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1. 发明授权

US08461532B2 Refraction assisted illumination for imaging 有权
$Refraction assisted illumination for imaging$
标题翻译：折射辅助照明成像
公开(公告)号：US08461532B2
公开(公告)日：2013-06-11
申请号：US12661967
申请日：2010-03-26
申请人： Stephen La Lumondiere , Terence Yeoh , Martin Siu Wo Leung , Neil A. Ives
发明人： Stephen La Lumondiere , Terence Yeoh , Martin Siu Wo Leung , Neil A. Ives
IPC分类号： G01J5/02
CPC分类号： G01N21/9501
摘要： An illumination source may be directed towards a surface of an object comprising subsurface features, wherein the illumination from the source is directed at a first angle relative to the normal of the surface. The object may have a portion between the subsurface features and the surface, the portion having an index of refraction that is greater than the index of refraction of a surrounding medium that surrounds the object. An imaging device may be placed with an objective lens. The first angle may be larger than an acceptance angle of the objective lens. In some embodiments, multiple illumination beams may be generated by one or more illumination sources. The beams may be rotated relative to one another about the normal of the surface. Also, in some embodiments, multiple images may be taken with the objective of the imaging device at different positions rotated off of the normal. The multiple images may be combined to generate a composite image.
摘要翻译：照明源可以指向包括地下特征的物体的表面，其中来自源的照明相对于表面的法线指向第一角度。物体可以具有在地下特征和表面之间的部分，该部分具有大于围绕物体的周围介质的折射率的折射率。成像装置可以放置有物镜。第一角度可以大于物镜的接受角度。在一些实施例中，可以由一个或多个照明源产生多个照明光束。梁可以围绕表面的法线相对于彼此旋转。此外，在一些实施例中，可以以成像装置的目的将多个图像拍摄在从法线旋转的不同位置。可以组合多个图像以生成合成图像。

2. 发明授权

US08450688B2 Refraction assisted illumination for imaging 有权
$Refraction assisted illumination for imaging$
标题翻译：折射辅助照明成像
公开(公告)号：US08450688B2
公开(公告)日：2013-05-28
申请号：US13190264
申请日：2011-07-25
申请人： Stephen La Lumondiere , Terence Yeoh , Martin Siu Wo Leung , Neil A. Ives , William T. Lotshaw , Steven C. Moss
发明人： Stephen La Lumondiere , Terence Yeoh , Martin Siu Wo Leung , Neil A. Ives , William T. Lotshaw , Steven C. Moss
IPC分类号： G01J5/02
CPC分类号： G01N21/9505 , H04N5/2256
摘要： Various embodiments are directed to systems and methods for imaging subsurface features of a semiconductor object comprising a first region having a first doping property and a second region having a second doping property. The semiconductor object may comprise subsurface features and material between a surface of the semiconductor object and the subsurface features. The material may have an index of refraction that is greater than an index of refraction of a surrounding medium in contact with the surface of the semiconductor object. For example, a system may comprise an imaging device comprising an objective. The imaging device may be sensitive to a first wavelength. The system may also comprise an illumination source to emit illumination substantially at the first wavelength. The illumination may be directed towards the surface of the semiconductor object at a first angle relative to a normal of the surface. The first angle is greater than an acceptance angle of the objective of the imaging device. Also, the first wavelength may have a photonic energy substantially equal to a bandgap of the first region.
摘要翻译：各种实施例涉及用于对包括具有第一掺杂特性的第一区域和具有第二掺杂特性的第二区域的半导体物体的次表面特征进行成像的系统和方法。半导体物体可以包括半导体物体的表面和地下特征之间的地下特征和材料。材料可以具有大于与半导体物体的表面接触的周围介质的折射率的折射率。例如，系统可以包括包括物镜的成像装置。成像装置可能对第一波长敏感。该系统还可以包括基本上以第一波长发射照明的照明源。照明可以相对于表面的法线以第一角度指向半导体物体的表面。第一角度大于成像装置的物镜的接受角度。此外，第一波长可以具有基本上等于第一区域的带隙的光子能量。

