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    • 1. 发明授权
    • Method for manufacturing a magnetic sensor
    • 磁传感器的制造方法
    • US09207293B2
    • 2015-12-08
    • US13466887
    • 2012-05-08
    • Hideto AndoShinji SugiharaFumihito KoikeKota Asatsuma
    • Hideto AndoShinji SugiharaFumihito KoikeKota Asatsuma
    • G11B5/127H04R31/00G01R33/09B82Y25/00H01L43/08H01L43/12
    • G01R33/093B82Y25/00H01L43/08H01L43/12
    • A magnetic sensor having no sensitivity differences between sensitivity axes, and an easy manufacturing method therefor are provided. The method includes a process of forming first stacked films for a magnetoresistive element on a substrate. This element has a sensitivity axis in a certain direction and includes a self-pinned ferromagnetic pinned layer in which first and second ferromagnetic films are antiferromagnetically coupled through an antiparallel coupling layer, a nonmagnetic intermediate layer, and a soft magnetic free layer. The method further includes a process of removing a region of the first stacked films from the substrate. The remaining region of the films includes at least a region to be left to form the element. The method furthermore includes a process of forming second stacked films for a magnetoresistive element, which has a sensitivity axis in a direction different from the certain direction and has the same structure, on the exposed substrate.
    • 提供了灵敏度轴之间没有灵敏度差的磁传感器及其制造方法。 该方法包括在基板上形成用于磁阻元件的第一层叠膜的工艺。 该元件在一定方向上具有灵敏度轴,并且包括自身固定的铁磁性钉扎层,其中第一和第二铁磁性膜通过反平行耦合层,非磁性中间层和软磁性层反铁磁耦合。 该方法还包括从衬底去除第一层叠膜的区域的工艺。 膜的剩余区域至少包括要形成元件的区域。 该方法还包括在暴露的基板上形成具有与某一方向不同的方向并且具有相同结构的灵敏度轴的用于磁阻元件的第二叠层膜的工艺。
    • 6. 发明申请
    • MAGNETIC SENSOR AND MANUFACTURING METHOD THEREFOR
    • 磁传感器及其制造方法
    • US20120217962A1
    • 2012-08-30
    • US13466887
    • 2012-05-08
    • Hideto ANDOShinji SUGIHARAFumihito KOIKEKota ASATSUMA
    • Hideto ANDOShinji SUGIHARAFumihito KOIKEKota ASATSUMA
    • G01R33/09B05D3/00B05D5/00
    • G01R33/093B82Y25/00H01L43/08H01L43/12
    • A magnetic sensor having no sensitivity differences between sensitivity axes, and an easy manufacturing method therefor are provided. The method includes a process of forming first stacked films for a magnetoresistive element on a substrate. This element has a sensitivity axis in a certain direction and includes a self-pinned ferromagnetic pinned layer in which first and second ferromagnetic films are antiferromagnetically coupled through an antiparallel coupling layer, a nonmagnetic intermediate layer, and a soft magnetic free layer. The method further includes a process of removing a region of the first stacked films from the substrate. The remaining region of the films includes at least a region to be left to form the element. The method furthermore includes a process of forming second stacked films for a magnetoresistive element, which has a sensitivity axis in a direction different from the certain direction and has the same structure, on the exposed substrate.
    • 提供了灵敏度轴之间没有灵敏度差的磁传感器及其制造方法。 该方法包括在基板上形成用于磁阻元件的第一层叠膜的工艺。 该元件在一定方向上具有灵敏度轴,并且包括自身固定的铁磁性钉扎层,其中第一和第二铁磁性膜通过反平行耦合层,非磁性中间层和软磁性层反铁磁耦合。 该方法还包括从衬底去除第一层叠膜的区域的工艺。 膜的剩余区域至少包括要形成元件的区域。 该方法还包括在暴露的基板上形成具有与某一方向不同的方向并且具有相同结构的灵敏度轴的用于磁阻元件的第二叠层膜的工艺。