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    • 3. 发明授权
    • Box-in-box field-to-field alignment structure
    • 箱内即场对齐结构
    • US07273761B2
    • 2007-09-25
    • US10959551
    • 2004-10-05
    • Robert W. RumseyMartin E. Garnett
    • Robert W. RumseyMartin E. Garnett
    • G01R31/26H01L21/66
    • G03F7/70633G01B11/26G03F7/70616G03F9/7076Y10S438/975
    • A lithographic pattern includes a first scribe along an edge of a die region, and a second scribe along an opposing edge of the die region. The first scribe includes at least a first translucent box and a second translucent box. The second scribe includes at least a first opaque box and a second opaque box defined respectively by a first translucent frame and a second translucent frame. When the lithographic pattern is stepped between fields on a wafer, the first translucent box is placed at least partially within the first opaque box, and the second translucent box is placed at least partially within the second opaque box. If a continuous ring is formed from a pair of a translucent box and an opaque box, the fields are aligned at least within an amount equal to the difference between the dimensions of that translucent box and that opaque box divided by 2.
    • 平版印刷图案包括沿着模具区域的边缘的第一刻痕,以及沿着模具区域的相对边缘的第二划片。 第一划痕至少包括第一半透明盒和第二透明盒。 第二划片包括分别由第一半透明框架和第二半透明框架限定的至少第一不透明盒和第二不透明盒。 当平版印刷图案在晶片上的场之间步进时,第一半透明盒至少部分地放置在第一不透明盒中,并且第二透明盒至少部分地放置在第二不透明盒内。 如果从一对半透明盒和不透明盒形成连续的环,则这些场至少等于该半透明盒的尺寸和该不透明盒除以2的差的量。
    • 7. 发明授权
    • Box-in-box field-to-field alignment structure
    • 箱内即场对齐结构
    • US06815128B2
    • 2004-11-09
    • US10114701
    • 2002-04-01
    • Robert W. RumseyMartin E. Garnett
    • Robert W. RumseyMartin E. Garnett
    • G03F900
    • G03F7/70633G01B11/26G03F7/70616G03F9/7076Y10S438/975
    • A lithographic pattern includes a first scribe along an edge of a die region, and a second scribe along an opposing edge of the die region. The first scribe includes at least a first translucent box and a second translucent box. The second scribe includes at least a first opaque box and a second opaque box defined respectively by a first translucent frame and a second translucent frame. When the lithographic pattern is stepped between fields on a wafer, the first translucent box is placed at least partially within the first opaque box, and the second translucent box is placed at least partially within the second opaque box. If a continuous ring is formed from a pair of a translucent box and an opaque box, the fields are aligned at least within an amount equal to the difference between the dimensions of that translucent box and that opaque box divided by 2.
    • 平版印刷图案包括沿着模具区域的边缘的第一刻痕,以及沿着模具区域的相对边缘的第二划片。 第一划痕至少包括第一半透明盒和第二透明盒。 第二划片包括分别由第一半透明框架和第二半透明框架限定的至少第一不透明盒和第二不透明盒。 当平版印刷图案在晶片上的场之间步进时,第一半透明盒至少部分地放置在第一不透明盒中,并且第二透明盒至少部分地放置在第二不透明盒内。 如果从一对半透明盒和不透明盒形成连续的环,则这些场至少等于该半透明盒的尺寸和该不透明盒除以2的差的量。
    • 8. 发明授权
    • Start-up circuit for voltage regulators
    • 稳压器启动电路
    • US06163140A
    • 2000-12-19
    • US495488
    • 2000-02-01
    • Martin E. GarnettAndrew M. CowellSteve I. Chaney
    • Martin E. GarnettAndrew M. CowellSteve I. Chaney
    • G05F1/46G05F1/56H02M1/00H02M1/36G05F1/10H02J3/12
    • H02M1/36G05F1/468G05F1/56Y10S323/901
    • A start-up circuit for voltage regulators includes a depletion mode field effect transistor (FET) having a drain electrically coupled to an input voltage, a source electrically coupled to the voltage regulator power supply input terminal and to a voltage corresponding to an output voltage of the voltage regulator, a body at a fixed voltage, and a gate electrically coupled to the output of a comparator. At start-up, the voltage regulator is powered through the FET. The drain current is self-limiting, preventing the source of the FET from rising to the level of the input voltage. When the rising output voltage of the regulator reaches a level that can operate the regulator control circuit, the comparator grounds the gate of the FET to turn off the FET, and the voltage regulator operates off of its own output. Virtually no power is dissipated in the FET during steady-state operation of the regulator.
    • 用于稳压器的启动电路包括具有电耦合到输入电压的漏极的耗尽型场效应晶体管(FET),电耦合到电压调节器电源输入端的源和与电压调节器电源输入端的输出电压相对应的电压 电压调节器,固定电压的主体以及电耦合到比较器的输出的栅极。 启动时,电压调节器通过FET供电。 漏极电流是自限制的,防止FET的源极上升到输入电压的电平。 当稳压器的上升输出电压达到能够调节稳压器电路的电平时,比较器将FET的栅极接通,关闭FET,并且电压调节器自身输出。 在调节器的稳态运行期间,FET几乎没有耗散功率。
    • 9. 发明授权
    • Method of forming a resistor having a serpentine pattern through
multiple use of an alignment keyed mask
    • 通过多次使用对准键控掩模形成具有蛇形图案的电阻器的方法
    • US5753391A
    • 1998-05-19
    • US535000
    • 1995-09-27
    • Marshall D. StoneMartin E. GarnettMichael J. MottolaHiu F. Ip
    • Marshall D. StoneMartin E. GarnettMichael J. MottolaHiu F. Ip
    • G03F9/00H01C7/22H01C17/24
    • G03F9/00H01C17/2416H01C7/22Y10S148/102Y10T29/49156
    • Each die containing a resistive element which is to be trimmed has associated therewith a plurality of alignment targets. A cut mask having a trim pattern and an alignment key formed thereon is employed in a masking and etching step to trim the resistive element to a desired resistance. The number of links cut in the resistive element, and thus the final resistance thereof, depends on the particular positioning of the cut mask with respect to the die as determined by which of the alignment targets is aligned with the alignment key. For instance, aligning the alignment key with a first alignment target would result in cutting one link in the resistive element so as to achieve a first resistance value, while re-aligning the cut mask such that the alignment key aligns with another of the alignment targets would result in cutting two links in the resistive element so as to achieve a second resistance value. Since the trim of resistive elements may be adjusted to any one of many possible resistance values by simply changing the alignment of the cut mask with respect to the die, the need to have a separate cut mask for each of the possible trimmed resistance values is eliminated, thereby reducing costs.
    • 包含要修剪的电阻元件的每个管芯都具有多个对准靶。 在掩模和蚀刻步骤中采用具有修剪图案和形成在其上的对准键的切割掩模,以将电阻元件修剪到期望的电阻。 在电阻元件中切割的连接数量以及其最终电阻取决于切割掩模相对于管芯的特定定位,由哪个对准靶与对准键对准确定。 例如,将对准键与第一对准目标对准将导致切割电阻元件中的一个连杆,以便实现第一电阻值,同时重新对准切割掩模,使得对准键与另一个对准目标对准 将导致在电阻元件中切割两个连接以实现第二电阻值。 由于可以通过简单地改变切割掩模相对于管芯的对准来将电阻元件的修剪调节到许多可能的电阻值中的任何一个,因此消除了对每个可能的修剪电阻值具有单独的切割掩模的需要 ,从而降低成本。