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1. 发明授权

US6121580A Lamp annealer and method for annealing semiconductor wafer 失效
标题翻译：灯退火炉及半导体晶圆退火方法
公开(公告)号：US6121580A
公开(公告)日：2000-09-19
申请号：US281113
申请日：1999-03-29
申请人： Masayuki Tsukamoto
发明人： Masayuki Tsukamoto
IPC分类号： H01L21/26 , C30B31/12 , F27B5/14
CPC分类号： C30B31/12
摘要： A lamp annealer for heating and annealing product wafers loaded into a chamber by a lamp means. The lamp annealer comprises a first chamber for loading product wafers, a second chamber disposed adjacent to the first chamber for loading only a dummy wafer, a pyrometer means for measuring a temperature of a wafer in the first chamber and a temperature of a wafer in the second chamber, and a lamp means for heating the wafer in the first chamber and the wafer in the second chamber. Periodically, dummy wafers are loaded into the first and second chambers, temperatures of the dummy wafer in the first chamber and the dummy wafer in the second chamber which are both heated by the lamp means are measured by the pyrometer means, and, when product wafers are annealed, intensity of light of the lamp is compensated based on a difference between the temperatures.
摘要翻译：一种用于通过灯装置加热和退火加载到室中的产品晶片的灯退火炉。灯退火炉包括用于加载产品晶片的第一室，邻近第一室设置的第二室，用于仅加载虚设晶片，用于测量第一室中的晶片的温度的高温计装置以及第一室中的晶片的温度第二室，以及用于加热第一室中的晶片和第二室中的晶片的灯装置。周期地将虚拟晶片装载到第一和第二室中，通过高温计测量第一室中的虚拟晶片和第二室中的虚拟晶片的温度，所述温度均由灯装置加热，并且当产品晶片基于温度之间的差异来补偿灯的亮度。

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