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1. 发明授权

US06762229B2 Polyarylene sulfide resin composition 失效
标题翻译：聚芳硫醚树脂组合物
公开(公告)号：US06762229B2
公开(公告)日：2004-07-13
申请号：US09308491
申请日：1999-05-20
申请人： Naomitsu Nishihata , Masahito Tada , Hiroyuki Sato , Kiyomi Ohuchi
发明人： Naomitsu Nishihata , Masahito Tada , Hiroyuki Sato , Kiyomi Ohuchi
IPC分类号： C08J300
CPC分类号： C08K5/20 , C08L81/02
摘要： A poly(arylene sulfide) resin composition comprising a poly(arylene sulfide) and, as a modifier, an organic amide compound compounded in a proportion of 0.2 to 10 parts by weight per 100 parts by weight of the poly(arylene sulfide).
摘要翻译：一种聚（亚芳基硫醚）树脂组合物，其包含聚（亚芳基硫醚）和作为改性剂的有机酰胺化合物，所述有机酰胺化合物以每100重量份聚（亚芳基硫醚）为0.2-10重量份的比例混合。

2. 发明授权

US6130279A Resin composition 失效
标题翻译：树脂组成
公开(公告)号：US6130279A
公开(公告)日：2000-10-10
申请号：US284580
申请日：1999-04-15
申请人： Keiichiro Suzuki , Masahito Tada
发明人： Keiichiro Suzuki , Masahito Tada
IPC分类号： C08K3/22 , C08K3/28 , C08K3/38 , C08K5/52
CPC分类号： C08K3/22 , Y10S435/809 , Y10S436/809
摘要： A resin composition comprising a poly(phenylene sulfide) resin and .alpha.-alumina, wherein the composition comprises (A) 15 to 45 wt. % of a poly(phenylene sulfide) resin having a melt viscosity of 5 to 100 Pa.multidot.s as measured at 310.degree. C. and a shear rate of 1200/sec, and (B) 85 to 55 wt. % of .alpha.-alumina which contains .alpha.-alumina composed of .alpha.-crystals having an average particle size of at least 5 .mu.m in a proportion of at least 40 wt. %.
摘要翻译： PCT No.PCT / JP97 / 03739 Sec。 371 1999年4月15日第 102（e）1999年4月15日PCT PCT 1997年10月16日PCT公布。出版物WO98 / 16585 日期：1998年04月23日一种包含聚（苯硫醚）树脂和α-氧化铝的树脂组合物，其中所述组合物包含（A）15至45重量％％的聚（苯硫醚）树脂，其在310℃下测定的熔体粘度为5〜100Pax，剪切速度为1200 /秒，（B）为85〜55重量％。％的α-氧化铝，其含有以至少为40重量％的平均粒度至少为5微米的α-晶体组成的α-氧化铝。％。

3. 发明授权

US5562852A Resin magnetic compound and molded article thereof 失效
标题翻译：树脂磁性复合物及其成型体
公开(公告)号：US5562852A
公开(公告)日：1996-10-08
申请号：US270420
申请日：1994-07-05
申请人： Masahito Tada , Keiichiro Suzuki
发明人： Masahito Tada , Keiichiro Suzuki
IPC分类号： H01F1/08 , H01F1/113 , H01F1/00 , H01F1/26
CPC分类号： H01F1/083 , H01F1/113
摘要： A resin magnetic compound is disclosed, comprising (i) from 65 to 77% by weight of a magnetic powder having been surface treated with from 0.01 to 5% by weight, based on the magnetic powder, of a mercaptosilane represented by the following formula (I) or a hydrolysis product of the mercaptosilane:(RO).sub.n R'.sub.(3-n) SiR"SH (I)wherein R and R' each represents an alkyl group having 1 or 2 carbon atoms; R" represents an alkylene group having from 2 to 6 carbon atoms; and n represents 2 or 3, (ii) from 14 to 30% by weight of polyphenylene sulfide resin, and (iii) from 9 to 21% by weight of glass fiber. The resin magnetic compound and a molded article obtained from the compound are excellent in thermal shock resistance, magnetic characteristics, and heat resistance.
摘要翻译：公开了一种树脂磁性化合物，其包含（i）65〜77重量％的以磁铁粉为基准，以0.01〜5重量％进行表面处理的磁性粉末的下式所示的巯基硅烷（ I）或巯基硅烷的水解产物：（RO）nR'（3-n）SiR''SH（I）其中R和R'各自表示具有1或2个碳原子的烷基; R“表示碳原子数2〜6的亚烷基。 n表示2或3，（ii）14〜30重量％的聚苯硫醚树脂，（iii）9〜21重量％的玻璃纤维。树脂磁性化合物和由该化合物得到的成型体的耐热冲击性，磁特性和耐热性优异。

