专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06541168B2 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks 失效
公开(公告)号：US06541168B2
公开(公告)日：2003-04-01
申请号：US09841517
申请日：2001-04-24
申请人： John T. Brown , Stephen C. Currie , Lisa A. Moore , Susan L. Schiefelbein , Robert S. Pavlik, Jr.
发明人： John T. Brown , Stephen C. Currie , Lisa A. Moore , Susan L. Schiefelbein , Robert S. Pavlik, Jr.
IPC分类号： G03F900
CPC分类号： G03F7/70216 , C03B19/1407 , C03B19/1415 , C03B19/1423 , C03B19/1453 , C03B37/01202 , C03B37/01406 , C03B37/01413 , C03B37/0142 , C03B37/0146 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/20 , C03B2201/21 , C03B2207/06 , C03B2207/14 , C03B2207/20 , C03B2207/30 , C03B2207/32 , C03B2207/36 , C03B2207/38 , C03B2207/40 , C03B2207/46 , C03B2207/54 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2201/20 , C03C2201/21 , C03C2201/23 , C03C2201/30 , C03C2201/32 , C03C2203/54 , G03F1/60 , G03F7/70958 , Y02P40/57
摘要： High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

2. 发明授权

US06374642B1 Method and apparatus for combustion-enhanced vaporization 失效
标题翻译：燃烧增强蒸发的方法和装置
公开(公告)号：US06374642B1
公开(公告)日：2002-04-23
申请号：US09526024
申请日：2000-03-15
申请人： Jeffrey L. Blackwell , Lisa A. Moore , Huailiang Wei , Daniel W. Hawtof
发明人： Jeffrey L. Blackwell , Lisa A. Moore , Huailiang Wei , Daniel W. Hawtof
IPC分类号： C03B2000
CPC分类号： C03B37/0142 , C03B37/0148 , C03B2201/34 , C03B2201/50 , C03B2201/54 , C03B2207/02 , C03B2207/06 , C03B2207/12 , C03B2207/14 , C03B2207/20 , C03B2207/32 , C03B2207/34 , C03B2207/46 , C03B2207/54 , C03B2207/62 , C03B2207/64 , F23D14/22 , F23D14/32
摘要： An apparatus for producing a glass soot includes a first a burner having a droplet-emitting first region, a gas-emitting second region surrounding the first region, and a gas-emitting third region surrounding the second region. The first region emits a glass-forming mixture, the second region emits an inert gas, and the third region emits a combination of oxygen and a combustible gas. The apparatus further includes a combustion area having a first section proximate the first burner and a second section distal from the first burner. A glass-forming mixture is at least partially vaporized in the first section of the combustion area. The apparatus further includes at least one secondary burner having gas-emitting fourth and fifth regions. The fourth region of the secondary burner emits oxygen and the fifth region of the secondary burner emits a combustible gas. The second section of the conversion area is in communication with the fourth and fifth regions of the secondary burner, such that the glass-forming mixture is completely vaporized and converted into a glass soot deposited on a preform such as a bait rod. The invention also includes a method of enhanced vaporization using first and second spaced apart combustion areas.
摘要翻译：一种用于生产玻璃烟灰的设备包括：具有液滴发射第一区域的第一燃烧器，围绕第一区域的气体发射第二区域和围绕第二区域的气体发射第三区域。第一区域发射玻璃形成混合物，第二区域发射惰性气体，第三区域发射氧气和可燃气体的组合。该装置还包括具有靠近第一燃烧器的第一部分和远离第一燃烧器的第二部分的燃烧区域。玻璃形成混合物在燃烧区域的第一部分中至少部分蒸发。该装置还包括具有气体发射的第四和第五区域的至少一个二次燃烧器。次级燃烧器的第四区域发射氧气，而第二燃烧器的第五区域发射可燃气体。转换区域的第二部分与辅助燃烧器的第四和第五区域连通，使得玻璃形成混合物完全蒸发并转化成沉积在诸如诱饵棒的预成型体上的玻璃烟灰。本发明还包括使用第一和第二间隔开的燃烧区域增强蒸发的方法。

