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1. 发明申请

US20140045965A1 ACTIVE RAY-CURABLE COMPOSITION, AND ACTIVE RAY-CURABLE INKJET PRINTING INK COMPOSITION AND ACTIVE RAY-CURABLE ADHESIVE COMPOSITION USING THE SAME 有权
标题翻译：活性可固化组合物和活性可固化油墨印刷油墨组合物和使用其的活性可固化粘合剂组合物
公开(公告)号：US20140045965A1
公开(公告)日：2014-02-13
申请号：US13955581
申请日：2013-07-31
申请人： Soh Noguchi , Okitoshi Kimura , Koji Arimitsu
发明人： Soh Noguchi , Okitoshi Kimura , Koji Arimitsu
IPC分类号： C09D135/02 , C09D11/00 , C09J135/02
CPC分类号： C09D135/02 , C08F222/1006 , C09D11/101 , C09D11/30 , C09D11/38 , C09J4/00 , C09J135/02
摘要： An active ray-curable composition characterized by containing a photobase generator, a double bond-containing compound, and a β-dicarbonyl compound.
摘要翻译：一种活性的可光固化组合物，其特征在于含有光碱产生剂，含双键的化合物和β-二羰基化合物。

2. 发明授权

US08536242B2 Photocurable composition 有权
标题翻译：可光固化组合物
公开(公告)号：US08536242B2
公开(公告)日：2013-09-17
申请号：US12672262
申请日：2008-07-23
申请人： Hiroji Fukui , Shunsuke Kondo , Koji Arimitsu
发明人： Hiroji Fukui , Shunsuke Kondo , Koji Arimitsu
IPC分类号： C08F2/50 , C08G18/67 , G03C1/00 , G03F7/00
CPC分类号： C08F2/50 , C08F2220/1825 , C08G18/12 , C08G18/2825 , C08G18/4804 , C08G18/8077 , C08G59/625 , C08G59/681 , C08L63/00 , C08L2312/06 , C09J133/068 , G03F7/0045 , G03F7/038 , C08F2220/325
摘要： The present invention provides a photocurable composition which contains a photobase generator capable of generating a satisfactory amount of a base in a high quantum yield when irradiated even with a small quantity of light for a short time, and contains a curable compound that is rapidly cured by the generated base such that the composition is cured into a cured product. The photocurable composition comprises: a photobase generator (A) which is a salt of a carboxylic acid (a1-1) represented by the following formula (1-1) with a basic compound (a2), and a curable compound (B) which has, in one molecule thereof, at least two functional groups selected from among epoxy group, (meth)acryloyl group, isocyanato group, acid anhydride group, and alkoxysilyl group, where R1 to R7 in the above formula (1-1) each are hydrogen or an organic group, R1 to R7 may be the same or different, and two of R1 to R7 may be bonded to each other to form a ring structure.
摘要翻译：本发明提供一种光固化性组合物，其含有即使在短时间内用少量光照射即可产生令人满意的高量子产率的碱的光碱性组合物，并且含有通过以下方式快速固化的固化性化合物生成的碱使得组合物固化成固化产物。可光固化组合物包括：作为由下式（1-1）表示的羧酸（a1-1）与碱性化合物（a2）的盐的光碱产生剂（A）和可固化化合物（B），其中在其一个分子中具有选自环氧基，（甲基）丙烯酰基，异氰酸酯基，酸酐基和烷氧基甲硅烷基中的至少两个官能团，其中上式（1-1）中的R 1至R 7各自为氢或有机基团，R 1至R 7可以相同或不同，并且R 1至R 7中的两个可以彼此键合以形成环结构。

3. 发明申请

US20130005849A1 ACTIVE RAY CURABLE INK COMPOSITION, ACTIVE RAY CURABLE INKJET INK COMPOSITION AND PRINTING METHOD USING THE SAME 审中-公开
标题翻译：活性可固化油墨组合物，活性可固化喷墨墨水组合物和使用其的印刷方法
公开(公告)号：US20130005849A1
公开(公告)日：2013-01-03
申请号：US13582810
申请日：2011-03-02
申请人： Soh Noguchi , Okitoshi Kimura , Koji Arimitsu
发明人： Soh Noguchi , Okitoshi Kimura , Koji Arimitsu
IPC分类号： C09D11/10 , B41J2/01
CPC分类号： C09D11/101 , C09D11/30
摘要： An active ray curable ink composition including a photoreaction initiator generating both a base and a radical through irradiation of active rays and a compound having both a functional group reactive with the base and a functional group reactive with the radical.
摘要翻译：一种活性射线固化油墨组合物，其包含通过活性射线照射产生碱和自由基的光反应引发剂和具有与碱反应的官能团和具有与该基团反应的官能团的化合物。