4. 发明授权

US4980114A Stretched poly(arylene thioether) block copolymer films and production process thereof 失效
标题翻译：拉伸聚（亚芳基硫醚）嵌段共聚物膜及其制备方法
公开(公告)号：US4980114A
公开(公告)日：1990-12-25
申请号：US501055
申请日：1990-03-27
申请人： Yoshikatsu Satake , Shinji Yamamoto , Takashi Kaneko , Masahito Tada , Ken Kashiwadate , Toshiya Mizuno , Hiroyuki Endo , Takayuki Katto , Zenya Shiiki
发明人： Yoshikatsu Satake , Shinji Yamamoto , Takashi Kaneko , Masahito Tada , Ken Kashiwadate , Toshiya Mizuno , Hiroyuki Endo , Takayuki Katto , Zenya Shiiki
IPC分类号： B29C55/00 , C08G75/02 , C08J5/18 , C08K3/26 , C08K7/14 , C08L27/18 , C08L65/00 , C08L71/00 , C08L79/08 , C08L81/02 , C08L81/06 , C08L101/00
CPC分类号： C08J5/18 , B29C55/005 , C08G75/024 , C08G75/0245 , C08K3/26 , C08K7/14 , C08L81/02 , B29K2081/04 , B29K2105/0085 , C08J2381/02 , C08L101/00 , C08L27/18 , C08L65/00 , C08L71/00 , C08L79/08 , C08L81/06
摘要： Disclosed herein are stretched poly(arylene thioether) block copolymer films and a production processes thereof, said block copolymer film comprising a thermoplastic material composed of (A) 100 parts by weight of a particular poly(arylene thioether) block copolymer, (B) up to 100 parts by weight of at least one other thermoplastic resin, and (C) up to 15 parts by weight of at least one filler. The poly(arylene thioether) block copolymer alternately comprises at least one poly(arylene thioether-ketone) block having predominant recurring units of the formula ##STR1## wherein the --CO-- and --S-- are in the para position to each other and at least one poly(arylene thioether) block having predominant recurring units of the formula ##STR2##

5. 发明授权

US4975479A Heat-resistant thermoplastic resin composition 失效
标题翻译：耐热性热塑性树脂组合物
公开(公告)号：US4975479A
公开(公告)日：1990-12-04
申请号：US424637
申请日：1989-10-20
申请人： Yoshikatsu Satake , Shinji Yamamoto , Takashi Kaneko , Masahito Tada , Ken Kashiwadate , Toshiya Mizuno , Hiroyuki Endo , Takayuki Katto , Zenya Shiiki
发明人： Yoshikatsu Satake , Shinji Yamamoto , Takashi Kaneko , Masahito Tada , Ken Kashiwadate , Toshiya Mizuno , Hiroyuki Endo , Takayuki Katto , Zenya Shiiki
IPC分类号： C08G75/02 , C08K3/26 , C08K7/14 , C08L27/18 , C08L65/00 , C08L71/00 , C08L79/08 , C08L81/02 , C08L81/06 , C08L101/00
CPC分类号： C08K7/14 , C08G75/024 , C08G75/0245 , C08K3/26 , C08L81/02 , C08L101/00 , C08L27/18 , C08L65/00 , C08L71/00 , C08L79/08 , C08L81/06
摘要： Disclosed herein are melt-stable thermoplastic resin compositions comprising (A) 100 parts by weight of a particular poly(arylene thioether) block copolymer, (B) --400 parts by weight of at least one of thermoplastic resins, and (C) 0-400 parts by weight of at least one filler per 100 parts by weight of the resin components. At least either one of Component (B) and Component (C) is contained in a proportion of at least 0.1 part by weight per 100 parts by weight of Component (A). The poly(arylene thioether) block copolymer alternately comprise at least one poly(arylene thioether-ketone) block having predominant recurring units of the formula ##STR1## wherein the --CO-- and --S-- are in the para position to each other and at least one poly(arylene thioether) block having predominant recurring units of the formula ##STR2## Also disclosed are compositions obtained by stabilizing by the melt-stable thermoplastic resin compositions with a basic compound and products molded or formed product from these compositions.

