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    • 8. 发明授权
    • Method of depositing diamond-like carbon film onto a substrate having a
low melting temperature
    • 将金刚石状碳膜沉积在具有低熔点的基底上的方法
    • US5171607A
    • 1992-12-15
    • US471849
    • 1990-01-29
    • Michael J. Cumbo
    • Michael J. Cumbo
    • B32B9/00C23C14/06C23C14/20C23C14/30C23C14/32C23C14/54G02B1/04G02B1/10G02C7/00
    • C23C14/546C23C14/0605C23C14/32G02B1/105
    • A diamond-like carbon film is deposited on an insulating substrate using a solid carbon source evaporated by an electron beam so as to maintain the substrate temperature below about 150.degree. C. in a differentially evacuated chamber containing a selective etchant gas such as hydrogen. In orer to bombard the substrate with positively charged ions while preventing accumulation of a repulsive surface charge, a radio frequency (RF) electric field is applied to a rotating fixture holding the substrate. The differentially evacuated chamber maintains the atmospheric pressure around the solid carbon source at one end of the chamber at a sufficiently low pressure to prevent loss of electron beam energy and thereby enable vaporization of the carbon while maintaining the substrate at the other end of the chamber at a higher pressure which enables the RF electric field to excite an ion gas plasma around the substrate and thereby facilitate deposition of the diamond-like carbon film. In the preferred embodiment, the differentially evacuated chamber has a bypass manifold connected between the two ends of the chamber. A control system responding to pressure sensing apparatus inside the chamber governs the position of a butterfly valve in the bypass manifold to regulate the differential pressure in the chamber. In order to keep the substrate temperature below about 150.degree., the rotating fixture holding the substrate is water-cooled.
    • 使用通过电子束蒸发的固体碳源将金刚石状碳膜沉积在绝缘基板上,以便在含有诸如氢的选择性蚀刻剂气体的差异抽真空室中将基板温度保持在低于约150℃。 为了以正电荷离子轰击衬底,同时防止排斥表面电荷的累积,射频(RF)电场被施加到保持衬底的旋转夹具上。 差异抽真空的腔室在足够低的压力下保持腔体一端的固体碳源周围的大气压力,以防止电子束能量的损失,从而使得能够汽化碳,同时将衬底保持在腔室的另一端 更高的压力使RF电场能够激发衬底周围的离子气体等离子体,从而促进类金刚石碳膜的沉积。 在优选实施例中,差异抽真空室具有连接在腔室两端之间的旁通歧管。 响应于室内的压力感测装置的控制系统控制旁通歧管中的蝶阀的位置,以调节室中的压差。 为了使基板温度保持在150度以下,保持基板的旋转夹具是水冷的。