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1. 发明授权

US07417086B2 Coating compositions 有权
标题翻译：涂料组合物
公开(公告)号：US07417086B2
公开(公告)日：2008-08-26
申请号：US10998412
申请日：2004-11-29
申请人： William Bryan Griffith, Jr. , Mark Robert Winkle
发明人： William Bryan Griffith, Jr. , Mark Robert Winkle
IPC分类号： C08K5/5317
CPC分类号： C08K5/49 , C08K5/0091
摘要： Aqueous polymer compositions are provided that are suitable as coatings when dry. The coatings formed from such compositions have desirably low level of yellowness, both when new and upon aging. Also provided are methods of making such compositions.
摘要翻译：提供在干燥时适合作为涂层的水性聚合物组合物。由这种组合物形成的涂层具有理想的低水平的黄色，当新的和老化时。还提供制备这种组合物的方法。

2. 发明授权

US06485786B2 Aqueous stain-blocking coating composition 有权
公开(公告)号：US06485786B2
公开(公告)日：2002-11-26
申请号：US09833011
申请日：2001-04-10
申请人： Hai Deng , Kirti Deshmukh , Aurelia de la Cuesta Sheppard , Mark Robert Winkle
发明人： Hai Deng , Kirti Deshmukh , Aurelia de la Cuesta Sheppard , Mark Robert Winkle
IPC分类号： B05D302
CPC分类号： C09D133/062
摘要： An aqueous stain-blocking coating composition including an aqueous emulsion copolymer having a glass transition temperature (Tg) from −20° C. to 60° C. and including, as polymerized units, at least one ethylenically unsaturated nonionic monomer and 1.5-6%, by weight based on the dry weight of the copolymer, ethylenically unsaturated strong acid monomer, such as a Phosphorous-containing strong acid monomer, or salts thereof is provided. Also provided is a method for blocking stains by applying the aqueous stain-blocking coating composition to a substrate bearing a stain; and drying, or allowing to dry, the aqueous composition.

3. 发明授权

US5650261A Positive acting photoresist comprising a photoacid, a photobase and a film forming acid-hardening resin system 失效
标题翻译：正性光致抗蚀剂，其包含光酸，光碱和成膜酸硬化树脂体系
公开(公告)号：US5650261A
公开(公告)日：1997-07-22
申请号：US428820
申请日：1989-10-27
申请人： Mark Robert Winkle
发明人： Mark Robert Winkle
IPC分类号： G03F7/004 , G03F7/012 , G03F7/023 , G03F7/38
CPC分类号： G03F7/0045
摘要： A positive-acting photoresist composition which produces crosslinked images and processes for using the photoresist composition are disclosed. The photoresist composition is prepared from a mixture containing a film forming, polymer-containing, acid hardening resin system, an acid or acid generating material (preferably in the form of a thermal acid generator) for crosslinking the acid hardening resin system, and a photobase generating compound. The photoresist composition is applied as a film onto a substrate surface and selectively imagewise exposed through a photomask to actinic radiation. The actinic radiation causes the photobase generator to produce a base in the imagewise exposed portions of the photoresist film. The photochemically generated base neutralizes the acid in the imagewise exposed areas of the photoresist film. The non-imagewise exposed portions of the photoresist film, not containing the photochemically generated base, are crosslinked by the catalytic action of the acid upon heating the film, and the imagewise exposed portions of the photoresist film are removed from the substrate by the action of a developer solution leaving a crosslinked positive image on the substrate. In an alternate embodiment the photoresist composition may be applied to conductive substrate surfaces by electrodeposition.
摘要翻译：公开了产生交联图像的正性光致抗蚀剂组合物和使用光致抗蚀剂组合物的方法。光致抗蚀剂组合物由含有成膜剂，含聚合物的酸固化树脂体系，酸或产酸材料（优选以热酸发生剂形式）交联的混合物制备，用于交联酸固化树脂体系，以及光基产生化合物。将光致抗蚀剂组合物作为膜施加到基底表面上，并通过光掩模选择性地成像曝光至光化辐射。光化辐射导致光致产生器在光致抗蚀剂膜的成像曝光部分中产生基底。光化学产生的碱中和光致抗蚀剂膜的成像曝光区域中的酸。光致抗蚀剂膜的非成像曝光部分，不含光化学产生的基底，通过在加热膜时酸的催化作用而交联，并且光刻胶膜的成像曝光部分通过显影剂溶液在基底上留下交联的正像。在替代实施例中，光致抗蚀剂组合物可以通过电沉积施加到导电基底表面。

4. 发明授权

US06939922B2 Coating and coating composition 有权
标题翻译：涂料和涂料组合物
公开(公告)号：US06939922B2
公开(公告)日：2005-09-06
申请号：US10097256
申请日：2002-03-15
申请人： Ronald Scott Beckley , Robert Mitchell Blankenship , Albert Benner Brown , James Tinney Brown , Shang-Jaw Chiou , Anton Georges El A'mma , Susan Jane Fitzwater , Robert Howard Gore , Eric Jon Langenmayr , Dennis Paul Lorah , Warren Harvey Machleder , James Watson Neely , George Harvey Redlich , Curtis Schwartz , Frederick James Schindler , Robert Victor Slone , David William Whitman , Mark Robert Winkle
发明人： Ronald Scott Beckley , Robert Mitchell Blankenship , Albert Benner Brown , James Tinney Brown , Shang-Jaw Chiou , Anton Georges El A'mma , Susan Jane Fitzwater , Robert Howard Gore , Eric Jon Langenmayr , Dennis Paul Lorah , Warren Harvey Machleder , James Watson Neely , George Harvey Redlich , Curtis Schwartz , Frederick James Schindler , Robert Victor Slone , David William Whitman , Mark Robert Winkle
IPC分类号： C08F2/00 , C08F2/16 , C08F246/00 , C09D7/12 , C09D157/00 , C09D201/00 , C08F120/02 , C08F20/02
CPC分类号： C08F2/16 , Y10S526/909 , Y10T428/254
摘要： Provided are improved coatings, polymeric dispersions, and polymeric composites, which include crosslinked polymeric nanoparticles (hereafter “PNPs”). Also provided are methods for forming improved coatings, polymeric dispersions, and polymeric composites, which include PNPs. The PNPs have polymerized units of at least one multi-ethylenically-unsaturated monomer have a mean diameter of from 1 to 50 nanometers. PNPs having polymerized units of at least one multi-ethylenically-unsaturated monomer and at least one surface-active monomer are also provided.
摘要翻译：提供了改进的涂层，聚合物分散体和聚合复合材料，其包括交联的聚合物纳米颗粒（以下称为“PNP”）。还提供了形成改进的涂层，聚合物分散体和聚合复合材料的方法，其包括PNP。 PNP具有至少一种多烯属不饱和单体的聚合单元，其平均直径为1至50纳米。还提供了具有至少一种多烯属不饱和单体和至少一种表面活性单体的聚合单元的PNP。

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