6. 发明授权

US07198734B2 IC socket 有权
标题翻译： IC插座
公开(公告)号：US07198734B2
公开(公告)日：2007-04-03
申请号：US10471118
申请日：2002-03-27
申请人： Naomitsu Nishihata , Masahito Tada
发明人： Naomitsu Nishihata , Masahito Tada
IPC分类号： H01B1/24 , H01R12/14 , H05K7/14
CPC分类号： C08K3/04 , H01R13/22
摘要： The invention provides an IC socket of synthetic resin, whose surface resistivity is strictly controlled to the desired level and which is much more improved in terms of electrical insulation properties, mechanical properties, heat resistance, chemical resistance, dimensional stability, etc. The IC socket is obtained by molding or otherwise forming a thermoplastic resin composition comprising 40 to 94% by mass of a thermoplastic resin, 5 to 30% by mass of a carbon precursor having a volume resistivity of 102 to 1010 Ω·cm and 1 to 30% by mass of an electrical conductive filler having a volume resistivity of less than 102 Ω·cm.
摘要翻译：本发明提供一种合成树脂的IC插座，其表面电阻率被严格控制到所需的水平，并且在电绝缘性能，机械性能，耐热性，耐化学性，尺寸稳定性等方面得到更多改进。通过成型或以其他方式形成包含40〜94质量％的热塑性树脂的热塑性树脂组合物，5〜30质量％的体积电阻率为10〜10重量％的碳前体， SUP〜10Ω·cm，1〜30质量％的体积电阻率小于10Ω·cm的导电填料。

7. 发明授权

US5153279A Poly(arylene thioether) block copolymer and production process thereof 失效
公开(公告)号：US5153279A
公开(公告)日：1992-10-06
申请号：US574849
申请日：1990-08-30
申请人： Yoshikatsu Satake , Shinji Yamamoto , Takashi Kaneko , Masahito Tada , Ken Kashiwadate , Toshiya Mizuno , Hiroyuki Endo , Takayuki Katto , Zenya Shiiki
发明人： Yoshikatsu Satake , Shinji Yamamoto , Takashi Kaneko , Masahito Tada , Ken Kashiwadate , Toshiya Mizuno , Hiroyuki Endo , Takayuki Katto , Zenya Shiiki
IPC分类号： B29C55/00 , C08G75/02 , C08J5/18 , C08K3/22 , C08K3/26 , C08K7/14 , C08L27/18 , C08L65/00 , C08L71/00 , C08L79/08 , C08L81/02 , C08L81/06 , C08L101/00 , D01F6/78
CPC分类号： C08J5/18 , B29C55/005 , C08G75/024 , C08G75/0245 , C08K3/22 , C08K3/26 , C08K7/14 , C08L81/02 , D01F6/78 , B29K2081/04 , B29K2105/0085 , C08J2381/02 , C08L101/00 , C08L27/18 , C08L65/00 , C08L71/00 , C08L79/08 , C08L81/06
摘要： Disclosed herein are a poly(arylene thioether) block copolymer alternately comprising (A) at least one poly(arylene thioether-ketone) block having predominant recurring units of the formula ##STR1## wherein the --CO-- and --S-- are in the para position to each other and (B) at least one poly(arylene thioether) block having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) block (B) to the total amount of the poly(arylene thioether-ketone) block (A) being within a range of 0.05-5 by weight, (b) the average polymerization degree of the poly(arylene thioether) block (B) being at least 10, and (c) said block copolymer having a melt viscosity of 2-100,000 poises as measured at 350.degree. C. and a shear rate of 1,200/sec as well as a production process the poly(arylene thioether) block copolymer. The invention also provides a stabilized poly(arylene thioether) block copolymer containing a basic compound either alone or in combination with an antioxidant.

8. 发明授权

US5120808A Poly(arylene thioether) block copolymer and production process thereof 失效
标题翻译：聚丙烯嵌段共聚物及其制备方法
公开(公告)号：US5120808A
公开(公告)日：1992-06-09
申请号：US424624
申请日：1989-10-20
申请人： Yoshikatsu Satake , Shinji Yamamoto , Takashi Kaneko , Masahito Tada , Ken Kashiwadate , Toshiya Mizuno , Hiroyuki Endo , Takayuki Katto , Zenya Shiiki
发明人： Yoshikatsu Satake , Shinji Yamamoto , Takashi Kaneko , Masahito Tada , Ken Kashiwadate , Toshiya Mizuno , Hiroyuki Endo , Takayuki Katto , Zenya Shiiki
IPC分类号： C08G75/02 , C08K3/22 , C08K3/26 , C08K7/14 , C08L27/18 , C08L65/00 , C08L71/00 , C08L79/08 , C08L81/02 , C08L81/06 , C08L101/00
CPC分类号： C08L81/02 , C08G75/024 , C08G75/0245 , C08K3/22 , C08K3/26 , C08K7/14 , C08L101/00 , C08L27/18 , C08L65/00 , C08L71/00 , C08L79/08 , C08L81/06
摘要： Disclosed herein are a poly(arylene thioether) block copolymer alternately comprising (A) at least one poly(arylene thioether-ketone) block having predominant recurring units of the formula ##STR1## wherein the --CO-- and --S-- are in the para position to each other and (B) at least one poly(arylene thioether) block having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) block (B) to the total amount of the poly(arylene thioether-ketone) block (A) being within a range of 0.05-5 by weight, (b) the average polymerization degree of the poly(arylene thioether) block (B) being at least 10, and (c) said block copolymer having a melt viscosity of 2-00,000 poises as measured at 350.degree. C. and a shear rate of 1,200/sec as well as a production process the poly(arylene thioether) block copolymer. The invention also provides a stabilized poly(arylene thioether) block copolymer containing a basic compound either alone or in combination with an antioxidant.

