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    • 1. 发明授权
    • Unitary floating-gate electrode with both N-type and P-type gates
    • 具有N型和P型门的单一浮栅电极
    • US08178915B1
    • 2012-05-15
    • US13070263
    • 2011-03-23
    • Allan T. MitchellImran Mahmood KhanMichael A. Wu
    • Allan T. MitchellImran Mahmood KhanMichael A. Wu
    • H01L27/108
    • H01L21/28273H01L27/0805H01L27/11521H01L27/11558H01L29/42324H01L29/66825H01L29/7881
    • An analog floating-gate electrode in an integrated circuit, and method of fabricating the same, in which trapped charge can be stored for long durations. The analog floating-gate electrode is formed in a polycrystalline silicon gate level, and includes n-type and p-type doped portions serving as gate electrodes of n-channel and p-channel MOS transistors, respectively; a plate of a metal-to-poly storage capacitor; and a plate of poly-to-active tunneling capacitors. Silicide-block silicon dioxide blocks the formation of silicide cladding on the electrode, while other polysilicon structures in the integrated circuit are silicide-clad. An opening at the surface of the analog floating-gate electrode, at the location at which n-type and p-type doped portions of the floating gate electrode abut, allow formation of silicide at that location, shorting the p-n junction.
    • 集成电路中的模拟浮栅电极及其制造方法,其中捕获的电荷可以长时间存储。 模拟浮栅电极形成为多晶硅栅极电平,并且分别包括用作n沟道和p沟道MOS晶体管的栅电极的n型和p型掺杂部分。 金属对多晶硅储存电容器的板; 以及一块多至多层隧道电容器。 硅化物阻挡二氧化硅阻止在电极上形成硅化物包层,而集成电路中的其它多晶硅结构是硅化物包覆的。 在模拟浮栅电极的表面处,在浮栅电极的n型和p型掺杂部分邻接的位置处的开口允许在该位置形成硅化物,使p-n结短路。
    • 2. 发明授权
    • Zero-power sampling SAR ADC circuit and method
    • 零功率采样SAR ADC电路及方法
    • US08581770B2
    • 2013-11-12
    • US13068192
    • 2011-05-04
    • Yan WangTimothy V. KalthoffMichael A. Wu
    • Yan WangTimothy V. KalthoffMichael A. Wu
    • H03M1/12
    • H03M1/1295H03M1/468
    • A switched-capacitor circuit (10, 32 or 32A) samples a first signal (VIN+) onto a first capacitor (C1 or CIN1) by switching a top plate thereof via a summing conductor (13) to a first reference voltage (VSS) and switching a bottom plate thereof to the first signal. A second signal (VIN−) is sampled onto a second capacitor (C3 or CIN3) by switching a top plate thereof to the second signal and switching a bottom plate thereof to the first reference voltage. After the sampling, the top plate of the second capacitor is coupled to the top plate of the first capacitor. The bottom plate of the second capacitor is coupled to the first reference voltage. The bottom plate of the first capacitor is coupled to a second reference voltage (VDD or VREF), to thereby cancel at least a portion of a common mode input voltage component from the first conductor (13), hold the sampled differential charge on the summing conductor and establish a predetermined common mode voltage thereon, and prevent the summing conductor from having a voltage which allows the leakage of charge therefrom. The switched-capacitor circuit may be a SAR, an integrator, or an amplifier.
    • 开关电容器电路(10,32或32A)通过将加法导体(13)的顶板切换到第一参考电压(VSS)而将第一信号(VIN +)采样到第一电容器(C1或CIN1)上,并且 将其底板切换到第一信号。 将第二信号(VIN-)通过将其顶板切换到第二信号并将其底板切换到第一参考电压而被采样到第二电容器(C3或CIN3)上。 在采样之后,第二电容器的顶板耦合到第一电容器的顶板。 第二电容器的底板耦合到第一参考电压。 第一电容器的底板耦合到第二参考电压(VDD或VREF),从而从第一导体(13)消除共模输入电压分量的至少一部分,将采样的差分电荷保持在求和 并在其上建立预定的共模电压,并且防止求和导体具有允许从其中泄漏电荷的电压。 开关电容电路可以是SAR,积分器或放大器。
    • 3. 发明申请
    • Zero-power sampling SAR ADC circuit and method
    • 零功率采样SAR ADC电路及方法
    • US20120280841A1
    • 2012-11-08
    • US13068192
    • 2011-05-04
    • Yan WangTimothy V. KalthoffMichael A. Wu
    • Yan WangTimothy V. KalthoffMichael A. Wu
    • H03M1/12H03M1/00
    • H03M1/1295H03M1/468
    • A switched-capacitor circuit (10, 32 or 32A) samples a first signal (VIN+) onto a first capacitor (C1 or CIN1) by switching a top plate thereof via a summing conductor (13) to a first reference voltage (VSS) and switching a bottom plate thereof to the first signal. A second signal (VIN−) is sampled onto a second capacitor (C3 or CIN3) by switching a top plate thereof to the second signal and switching a bottom plate thereof to the first reference voltage. After the sampling, the top plate of the second capacitor is coupled to the top plate of the first capacitor. The bottom plate of the second capacitor is coupled to the first reference voltage. The bottom plate of the first capacitor is coupled to a second reference voltage (VDD or VREF), to thereby cancel at least a portion of a common mode input voltage component from the first conductor (13), hold the sampled differential charge on the summing conductor and establish a predetermined common mode voltage thereon, and prevent the summing conductor from having a voltage which allows the leakage of charge therefrom. The switched-capacitor circuit may be a SAR, an integrator, or an amplifier.