3. 发明申请

US20120019707A1 REFRACTION ASSISTED ILLUMINATION FOR IMAGING 有权
标题翻译：用于成像的折射辅助照明
公开(公告)号：US20120019707A1
公开(公告)日：2012-01-26
申请号：US13190264
申请日：2011-07-25
申请人： Stephen La Lumondiere , Terence Yeoh , Martin Siu Wo Leung , Neil A. Ives , William T. Lotshaw , Steven C. Moss
发明人： Stephen La Lumondiere , Terence Yeoh , Martin Siu Wo Leung , Neil A. Ives , William T. Lotshaw , Steven C. Moss
IPC分类号： H04N5/225 , H04N5/222
CPC分类号： G01N21/9505 , H04N5/2256
摘要： Various embodiments are directed to systems and methods for imaging subsurface features of a semiconductor object comprising a first region having a first doping property and a second region having a second doping property. The semiconductor object may comprise subsurface features and material between a surface of the semiconductor object and the subsurface features. The material may have an index of refraction that is greater than an index of refraction of a surrounding medium in contact with the surface of the semiconductor object. For example, a system may comprise an imaging device comprising an objective. The imaging device may be sensitive to a first wavelength. The system may also comprise an illumination source to emit illumination substantially at the first wavelength. The illumination may be directed towards the surface of the semiconductor object at a first angle relative to a normal of the surface. The first angle is greater than an acceptance angle of the objective of the imaging device. Also, the first wavelength may have a photonic energy substantially equal to a bandgap of the first region.
摘要翻译：各种实施例涉及用于对包括具有第一掺杂特性的第一区域和具有第二掺杂特性的第二区域的半导体物体的次表面特征进行成像的系统和方法。半导体物体可以包括半导体物体的表面和地下特征之间的地下特征和材料。材料可以具有大于与半导体物体的表面接触的周围介质的折射率的折射率。例如，系统可以包括包括物镜的成像装置。成像装置可能对第一波长敏感。该系统还可以包括基本上以第一波长发射照明的照明源。照明可以相对于表面的法线以第一角度指向半导体物体的表面。第一角度大于成像装置的物镜的接受角度。此外，第一波长可以具有基本上等于第一区域的带隙的光子能量。

4. 发明申请

US20110102615A1 Refraction assisted illumination for imaging 有权
$Refraction assisted illumination for imaging$
标题翻译：折射辅助照明成像
公开(公告)号：US20110102615A1
公开(公告)日：2011-05-05
申请号：US12661967
申请日：2010-03-26
申请人： Stephen La Lumondiere , Terence Yeoh , Martin Siu Wo Leung , Neil A. Ives
发明人： Stephen La Lumondiere , Terence Yeoh , Martin Siu Wo Leung , Neil A. Ives
IPC分类号： H04N5/228 , H04N5/222
CPC分类号： G01N21/9501
摘要： An illumination source may be directed towards a surface of an object comprising subsurface features, wherein the illumination from the source is directed at a first angle relative to the normal of the surface. The object may have a portion between the subsurface features and the surface, the portion having an index of refraction that is greater than the index of refraction of a surrounding medium that surrounds the object. An imaging device may be placed with an objective lens. The first angle may be larger than an acceptance angle of the objective lens. In some embodiments, multiple illumination beams may be generated by one or more illumination sources. The beams may be rotated relative to one another about the normal of the surface. Also, in some embodiments, multiple images may be taken with the objective of the imaging device at different positions rotated off of the normal. The multiple images may be combined to generate a composite image.
摘要翻译：照明源可以指向包括地下特征的物体的表面，其中来自源的照明相对于表面的法线指向第一角度。物体可以具有在地下特征和表面之间的部分，该部分具有大于围绕物体的周围介质的折射率的折射率。成像装置可以放置有物镜。第一角度可以大于物镜的接受角度。在一些实施例中，可以由一个或多个照明源产生多个照明光束。梁可以围绕表面的法线相对于彼此旋转。此外，在一些实施例中，可以以成像装置的目的将多个图像拍摄在从法线旋转的不同位置。可以组合多个图像以生成合成图像。

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