4. 发明申请

US20110097669A1 PHOTOCURABLE COMPOSITION 有权
标题翻译：可光成分
公开(公告)号：US20110097669A1
公开(公告)日：2011-04-28
申请号：US12672262
申请日：2008-07-23
申请人： Hiroji Fukui , Shunsuke Kondo , Koji Arimitsu
发明人： Hiroji Fukui , Shunsuke Kondo , Koji Arimitsu
IPC分类号： G03F7/004
CPC分类号： C08F2/50 , C08F2220/1825 , C08G18/12 , C08G18/2825 , C08G18/4804 , C08G18/8077 , C08G59/625 , C08G59/681 , C08L63/00 , C08L2312/06 , C09J133/068 , G03F7/0045 , G03F7/038 , C08F2220/325
摘要： The present invention provides a photocurable composition which contains a photobase generator capable of generating a satisfactory amount of a base in a high quantum yield when irradiated even with a small quantity of light for a short time, and contains a curable compound that is rapidly cured by the generated base such that the composition is cured into a cured product. The photocurable composition comprises: a photobase generator (A) which is a salt of a carboxylic acid (a1-1) represented by the following formula (1-1) with a basic compound (a2), and a curable compound (B) which has, in one molecule thereof, at least two functional groups selected from among epoxy group, (meth)acryloyl group, isocyanato group, acid anhydride group, and alkoxysilyl group, where R1 to R7 in the above formula (1-1) each are hydrogen or an organic group, R1 to R7 may be the same or different, and two of R1 to R7 may be bonded to each other to form a ring structure.
摘要翻译：本发明提供一种光固化性组合物，其含有即使在短时间内用少量光照射即可产生令人满意的高量子产率的碱的光碱性组合物，并且含有通过以下方式快速固化的固化性化合物生成的碱使得组合物固化成固化产物。可光固化组合物包括：作为由下式（1-1）表示的羧酸（a1-1）与碱性化合物（a2）的盐的光碱产生剂（A）和可固化化合物（B），其中在其一分子中具有选自环氧基，（甲基）丙烯酰基，异氰酸基，酸酐基和烷氧基甲硅烷基中的至少两个官能团，其中上式（1-1）中的R 1至R 7各自为氢或有机基团，R 1至R 7可以相同或不同，并且R 1至R 7中的两个可以彼此键合以形成环结构。

5. 发明申请

US20200308425A1 ACTIVE-ENERGY-RAY-CURABLE COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INK COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INKJET INK COMPOSITION, COMPOSITION STORED CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD, CURED MATERIAL, AND DECORATED ARTICLE 审中-公开
公开(公告)号：US20200308425A1
公开(公告)日：2020-10-01
申请号：US16837153
申请日：2020-04-01
申请人： Soh NOGUCHI , Mitsunobu MORITA , Takashi OKADA , Tatsuki YAMAGUCHI , Koji ARIMITSU
发明人： Soh NOGUCHI , Mitsunobu MORITA , Takashi OKADA , Tatsuki YAMAGUCHI , Koji ARIMITSU
IPC分类号： C09D11/101 , C09D11/38 , B33Y70/00
摘要： To provide an active-energy-ray-curable composition including a compound represented by General Formula (I) below: where in the General Formula (I), R is hydrogen or a methyl group; A is a structure expressed by one selected from the group consisting of Structural Formulas (II) to (VII) below, each of which may have a substituent such as an alkyl group or an alkoxy group, or both; j and k in the Structural Formulas (VI) and (VII) are an integer of 0 or more; X denotes a substituent including a heteroatom; n is an integer of 0 or more, m is an integer of 1 or more, and n+m is 3 or more, or n is an integer of 0 and m is an integer of 2; and wavy lines in the Structural Formulas (II) to (VII) each independently denote a bond with X or a (meth)acryloyl group (H2C═CR—C(═O)—):

6. 发明申请

US20120077343A1 RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 有权
标题翻译：电阻组合物和生产半导体器件的方法
公开(公告)号：US20120077343A1
公开(公告)日：2012-03-29
申请号：US13238004
申请日：2011-09-21
申请人： Koji Arimitsu , Nobuyuki Matsuzawa , Isao Mita
发明人： Koji Arimitsu , Nobuyuki Matsuzawa , Isao Mita
IPC分类号： H01L21/311 , G03F7/004
CPC分类号： G03F7/40 , G03F7/30 , H01L21/0273
摘要： A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
摘要翻译：抗蚀剂组合物包括：在酸存在下交联的交联材料; 酸放大器; 和溶剂。

