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1. 发明申请

US20050287927A1 Method to monitor pad wear in CMP processing 有权
标题翻译：在CMP处理中监测焊盘磨损的方法
公开(公告)号：US20050287927A1
公开(公告)日：2005-12-29
申请号：US10879629
申请日：2004-06-29
申请人： Michael Berman , Steven Reder , Matthew Trattles
发明人： Michael Berman , Steven Reder , Matthew Trattles
IPC分类号： B24B37/04 , B24B49/10 , B24B49/12 , B24B55/00 , B24B49/00
CPC分类号： B24B55/00 , B24B37/04 , B24B49/10 , B24B49/12
摘要： A pad groove analyzer and associated method configured to assess the grooves on the pad and determine how worn the pad is. The pad groove analyzer may be configured to monitor the grooves via a contact or no-contact process. In a contact process, the pad groove analyzer may include a stylus which physically contacts and moves along the pad. As the stylus falls into the grooves in the pad as the stylus moves along the pad, signals are created, and a stylus monitor uses the signals to determine to what extent the pad is worn. The stylus monitor can be configured to communicate with the general tool controller. In a no-contact process, the pad groove analyzer may take several different forms.
摘要翻译：衬垫槽分析器和相关联的方法被配置为评估衬垫上的凹槽并确定衬垫的磨损程度。垫槽分析器可以被配置为通过接触或非接触过程来监测凹槽。在接触处理中，垫槽分析器可以包括物理接触并沿着垫移动的触笔。当触控笔沿着焊盘移动时，触针落入焊盘中的凹槽中，产生信号，并且触针监视器使用信号来确定焊盘在多大程度上被磨损。触控笔监视器可以配置为与通用工具控制器进行通信。在无接触过程中，焊盘槽分析仪可以采取几种不同的形式。

2. 发明申请

US20060073773A1 High pressure pad conditioning 审中-公开
标题翻译：高压垫调节
公开(公告)号：US20060073773A1
公开(公告)日：2006-04-06
申请号：US10957787
申请日：2004-10-04
申请人： Richard Exley , Matthew Trattles
发明人： Richard Exley , Matthew Trattles
IPC分类号： B24B1/00
CPC分类号： B24B53/017
摘要： An apparatus for conditioning a polishing pad. A turntable is mounted to a frame, where the turntable is adapted to receive and rotate the polishing pad. A conditioning head is also mounted to the frame, where the conditioning head is adapted to spray a liquid from the conditioning head against the polishing pad at a pressure that is sufficient to dislodge eroded material from the polishing pad. In this manner, a sufficiently abrasive spray can be generated, which can release the loaded material from the polishing pad, and otherwise condition the polishing pad. The spray also enables the released material to be washed away from the pad. In addition, because the abrasive action is provided by the force of the spray, there are no abrasive particles that can break free from the conditioning head and disrupt the desired operation of the pad.
摘要翻译：一种用于调节抛光垫的装置。转盘安装在框架上，转台适于接收和旋转抛光垫。调节头也安装在框架上，其中调节头适于将液体从调节头喷射到抛光垫上，压力足以将磨蚀的材料从抛光垫移走。以这种方式，可以产生足够磨蚀的喷雾，其可以从抛光垫释放负载的材料，并且否则调节抛光垫。喷雾还使得释放的材料被从衬垫上冲走。此外，由于磨料作用是通过喷雾的力量来提供的，所以没有磨损颗粒可以从调节头脱离并破坏垫的期望操作。

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