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    • 1. 发明授权
    • Electrostatic discharge protective device
    • 静电放电保护装置
    • US09136229B2
    • 2015-09-15
    • US14130427
    • 2012-08-09
    • Meng Dai
    • Meng Dai
    • H01L29/66H01L23/60H01L29/74H01L27/02
    • H01L23/60H01L27/0262H01L29/7436H01L2924/0002H01L2924/00
    • An electrostatic discharge (ESD) protection device is provided. A proper trigger voltage is determined by providing an ESD doped injection layer into a PNPN structure and adjusting the injection energy and dosage of the ESD doped injection layer; a proper holding voltage is obtained by adjusting the size of the ESD doped injection layer, thus preventing the latch-up. The self-isolation effect of the electrostatic discharge protection device is formed on the basis of an epitaxial wafer high voltage process or a silicon-on-insulator (SOI) wafer high voltage process, the ESD protective device of the present invention can prevent the device from being falsely triggered due to noise interference. Compared with other known ESD protection devices, the device has the same electrostatic protection ability, much smaller area, and much lower cost.
    • 提供一种静电放电(ESD)保护装置。 通过将ESD掺杂注入层提供到PNPN结构中并调整ESD掺杂注入层的注入能量和剂量来确定适当的触发电压; 通过调整ESD掺杂注入层的尺寸来获得适当的保持电压,从而防止闩锁。 基于外延晶片高压工艺或绝缘体上硅(SOI)晶片高压工艺,形成静电放电保护器件的自隔离效果,本发明的ESD保护器件可以防止器件 由于噪音干扰而被误导。 与其他已知的ESD保护器件相比,该器件具有相同的静电保护能力,面积小得多,成本低得多。
    • 4. 发明申请
    • ELECTROSTATIC DISCHARGE PROTECTIVE DEVICE
    • 静电放电保护装置
    • US20140151745A1
    • 2014-06-05
    • US14130427
    • 2012-08-09
    • Meng Dai
    • Meng Dai
    • H01L23/60
    • H01L23/60H01L27/0262H01L29/7436H01L2924/0002H01L2924/00
    • An electrostatic discharge (ESD) protection device is provided. A proper trigger voltage is determined by providing an ESD doped injection layer into a PNPN structure and adjusting the injection energy and dosage of the ESD doped injection layer; a proper holding voltage is obtained by adjusting the size of the ESD doped injection layer, thus preventing the latch-up. The self-isolation effect of the electrostatic discharge protection device is formed on the basis of an epitaxial wafer high voltage process or a silicon-on-insulator (SOI) wafer high voltage process, the ESD protective device of the present invention can prevent the device from being falsely triggered due to noise interference. Compared with other known ESD protection devices, the device has the same electrostatic protection ability, much smaller area, and much lower cost.
    • 提供静电放电(ESD)保护装置。 通过将ESD掺杂注入层提供到PNPN结构中并调整ESD掺杂注入层的注入能量和剂量来确定适当的触发电压; 通过调整ESD掺杂注入层的尺寸来获得适当的保持电压,从而防止闩锁。 基于外延晶片高压工艺或绝缘体上硅(SOI)晶片高压工艺,形成静电放电保护器件的自隔离效果,本发明的ESD保护器件可以防止器件 由于噪音干扰而被误导。 与其他已知的ESD保护器件相比,该器件具有相同的静电保护能力,面积小得多,成本低得多。