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    • 1. 发明申请
    • SEMICONDUCTORS BASED ON SUBSTITUTED [1]BENZOTHIENO[3,2-b][1]-BENZOTHIOPHENES
    • US20130146858A1
    • 2013-06-13
    • US13809946
    • 2011-07-19
    • Timo Meyer-FriedrichsenKnud ReuterAndreas ElschnerMarcus Halik
    • Timo Meyer-FriedrichsenKnud ReuterAndreas ElschnerMarcus Halik
    • H01L51/00
    • H01L51/0074C07D495/04C07F9/655354H01L51/0002H01L51/0558Y02E10/549Y02P70/521
    • The present invention relates to compounds of the general formula (I) wherein Z corresponds a to — a C1-C22-alkyl radical substituted by halogen, phosphonic acid or phosphonic acid ester groups —P(O)(OR1)2 (wherein the radicals R1 can be identical or different and correspond to a hydrogen atom or C1-C12-alkyl), sulphonic acid groups —SO3H, halosilyl radicals —SiHalnR23−n(R2═C1-C18-alkyl, n=an integer from 1 to 3), thiol groups or trialkoxysilyl radicals —Si(OR3)3 (R3═C1-C18-alkyl), — a C5-C12-cycloalkyl radical substituted by halogen, phosphonic acid or phosphonic acid ester groups—P(O) (OR1)2 (wherein the radicals R1 can be identical or different and correspond to a hydrogen atom or C1-C12-alkyl), sulphonic acid groups —SO3H, halosilyl radicals —SiHal−nR23−n(R2═C1-C18-alkyl, n=an integer from 1 to 3), thiol groups or trialkoxysilyl radicals —Si(OR3)3 (R3═C1-C18-alkyl), — a C6-C14-aryl radical or heteroaryl radical from the group of the thienyl, pyrryl, furyl or pyridyl radicals substituted by halogen, phosphonic acid or phosphonic acid ester groups —P(O)(OR1)2 (wherein the radicals R1 can be identical or different and correspond to a hydrogen atom or C1-C12-alkyl), sulphonic acid groups —SO3H, halosilyl radicals —SiHalnR23−n (R2═C1-C18-alkyl, n=an integer from 1 to 3), thiol groups or trialkoxysilyl radicals —Si(OR3)3 (R3═C1-C18-alkyl), or — a C7-C30-aralkyl radical optionally substituted by halogen, phosphonic acid or phosphonic acid ester groups —P(O)(OR1)2 (wherein the radicals R1 can be identical or different and correspond to a hydrogen atom or C1-C12-alkyl), sulphonic acid groups —SO3H, halosilyl radicals —SiHalnR23−n (R2═C1-C18-alkyl, n=an integer from 1 to 3), thiol groups or trialkoxysilyl radicals —Si(OR3)3 (R3═C1-C18-alkyl) or a trialkylsilyl radical R5R6R7Si, in which R5, R6, R7 independently of each other are identical or different C1-C18-alkyl radicals. The present invention also relates to a semiconductor layer, an electronic component, a process for the production of an electronic component, the electronic component obtainable by this process and the use of compounds of the general formula (I).
    • 3. 发明申请
    • PROCESSES FOR PREPARING NIOBIUM ALKOXIDES, AND NIOBIUM ALKOXIDES PREPARED THEREBY
    • 制备铌酸钾的方法和制备的铌酸铋
    • US20080071102A1
    • 2008-03-20
    • US11855219
    • 2007-09-14
    • Knud Reuter
    • Knud Reuter
    • C07F9/00
    • C07C29/80C07C29/88C07C31/28
    • Processes for preparing high-purity niobium alkoxides, especially niobium ethoxide, are described which include: (a) providing a crude niobium alkoxide starting material comprising at least one compound of the general formula (I) Nb(OR)5   (I) wherein each R independently represents a linear or branched C1-12 alkyl group; and (b) contacting the crude niobium alkoxide starting material with a treatment medium comprising a component selected from the group consisting of (i) one or more alcohols of the general formula (II) in an amount of 0.01 to 5% by weight, (ii) air or an oxygen-containing gas, and (iii) combinations thereof; R1OH   (II) wherein each R1 independently represents a linear or branched C1-12 alkyl group.