7. 发明授权

US08853292B2 Active ray curable composition, active ray curable ink composition for inkjet printing, active ray curable adhesive composition, and method for stabilizing active ray curable composition 有权
标题翻译：活性射线固化性组合物，喷墨印刷用活性射线固化型油墨组合物，活性射线固化性粘合剂组合物，及活性射线固化性组合物的稳定化方法
公开(公告)号：US08853292B2
公开(公告)日：2014-10-07
申请号：US13847617
申请日：2013-03-20
申请人： Soh Noguchi , Okitoshi Kimura , Koji Arimitsu
发明人： Soh Noguchi , Okitoshi Kimura , Koji Arimitsu
IPC分类号： G03G9/097 , B41M7/00 , B29C71/04 , A61L2/08 , A61L24/00 , C08F2/46 , C08G61/04 , C09J4/00 , C09D11/101 , C09D4/00
CPC分类号： C09D4/00 , C09D11/101 , C09D11/30 , C09J4/00
摘要： An active ray curable composition, including: a photobase generator; a polymerizable compound; and an acid, wherein the photobase generator is a salt of a carboxylic acid and a basic compound, wherein a ratio by mole of a carboxyl group of the carboxylic acid:a basic functional group of the basic compound is 1:1, and wherein the acid is an acid that loses a function thereof as acid by light or heat.
摘要翻译：一种活性射线可固化组合物，包括：光碱发生剂; 可聚合化合物; 和酸，其中所述光碱产生剂是羧酸和碱性化合物的盐，其中所述羧酸的羧基的摩尔比：所述碱性化合物的碱性官能团为1:1，并且其中酸是通过光或热而作为酸失去其功能的酸。

8. 发明申请

US20130267625A1 ACTIVE RAY CURABLE COMPOSITION, ACTIVE RAY CURABLE INK COMPOSITION FOR INKJET PRINTING, ACTIVE RAY CURABLE ADHESIVE COMPOSITION, AND METHOD FOR STABILIZING ACTIVE RAY CURABLE COMPOSITION 有权
标题翻译：活性可固化组合物，用于喷墨打印的活性可固化油墨组合物，活性可固化粘合剂组合物和用于稳定活性可固化组合物的方法
公开(公告)号：US20130267625A1
公开(公告)日：2013-10-10
申请号：US13847617
申请日：2013-03-20
申请人： Soh NOGUCHI , Okitoshi Kimura , Koji Arimitsu
发明人： Soh NOGUCHI , Okitoshi Kimura , Koji Arimitsu
IPC分类号： C09D4/00 , C09J4/00
CPC分类号： C09D4/00 , C09D11/101 , C09D11/30 , C09J4/00
摘要： An active ray curable composition, including: a photobase generator; a polymerizable compound; and an acid, wherein the photobase generator is a salt of a carboxylic acid and a basic compound, wherein a ratio by mole of a carboxyl group of the carboxylic acid:a basic functional group of the basic compound is 1:1, and wherein the acid is an acid that loses a function thereof as acid by light or heat.
摘要翻译：一种活性射线可固化组合物，包括：光碱发生剂; 可聚合化合物; 和酸，其中所述光碱产生剂是羧酸和碱性化合物的盐，其中所述羧酸的羧基的摩尔比：所述碱性化合物的碱性官能团为1:1，并且其中酸是通过光或热而作为酸失去其功能的酸。

9. 发明授权

US10005922B2 Active ray-curable composition, and active ray-curable inkjet printing ink composition and active ray-curable adhesive composition using the same 有权
公开(公告)号：US10005922B2
公开(公告)日：2018-06-26
申请号：US13955581
申请日：2013-07-31
申请人： Soh Noguchi , Okitoshi Kimura , Koji Arimitsu
发明人： Soh Noguchi , Okitoshi Kimura , Koji Arimitsu
IPC分类号： C09D135/02 , C08F222/10 , C09D11/101 , C09J135/02 , C09D11/38 , C09D11/30 , C09J4/00
CPC分类号： C09D135/02 , C08F222/1006 , C09D11/101 , C09D11/30 , C09D11/38 , C09J4/00 , C09J135/02
摘要： An active ray-curable composition characterized by containing a photobase generator, a double bond-containing compound, and a β-dicarbonyl compound.

10. 发明授权

US08765353B2 Resist composition and method for producing semiconductor device 有权
标题翻译：抗蚀剂组合物和半导体器件的制造方法
公开(公告)号：US08765353B2
公开(公告)日：2014-07-01
申请号：US13238004
申请日：2011-09-21
申请人： Koji Arimitsu , Nobuyuki Matsuzawa , Isao Mita
发明人： Koji Arimitsu , Nobuyuki Matsuzawa , Isao Mita
IPC分类号： G03F7/004 , G03F7/038 , G03F7/40
CPC分类号： G03F7/40 , G03F7/30 , H01L21/0273
摘要： A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
摘要翻译：抗蚀剂组合物包括：在酸存在下交联的交联材料; 酸放大器; 和溶剂。

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