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1. 发明授权

US07291357B2 Thin film deposition method and thin film deposition apparatus 有权
标题翻译：薄膜沉积法和薄膜沉积装置
公开(公告)号：US07291357B2
公开(公告)日：2007-11-06
申请号：US10330385
申请日：2002-12-26
申请人： Atsushi Hiraizumi , Koji Masuda , Hiroyuki Abe , Tetsuro Wada , Koichi Shintomi , Kazuyou Mizuno
发明人： Atsushi Hiraizumi , Koji Masuda , Hiroyuki Abe , Tetsuro Wada , Koichi Shintomi , Kazuyou Mizuno
IPC分类号： B05D5/06
CPC分类号： C23C14/547 , C23C14/505 , C23C14/548
摘要： A thin film deposition method for producing an optical film with an optical characteristic on a deposition substrate in a vacuum chamber is provided. The method may include preparing in the vacuum chamber a deposition source which is a source of the film producing material; holding the deposition substrate with a substrate holding member; arranging the deposition substrate and the deposition source such that, given that a vertical distance from the center of the deposition substrate to the deposition source is defined as ZK and a horizontal distance between the deposition substrate and the deposition source as Xk, Xk/Zk is set to satisfy a following equation 0.48≦Xk/Zk≦0.78; rotating the deposition substrate on a rotational axis which is orthogonal to the deposition substrate; and evaporating the film producing material of the deposition source to perform deposition on the deposition substrate.
摘要翻译：提供了一种用于在真空室中在沉积基板上制造具有光学特性的光学膜的薄膜沉积方法。该方法可以包括在真空室中制备作为成膜材料源的沉积源; 用衬底保持构件保持沉积衬底; 布置沉积基板和沉积源，使得考虑到从沉积基板的中心到沉积源的垂直距离被定义为ZK，并且沉积基板和沉积源之间的水平距离为Xk，Xk / Zk为设定为满足以下等式0.48 <= Xk / Zk <= 0.78; 使沉积衬底旋转在与沉积衬底正交的旋转轴上; 蒸发沉积源的薄膜生成材料，以在沉积基板上进行沉积。

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