3. 发明授权

US07524780B2 Low loss optical fiber and method for making same 有权
标题翻译：低损耗光纤及其制造方法
公开(公告)号：US07524780B2
公开(公告)日：2009-04-28
申请号：US11046435
申请日：2005-01-28
申请人： Laura J. Ball , Bruno P. M. Baney , Dana C. Bookbinder , Keith L. House , Rostislav R. Khrapko , Lisa A. Moore , Susan L. Schiefelbein
发明人： Laura J. Ball , Bruno P. M. Baney , Dana C. Bookbinder , Keith L. House , Rostislav R. Khrapko , Lisa A. Moore , Susan L. Schiefelbein
IPC分类号： C03C13/04 , C03C3/076 , C03C3/06
CPC分类号： C03C3/06 , C03B37/01211 , C03B37/01228 , C03B37/01426 , C03B37/01807 , C03B37/01861 , C03B37/01892 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/20 , C03B2201/28 , C03B2201/31 , C03B2201/32 , C03B2201/50 , C03B2201/54 , C03B2203/26 , C03B2207/30 , C03B2207/90 , C03C25/602 , C03C25/607 , C03C25/68 , C03C2201/11 , C03C2201/23 , C03C2201/50 , C03C2203/50 , G02B6/02
摘要： A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.
摘要翻译：公开了一种通过将碱金属扩散到玻璃制品的表面中形成掺杂碱金属氧化物的光纤的方法。石英玻璃制品可以是管或棒的形式，或者是管或棒的集合。含有碱金属的二氧化硅玻璃制品和可能已经无意地扩散到玻璃制品中的杂质被蚀刻到足以除去杂质的深度。石英玻璃制品可以进一步加工以形成完整的光纤预型件。当预成型件被拉入光纤时，表现出低的衰减。

4. 发明授权

US06682859B2 Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass 失效
标题翻译：真空紫外线吸收硅氧氟硅光刻玻璃
公开(公告)号：US06682859B2
公开(公告)日：2004-01-27
申请号：US09997785
申请日：2001-11-28
申请人： Lisa A. Moore , Charlene M. Smith
发明人： Lisa A. Moore , Charlene M. Smith
IPC分类号： G03F900
CPC分类号： G03F7/70216 , C03B19/1407 , C03B19/1415 , C03B19/1423 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/20 , C03B2201/21 , C03B2207/30 , C03B2207/32 , C03B2207/36 , C03B2207/38 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2201/20 , C03C2201/21 , C03C2201/23 , C03C2201/30 , C03C2201/32 , C03C2203/54 , G03F1/60 , G03F7/70958
摘要： High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content
摘要翻译：公开了具有优选氟含量<0.5重量％的氟氧化硅玻璃，适合用作光刻应用中的低于190nm的VUV波长区域的光掩模基板的高纯度氟氧化硅玻璃。本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。本发明的光掩模基材是“真空”的氟氧化硅玻璃，其在真空紫外（VUV）波长区域中表现出非常高的透射率，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。除了含氟并且具有很少或不具有OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

