist 有权
公开(公告)号：US06750150B2
公开(公告)日：2004-06-15
申请号：US09978546
申请日：2001-10-18
申请人： Henry Wei-Ming Chung , Shin-Yi Tsai , Ming-Chung Liang
发明人： Henry Wei-Ming Chung , Shin-Yi Tsai , Ming-Chung Liang
IPC分类号： H01L211302
CPC分类号： H01L21/0274 , G03F7/405 , H01L21/0332 , H01L21/0335 , H01L21/0338 , Y10S438/947 , Y10S438/951
摘要： A semiconductor manufacturing method that includes defining a substrate, depositing a polysilicon layer over the substrate, depositing a layer of photoresist over the polysilicon layer, patterning and defining the photoresist layer, depositing a layer of inorganic material over the patterned and defined photoresist layer, wherein the layer of inorganic material is conformal and photo-insensitive, and anisotropic etching the layer of inorganic material and the layer of semiconductor material.

5. 发明授权

US11360519B2 Electronic device 有权
公开(公告)号：US11360519B2
公开(公告)日：2022-06-14
申请号：US16782078
申请日：2020-02-05
申请人： Ming-Chung Peng , Jih-Houng Lee , Ko-Fan Chen , Hsin-Yu Huang
发明人： Ming-Chung Peng , Jih-Houng Lee , Ko-Fan Chen , Hsin-Yu Huang
IPC分类号： G06F1/16 , H05K7/14 , H05K5/03
摘要： An electronic device includes a first body, a second body, at least one hinge, and at least one electronic assembly. The hinge is connected between the first body and the second body, and the first body and the second body are adapted to rotate relatively through the hinge. The electronic assembly is connected to the second body. A first gap exists between the electronic assembly and the hinge in an axial direction of the hinge.

6. 外观设计

USD941385S1 Projector equipped with a lamp 有权
公开(公告)号：USD941385S1
公开(公告)日：2022-01-18
申请号：US29697896
申请日：2019-07-12
申请人： Yu-Hsin Chen , Hsing-Yi Kao , Ming-Chung Liu
设计人： Yu-Hsin Chen , Hsing-Yi Kao , Ming-Chung Liu

7. 发明授权

US10802548B2 Electronic device 有权
公开(公告)号：US10802548B2
公开(公告)日：2020-10-13
申请号：US16127235
申请日：2018-09-11
申请人： Tung-Ying Wu , Ming-Chung Liu , Kuan-Chang Lee
发明人： Tung-Ying Wu , Ming-Chung Liu , Kuan-Chang Lee
IPC分类号： G06F1/16
摘要： An electronic device including a first body and a second body pivoted to each other is provided. The first body includes a frame, a display assembled an inner side of the frame, and a latch assembly disposed within the frame to lock or release the display. When the first body and the second body are rotated relatively to a tent position, the display is released by the latch assembly so as to be moved along the frame.

8. 外观设计

USD888132S1 Projector equipped with functional module 有权
公开(公告)号：USD888132S1
公开(公告)日：2020-06-23
申请号：US29673225
申请日：2018-12-13
申请人： Hsing-Yi Kao , Ming-Chung Liu , Shih-Neng Hong
设计人： Hsing-Yi Kao , Ming-Chung Liu , Shih-Neng Hong
摘要： FIG. 1 is a perspective view of a projector equipped with functional module showing our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a left side view thereof;
FIG. 5 is a right side view thereof;
FIG. 6 is a top view thereof;
FIG. 7 is a bottom view thereof;
FIG. 8 is a perspective view thereof in a state which the support, the projecting module and the functional module are moved;
FIG. 9 is a front view thereof in a state which the support, the projecting module and the functional module are moved;
FIG. 10 is a rear view thereof in a state which the support, the projecting module and the functional module are moved;
FIG. 11 is a left side view thereof in a state which the support, the projecting module and the functional module are moved;
FIG. 12 is a right side view thereof in a state which the support, the projecting module and the functional module are moved;
FIG. 13 is a top view thereof in a state which the support, the projecting module and the functional module are moved;
FIG. 14 is a bottom view thereof in a state which the support, the projecting module and the functional module are moved;
FIG. 15 is a perspective view thereof in a using state which the projecting module and the functional module are combined with each other;
FIG. 16 is a front view thereof in a using state which the projecting module and the functional module are combined with each other;
FIG. 17 is a rear view thereof in a using state which the projecting module and the functional module are combined with each other;
FIG. 18 is a left side view thereof in a using state which the projecting module and the functional module are combined with each other;
FIG. 19 is a right side view thereof in a using state which the projecting module and the functional module are combined with each other;
FIG. 20 is a top view thereof in a using state which the projecting module and the functional module are combined with each other; and,
FIG. 21 is a bottom view thereof in a using state which the projecting module and the functional module are combined with each other.
The dashed broken lines depict portions of the projector equipped with functional module and form no part of the claimed design. The dot-dash broken lines define the bounds of the claimed design and form no part thereof.

9. 发明授权

US10571959B2 Rotation resetting device and electronic apparatus 有权
公开(公告)号：US10571959B2
公开(公告)日：2020-02-25
申请号：US16282252
申请日：2019-02-21
申请人： Chen-Yu Liao , Chun-Yi Ho , Huai-Te Tseng , Shih-Chin Chou , Ming-Chung Peng
发明人： Chen-Yu Liao , Chun-Yi Ho , Huai-Te Tseng , Shih-Chin Chou , Ming-Chung Peng
IPC分类号： G06F1/16 , H05K5/02
摘要： A rotation resetting device and an electronic apparatus are provided. The rotation resetting device includes a functional unit, a limiting block and an elastic unit. The functional unit includes a functional element and a supporting element connected to the functional element, wherein the supporting element includes a limiting gasket. The limiting block has an accommodating space with an opening and a taper chute extending downward from the opening. The elastic unit is located in the accommodating space and connected between the limiting block and the functional unit. The functional unit is movably disposed in the accommodating space and is capable of moving between an use position and a storage position relative to the opening. When the functional unit moves from the use position to the storage position, the limiting gasket abuts the taper chute, and rotates and slides downward along the taper chute while compressing the elastic unit.

10. 发明申请

US20190334282A1 ELECTRONIC ASSEMBLY 审中-公开
公开(公告)号：US20190334282A1
公开(公告)日：2019-10-31
申请号：US16280048
申请日：2019-02-20
申请人： Yun Bai , Ming-Chung Liu , Yu-Ning Chang , Hong-Tien Wang , Shih-Chin Chou
发明人： Yun Bai , Ming-Chung Liu , Yu-Ning Chang , Hong-Tien Wang , Shih-Chin Chou
IPC分类号： H01R13/62 , G06F1/16
摘要： An electronic assembly including a first device, a second device, a third device, and a triggering member is provided. The first device has at least one first positioning member, at least one first electrical connector, and at least one second electrical connector. The second device has at least one second positioning member and at least one third electrical connector. The third device has at least one fourth electrical connector. The triggering member is disposed in the third device. The triggering member has a driven portion and a locking portion opposite to each other. In a first state, the first device is detachably assembled and electrically connected to the second device. In a second state, the first device is detachably assembled and electrically connected to the second device, and the first device is also detachably assembled and electrically connected to the third device.

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