    • 开关电容器电路(10,32或32A)通过将加法导体(13)的顶板切换到第一参考电压(VSS)而将第一信号(VIN +)采样到第一电容器(C1或CIN1)上,并且 将其底板切换到第一信号。 将第二信号(VIN-)通过将其顶板切换到第二信号并将其底板切换到第一参考电压而被采样到第二电容器(C3或CIN3)上。 在采样之后,第二电容器的顶板耦合到第一电容器的顶板。 第二电容器的底板耦合到第一参考电压。 第一电容器的底板耦合到第二参考电压(VDD或VREF),从而从第一导体(13)消除共模输入电压分量的至少一部分,将采样的差分电荷保持在求和 并在其上建立预定的共模电压,并且防止求和导体具有允许从其中泄漏电荷的电压。 开关电容电路可以是SAR,积分器或放大器。
    • 7. 发明授权
    • High voltage power supply for an X-ray tube
    • 用于X射线管的高压电源
    • US5400385A
    • 1995-03-21
    • US116143
    • 1993-09-02
    • James A. BlakeJonathan R. SchmidtMichael A. Wu
    • James A. BlakeJonathan R. SchmidtMichael A. Wu
    • H05G1/20H05G1/32H05G1/34
    • H05G1/20H05G1/32
    • A supply for a high bias voltage in an X-ray imaging system has an inverter and a voltage multiplier that produce an alternating output voltage in response to control signals. A voltage sensor produces a signal indicating a magnitude of the output voltage. A circuit determines a difference between the sensor signal and a reference signal that specifies a desired magnitude for the output voltage and that difference is integrated to produce an error signal. The error signal preferably is summed with a precondition signal that is an approximation of a nominal value for the signal sum and the summation producing a resultant signal. Another summation device arithmetically combines the resultant signal and the sensor signal with a signal corresponding to a one-hundred percent duty cycle of the inverter operation in order to produce a duty cycle command. An inverter driver generates the inverter control signals that have frequencies defined by the resultant signal and have duty cycles defined by the duty cycle command. A unique state machine is described which generates those control signals.
    • 用于X射线成像系统中的高偏置电压的电源具有反相器和电压倍增器,其响应于控制信号而产生交流输出电压。 电压传感器产生指示输出电压大小的信号。 电路确定传感器信号和指定输出电压的期望幅度的参考信号之间的差异,并且该差被积分以产生误差信号。 误差信号优选地与作为信号和的标称值的近似值的预处理信号和产生结果信号的求和相加。 另一个求和装置将得到的信号和传感器信号与对应于逆变器操作的百分之一百的占空比的信号进行算术组合,以产生占空比指令。 逆变器驱动器产生具有由结果信号定义的频率并具有由占空比指令定义的占空比的逆变器控制信号。 描述了生成这些控制信号的独特的状态机。
    • 8. 发明授权
    • Unitary floating-gate electrode with both N-type and P-type gates
    • 具有N型和P型门的单一浮栅电极
    • US08716083B2
    • 2014-05-06
    • US13359253
    • 2012-01-26
    • Allan T. MitchellImran Mahmood KhanMichael A. Wu
    • Allan T. MitchellImran Mahmood KhanMichael A. Wu
    • H01L21/336
    • H01L21/28273H01L27/0805H01L27/11521H01L27/11558H01L29/42324H01L29/66825H01L29/7881
    • An analog floating-gate electrode in an integrated circuit, and method of fabricating the same, in which trapped charge can be stored for long durations. The analog floating-gate electrode is formed in a polycrystalline silicon gate level, and includes n-type and p-type doped portions serving as gate electrodes of n-channel and p-channel MOS transistors, respectively; a plate of a metal-to-poly storage capacitor; and a plate of poly-to-active tunneling capacitors. Silicide-block silicon dioxide blocks the formation of silicide cladding on the electrode, while other polysilicon structures in the integrated circuit are silicide-clad. An opening at the surface of the analog floating-gate electrode, at the location at which n-type and p-type doped portions of the floating gate electrode abut, allow formation of silicide at that location, shorting the p-n junction.
    • 集成电路中的模拟浮栅电极及其制造方法,其中捕获的电荷可以长时间存储。 模拟浮栅电极形成为多晶硅栅极电平,并且分别包括用作n沟道和p沟道MOS晶体管的栅电极的n型和p型掺杂部分。 金属对多晶硅储存电容器的板; 以及一块多至多层隧道电容器。 硅化物阻挡二氧化硅阻止在电极上形成硅化物包层,而集成电路中的其它多晶硅结构是硅化物包覆的。 在模拟浮栅电极的表面处,在浮栅电极的n型和p型掺杂部分邻接的位置处的开口允许在该位置形成硅化物,使p-n结短路。