5. 发明授权

US06467313B1 Method for controlling dopant profiles 失效
标题翻译：控制掺杂剂分布的方法
公开(公告)号：US06467313B1
公开(公告)日：2002-10-22
申请号：US09590987
申请日：2000-06-09
申请人： Polly W. Chu , Lisa A. Moore , Michelle D. Pierson-Stull
发明人： Polly W. Chu , Lisa A. Moore , Michelle D. Pierson-Stull
IPC分类号： C03B37075
CPC分类号： C03B37/0146 , C03B37/01446 , C03B2201/28 , C03B2201/30 , C03B2201/31 , C03B2201/34 , C03B2201/36 , C03B2201/40 , C03B2201/42 , C03B2201/54 , C03C13/046 , G02B2006/12038 , G02B2006/12166
摘要： The present invention discloses novel methods for fabricating glass articles, particularly optical fiber glass preforms, which may contain alumina, yttrium, lanthanum, erbium, or other rare earth metals as dopants. The glass articles made in accordance with the present invention exhibit radially uniform dopant profiles relative to conventional dopant methods. In addition, the overall concentration of the dopant is increased relative to analogous dopant methods.
摘要翻译：本发明公开了用于制造玻璃制品，特别是可以含有氧化铝，钇，镧，铒或其它稀土金属作为掺杂剂的光纤玻璃预制件的新方法。根据本发明制造的玻璃制品相对于常规的掺杂剂方法显示出径向均匀的掺杂剂分布。此外，相对于类似的掺杂剂方法，掺杂剂的总体浓度增加。

6. 发明授权

US06242136B1 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass 失效
标题翻译：真空紫外透射硅氧氟硅光刻玻璃
公开(公告)号：US06242136B1
公开(公告)日：2001-06-05
申请号：US09397573
申请日：1999-09-16
申请人： Lisa A. Moore , Charlene Smith
发明人： Lisa A. Moore , Charlene Smith
IPC分类号： G03F900
CPC分类号： C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03C3/06 , C03C4/0085 , C03C2201/12 , G03F1/60 , Y02P40/57
摘要： High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.
摘要翻译：公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。本发明的光掩模基材是“真空”的氟氧化硅玻璃，其在真空紫外（VUV）波长区域中表现出非常高的透射率，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。除了含氟并且具有很少或不含OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

7. 发明授权

US07469559B2 Method for making low loss optical fiber 失效
标题翻译：低损耗光纤的制造方法
公开(公告)号：US07469559B2
公开(公告)日：2008-12-30
申请号：US11004027
申请日：2004-12-02
申请人： Laura J Ball , Bruno P M Baney , Dana C Bookbinder , Keith L House , Rostislav R Khrapko , Susan L Schiefelbein , Lisa A Moore
发明人： Laura J Ball , Bruno P M Baney , Dana C Bookbinder , Keith L House , Rostislav R Khrapko , Susan L Schiefelbein , Lisa A Moore
IPC分类号： C03C13/04
CPC分类号： C03C3/06 , C03B37/01211 , C03B37/01228 , C03B37/01426 , C03B37/01807 , C03B37/01861 , C03B37/01892 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/20 , C03B2201/28 , C03B2201/31 , C03B2201/32 , C03B2201/50 , C03B2201/54 , C03B2203/26 , C03B2207/30 , C03B2207/90 , C03C25/602 , C03C25/607 , C03C25/68 , C03C2201/11 , C03C2201/23 , C03C2201/50 , C03C2203/50 , G02B6/02
摘要： A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.
摘要翻译：公开了一种通过将碱金属扩散到玻璃制品的表面中形成掺杂碱金属氧化物的光纤的方法。石英玻璃制品可以是管或棒的形式，或者是管或棒的集合。含有碱金属的二氧化硅玻璃制品和可能已经无意地扩散到玻璃制品中的杂质被蚀刻到足以除去杂质的深度。石英玻璃制品可以进一步加工以形成完整的光纤预型件。当预成型件被拉入光纤时，表现出低的衰减。