    • 描述了制备高纯度铌醇盐,特别是铌乙醇盐的方法,其包括:(a)提供粗制的铌醇盐起始材料,其包含至少一种通式(I)的化合物, 在线公式“end =”lead“?> Nb(OR)5(I)<?in-line-formula description =”In-line Formulas“end =”tail“?>其中 每个R独立地表示直链或支链C 1-12烷基; 和(b)将粗铌醇盐起始原料与包含选自(i)一种或多种通式(II)的醇的组分的处理介质接触,其量为0.01至5重量%(( ii)空气或含氧气体,和(iii)其组合; <?in-line-formula description =“In-line Formulas”end =“lead”?> R <1> OH(II)<?in-line-formula description =“In-line Formulas” 末端=“尾”→其中每个R 1独立地表示直链或支链C 1-12烷基。
    • 4. 发明申请
    • METHODS OF STABILIZING THIOPHENE DERIVATIVES
    • 稳定噻吩衍生物的方法
    • US20070260070A1
    • 2007-11-08
    • US11744264
    • 2007-05-04
    • Friedrich JonasKlaus WussowKnud Reuter
    • Friedrich JonasKlaus WussowKnud Reuter
    • C07D495/02
    • C07D495/04
    • Methods of stabilizing thiophene derivatives of the general formula (I) by treatment with basic compounds: wherein R1 and R2 each independently represents a moiety selected from the group consisting of hydrogen, optionally substituted C1-20 alkyl groups which can contain up to 5 heteroatoms selected from the group consisting of oxygen and sulfur, optionally substituted C1-20 oxyalkyl groups which can contain up to 5 heteroatoms selected from the group consisting of oxygen and sulfur, or wherein R1 and R2 together represent a fused cyclic moiety selected from the group consisting of optionally substituted C1-20 dioxyalkylene groups and C1-20 dioxyarylene groups; and stabilized thiophene derivatives that can be prepared by such methods.
    • 通过用碱性化合物处理来稳定通式(I)的噻吩衍生物的方法:其中R 1和R 2各自独立地表示选自氢 ,任选取代的C 1-20烷基,其可以含有至多5个选自氧和硫的杂原子,任选取代的C 1-20烷氧基,其可以 含有多至5个选自氧和硫的杂原子,或其中R 1和R 2一起代表稠合的环状部分,其选自任选取代的 C 1-20二氧亚烷基和C 1-20二取代的亚芳基; 和可以通过这些方法制备的稳定的噻吩衍生物。
    • 8. 发明授权
    • Dye-donor element for use according to thermal dye sublimation transfer
    • 根据热染料升华转移使用的染料供体元件
    • US5372986A
    • 1994-12-13
    • US61523
    • 1993-05-17
    • Geert DefieuwRolf WehrmannRalf DujardinKnud Reuter
    • Geert DefieuwRolf WehrmannRalf DujardinKnud Reuter
    • B41M5/44B41M5/035B41M5/38
    • B41M5/44B41M2205/02B41M2205/30Y10S428/913Y10S428/914Y10T428/31507Y10T428/31663Y10T428/31786
    • Dye-donor element for use according to thermal dye sublimation transfer comprising a support having on one side a dye layer and on the other side a heat-resistant layer, characterized in that said heat-resistant layer comprises a polyether containing at least 10 mol % recurring units corresponding to the following formula (I)O--E--O--E'-- (I)wherein--O--E--O-- represents a divalent diphenolate radical corresponding to the following general formula (II) ##STR1## wherein R.sub.1 and R.sub.2 (same or different) represent hydrogen, halogen, a C.sub.1 -C.sub.8 alkyl group, a C.sub.5 -C.sub.6 cycloalkyl group, a C.sub.6 -C.sub.10 aryl group or a C.sub.7 -C.sub.12 aralkyl group; andX represents the necessary atoms to close a 5- to 8-membered cycloaliphatic ring which may be substituted with one or more C.sub.1 -C.sub.6 alkyl groups or 5- to 6-membered cycloalkyl groups or carry fused-on 5- or 6-membered cycloalkyl groups;--E'-- represents a divalent radical of an aromatic sulfone corresponding to the following general formula (III) ##STR2## or a divalent radical of a diarylketone corresponding to the following general formula (IV) ##STR3## or a divalent radical of benzonitrile corresponding to the following general formula (V) ##STR4## wherein Ar and Ar' in formula III and IV (same or different) represent difunctional aromatic radicals having 6 to 50 carbon atoms.
    • 用于根据热染料升华转移使用的染料供体元件,其包括在一侧具有染料层并且在另一侧上具有耐热层的载体,其特征在于,所述耐热层包含含有至少10mol% 对应于下式(I)的OEE-E' - (I)的重复单元代表氢,卤素,C 1 -C 8烷基, C5-C6环烷基,C6-C10芳基或C7-C12芳烷基; 并且X表示必须的原子以封闭可被一个或多个C 1 -C 6烷基或5-至6-元环烷基取代的5至8元环脂环,或携带稠合在5或6元环上 环烷基; -E'-表示对应于以下通式(III)的芳族砜的二价基团,或对应于以下通式(IV)的二烯丙酮的二价基团:响应于下列通式 通式(V)和IV(相同或不同)表示具有6至50个碳原子的二官能芳基。