9. 发明授权

US5045630A Poly(arylene thioether-ketones) improved in melt stability and preparation process thereof 失效
标题翻译：聚（亚芳基硫醚 - 酮）改进了熔体稳定性及其制备方法
公开(公告)号：US5045630A
公开(公告)日：1991-09-03
申请号：US642584
申请日：1991-01-17
申请人： Ken Kashiwadate , Yoshikatsu Satake , Takashi Kaneko , Masahito Tada , Takayuki Katto
发明人： Ken Kashiwadate , Yoshikatsu Satake , Takashi Kaneko , Masahito Tada , Takayuki Katto
IPC分类号： C08G75/02 , C08G75/06
CPC分类号： C08G75/024 , C08G75/0277
摘要： Disclosed herein is a process for the preparation of a poly(arylene thioether-ketone) improved in melt stability, which comprises subjecting a poly(arylene thioether-ketone) (PTK) to a heat treatment for 5-5.times.10.sup.3 minutes in a powdery state and a temperature range of 200.degree.-350.degree. C. The PTK has predominant recurring units of the formula ##STR1## and has a melting point, Tm of 310.degree.-380.degree. C., a melt crystallization temperature, Tmc (420.degree. C./10 min) of at least 210.degree. C., a residual melt crystallization enthalpy, .DELTA.Hmc (420.degree.C./10 min) of at least 10 J/g and a reduced viscosity of 0.2-2.0 dl/g. PTKs improved in melt stability and prepared in accordance with the above-described preparation process are also disclosed.

10. 发明授权

US07208555B2 Process for preparing polyvinylidene fluoride copolymer 有权
标题翻译：制备聚偏二氟乙烯共聚物的方法
公开(公告)号：US07208555B2
公开(公告)日：2007-04-24
申请号：US10528654
申请日：2003-09-17
申请人： Masahito Tada , Takumi Katsurao , Tsukasa Ikeda , Kazuyuki Suzuki
发明人： Masahito Tada , Takumi Katsurao , Tsukasa Ikeda , Kazuyuki Suzuki
IPC分类号： B01D17/04 , B01D21/01 , C08F6/24 , C08F22/38 , B32B27/00 , C02F1/54 , C02F1/66
CPC分类号： C08F214/22 , C08F6/14 , C08F6/24 , C08F8/00 , Y10S526/923 , Y10T428/31544 , Y10T428/31855 , C08L27/16 , C08F14/18
摘要： The present invention provides a polyvinylidene fluoride copolymer capable of forming a uniform film, a solution of the copolymer and a thin film comprising the polyvinylidene fluoride copolymer. The polyvinylidene fluoride copolymer of the present invention is characterized in that the ratio of the scattered-light intensity (I) for a 15% solution of the polyvinylidene fluoride copolymer in dimethylformamide solvent to the scattered-light intensity (I0) for dimethylformamide, (I/I0), is 10 or lower. The polyvinylidene fluoride copolymer solution comprises the polyvinylidene fluoride copolymer and an organic solvent capable of dissolving the copolymer.
摘要翻译：本发明提供能够形成均匀膜的聚偏二氟乙烯共聚物，共聚物溶液和包含聚偏二氟乙烯共聚物的薄膜。本发明的聚偏二氟乙烯共聚物的特征在于，聚偏二氟乙烯共聚物在二甲基甲酰胺溶剂中的15％溶液的散射光强度（I）与散射光强度（I < （II））为10或更低。聚偏二氟乙烯共聚物溶液包含聚偏氟乙烯共聚物和能够溶解共聚物的有机溶剂。

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