8. 发明授权

US06817211B2 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks 失效
标题翻译：真空紫外线透射直接沉积玻璃化硅氧氟化物光刻玻璃光掩模坯料
公开(公告)号：US06817211B2
公开(公告)日：2004-11-16
申请号：US10342717
申请日：2003-01-13
申请人： John T. Brown , Stephen C. Currie , Lisa A. Moore , Susan L. Schiefelbein , Robert S. Pavlik, Jr.
发明人： John T. Brown , Stephen C. Currie , Lisa A. Moore , Susan L. Schiefelbein , Robert S. Pavlik, Jr.
IPC分类号： C03B2000
CPC分类号： G03F7/70216 , C03B19/1407 , C03B19/1415 , C03B19/1423 , C03B19/1453 , C03B37/01202 , C03B37/01406 , C03B37/01413 , C03B37/0142 , C03B37/0146 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/20 , C03B2201/21 , C03B2207/06 , C03B2207/14 , C03B2207/20 , C03B2207/30 , C03B2207/32 , C03B2207/36 , C03B2207/38 , C03B2207/40 , C03B2207/46 , C03B2207/54 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2201/20 , C03C2201/21 , C03C2201/23 , C03C2201/30 , C03C2201/32 , C03C2203/54 , G03F1/60 , G03F7/70958 , Y02P40/57
摘要： High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.
摘要翻译：公开了适用于在190nm以下的VUV波长区域中用于光刻应用的光掩模基板的高纯度直接沉积玻璃化硅氧氟化物玻璃。本发明的直接沉积玻璃化硅氧氟化物玻璃在157nm波长附近是透射的，使其特别适用于157nm波长区域的光掩模衬底。本发明的光掩模基材是在真空紫外（VUV）波长区域中显示非常高的透射率的干直接沉积玻璃化硅氧氟化物玻璃，同时保持通常与高纯度熔融二氧化硅相关的优异的热和物理性能。除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的玻璃化玻璃化氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

9. 发明授权

US06466365B1 Film coated optical lithography elements and method of making 有权
标题翻译：薄膜涂层光刻元件及其制作方法
公开(公告)号：US06466365B1
公开(公告)日：2002-10-15
申请号：US09567725
申请日：2000-05-10
申请人： Robert L. Maier , Lisa A. Moore , Charlene M. Smith
发明人： Robert L. Maier , Lisa A. Moore , Charlene M. Smith
IPC分类号： G02B1314
CPC分类号： C03C17/02 , C03B19/1453 , C03B19/1461 , C03B2201/075 , C03B2201/12 , C03C3/06 , C03C17/3452 , C03C2201/12 , C03C2201/23 , C03C2203/46 , G02B1/105 , G02B1/14 , G02B5/208 , G03F7/70958
摘要： The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.
摘要翻译：本发明提供涂覆光学光刻元件和涂覆光学元件的方法，特别是用于使用不大于约193nm的真空紫外光（VUV）光刻波长的240nm以下的光学光刻系统的光学光刻元件，例如VUV投影光刻系统利用193nm或157nm区域中的波长。光学器件利用沉积的氟氧化硅膜操纵小于250nm的真空紫外光刻光。沉积的氟氧化硅光学涂层有助于对入射光的操纵并保护底层的光学材料，层和表面。

10. 发明授权

US06833949B2 Film coated optical lithography elements and method of making 有权
标题翻译：薄膜涂层光刻元件及其制作方法
公开(公告)号：US06833949B2
公开(公告)日：2004-12-21
申请号：US10238099
申请日：2002-09-09
申请人： Robert L. Maier , Lisa A. Moore , Charlene M. Smith
发明人： Robert L. Maier , Lisa A. Moore , Charlene M. Smith
IPC分类号： G02B1314
CPC分类号： C03C17/02 , C03B19/1453 , C03B19/1461 , C03B2201/075 , C03B2201/12 , C03C3/06 , C03C17/3452 , C03C2201/12 , C03C2201/23 , C03C2203/46 , G02B1/105 , G02B1/14 , G02B5/208 , G03F7/70958
摘要： The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.
摘要翻译：本发明提供涂覆光学光刻元件和涂覆光学元件的方法，特别是用于使用不大于约193nm的真空紫外光（VUV）光刻波长的240nm以下的光学光刻系统的光学光刻元件，例如VUV投影光刻系统利用193nm或157nm区域中的波长。光学器件利用沉积的氟氧化硅膜操纵小于250nm的真空紫外光刻光。沉积的氟氧化硅光学涂层有助于对入射光的操纵并保护底层的光学材料，层和表面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式