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    • 1. 发明授权
    • Method for quantitatively determining the shape of small size protruding
patterns
    • 定量确定小尺寸突出图案形状的方法
    • US4835402A
    • 1989-05-30
    • US131487
    • 1987-12-10
    • Michel Guillaume
    • Michel Guillaume
    • G01B11/24G01B11/02
    • G01B11/02
    • A method for quantitatively determining the shape of a pattern in a layer formed on a substrate comprising several steps is disclosed. The method includes acquiring by means of an optical microscope an image i(X) of said object, the focussing being made at an arbitrary height, calculating through a Fourier transform the frequency spectrum I(X) corresponding to the image, calculating a model M(X) corresponding to an object having a width L, to an optical microscope having characteristic functions T(X) and P(X), and to parameters a and b characterizing the reflective power of the object with respect to the substrate according to the formula:M(X)=b [T(X) sinc.pi.XL-a P(X) cos.pi.XL]where: sincY=(sinY)/Y. The method further includes using initially roughly estimated a, b and L values, calculating for each value of X: D(X)=I(X)-M(X), calculating the summation E of D(X) on the range of the X values considered in the determination of the model, varying a, b and L for having E minimum, and selecting the corresponding L value, whereby the L value corresponding to the arbitrary height of the object onto which the focussing is made.
    • 公开了一种用于定量确定形成在包括几个步骤的衬底上的层中的图案的形状的方法。 该方法包括通过光学显微镜获取所述物体的图像i(X),聚焦在任意高度,通过傅里叶变换计算与图像相对应的频谱I(X),计算模型M (X)对应于具有宽度L的物体的光学显微镜,具有特征函数T(X)和P(X)的光学显微镜,以及表征相对于基板的物体的反射能力的参数a和b, 公式:M(X)= b [T(X)sinc pi XL-a P(X)cos pi XL]其中:sincY =(sinY)/ Y。 该方法还包括使用初始粗略估计的a,b和L值,计算X:D(X)= I(X)-M(X)的每个值,计算D(X)的范围 在确定模型时考虑的X值,变化a,b和L具有E最小值,并且选择相应的L值,由此对应于进行聚焦的物体的任意高度的L值。