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1. 发明授权

US08771538B2 Plasma source design 有权
标题翻译：等离子源设计
公开(公告)号：US08771538B2
公开(公告)日：2014-07-08
申请号：US12949661
申请日：2010-11-18
申请人： Dmitry Lubomirsky , Jang-Gyoo Yang , Matthew Miller , Jay Pinson , Kien Chuc
发明人： Dmitry Lubomirsky , Jang-Gyoo Yang , Matthew Miller , Jay Pinson , Kien Chuc
IPC分类号： B44C1/22 , H01J37/32
CPC分类号： H01J37/32357 , H01J37/3211
摘要： Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.
摘要翻译：本发明的实施例通常提供一种等离子体源装置及其使用方法，其能够通过使用电磁能量在等离子体产生区域内产生自由基和/或气体离子，所述等离子体产生区域围绕磁芯元件对称地定位资源。通常，等离子体产生区域和磁芯的取向和形状允许将输送的电磁能量有效均匀地耦合到设置在等离子体产生区域中的气体。通常，等离子体产生区域中形成的等离子体的改进的特性能够改善在设置在等离子体产生区域下游的衬底或处理室的一部分上进行的沉积，蚀刻和/或清洁过程。

2. 发明申请

US20070281106A1 PROCESS CHAMBER FOR DIELECTRIC GAPFILL 审中-公开
标题翻译：电介质加工室
公开(公告)号：US20070281106A1
公开(公告)日：2007-12-06
申请号：US11754924
申请日：2007-05-29
申请人： Dmitry Lubomirsky , Qiwei Liang , Soonam Park , Kien Chuc , Ellie Yieh
发明人： Dmitry Lubomirsky , Qiwei Liang , Soonam Park , Kien Chuc , Ellie Yieh
IPC分类号： H05H1/24
CPC分类号： C23C16/45502 , C23C16/401 , C23C16/402 , C23C16/452 , C23C16/45514 , C23C16/45565 , C23C16/45574 , C23C16/45576 , C23C16/45578 , C23C16/4584 , C23C16/4586 , C23C16/505 , C23C16/509 , C23C16/52 , H01J37/32082 , H01J37/32357 , H01J37/3244 , H01J37/32724 , H01J37/32752 , H01J2237/2001 , H01J2237/3321 , H01L21/02164 , H01L21/02274 , H01L21/76224
摘要： A system to form a dielectric layer on a substrate from a plasma of dielectric precursors is described. The system may include a deposition chamber, a substrate stage in the deposition chamber to hold the substrate, and a remote plasma generating system coupled to the deposition chamber, where the plasma generating system is used to generate a dielectric precursor having one or more reactive radicals. The system may also include a precursor distribution system that includes at least one top inlet and a plurality of side inlets. The top inlet may be positioned above the substrate stage and the side inlets may be radially distributed around the substrate stage. The reactive radical precursor may be supplied to the deposition chamber through the top inlet. An in-situ plasma generating system may also be included to generate the plasma in the deposition chamber from the dielectric precursors supplied to the deposition chamber.
摘要翻译：描述了从电介质前体的等离子体在衬底上形成电介质层的系统。该系统可以包括沉积室，用于保持衬底的沉积室中的衬底台和耦合到沉积室的远程等离子体生成系统，其中等离子体产生系统用于产生具有一个或多个反应性基团的电介质前体。该系统还可以包括前体分配系统，其包括至少一个顶部入口和多个侧入口。顶部入口可以位于衬底台的上方，并且侧入口可以在衬底台周围径向分布。反应性自由基前体可以通过顶部入口提供给沉积室。还可以包括原位等离子体产生系统，以从沉积室中提供的电介质前体在沉积室中产生等离子体。

3. 发明授权

US5212537A Calibration technique for monochromators and spectrophotometers 失效
标题翻译：单色仪和分光光度计的校准技术
公开(公告)号：US5212537A
公开(公告)日：1993-05-18
申请号：US551349
申请日：1990-07-12
申请人： Monoocher Birang , Kien Chuc , Ronnie Northrup , Bruno Strul
发明人： Monoocher Birang , Kien Chuc , Ronnie Northrup , Bruno Strul
IPC分类号： G01M11/00 , G01J3/02 , G01J3/04 , G01J3/28
CPC分类号： G01J3/28 , G01J3/02 , G01J3/0221 , G01J2003/2866 , G01N2201/082
摘要： A photometer having a plurality of input fibers to its optical entrance, at least one of which is for transmission of calibration light and at least one of which is for transmission of sample light. The exit ends of these fibers are aligned into a linear array, thereby producing an effective entrance slit for the optical entrance of the photometer. The fiber(s) for calibration light are positioned at the center of the linear array to avoid miscalibration due to photometer astigmatism.
摘要翻译：一种光度计，其具有到其入口的多个输入光纤，其中至少一个用于校准光的透射，并且其中至少一个用于透射样品光。这些光纤的出射端被排列成直线阵列，由此产生用于光度计的光学入口的有效入口狭缝。用于校准光的光纤位于线性阵列的中心，以避免由于光度计散光而造成的误差。

4. 发明授权

US08742665B2 Plasma source design 有权
公开(公告)号：US08742665B2
公开(公告)日：2014-06-03
申请号：US12905940
申请日：2010-10-15
申请人： Dmitry Lubomirsky , Jang-Gyoo Yang , Matthew Miller , Jay Pinson , Kien Chuc
发明人： Dmitry Lubomirsky , Jang-Gyoo Yang , Matthew Miller , Jay Pinson , Kien Chuc
IPC分类号： H05B31/26
CPC分类号： H01J37/3211 , H01J37/32357
摘要： Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

5. 发明申请

US20110115378A1 PLASMA SOURCE DESIGN 有权
标题翻译：等离子体源设计
公开(公告)号：US20110115378A1
公开(公告)日：2011-05-19
申请号：US12905940
申请日：2010-10-15
申请人： Dmitry Lubomirsky , Jang-Gyoo Yang , Matthew Miller , Jay Pinson , Kien Chuc
发明人： Dmitry Lubomirsky , Jang-Gyoo Yang , Matthew Miller , Jay Pinson , Kien Chuc
IPC分类号： H05B31/26
CPC分类号： H01J37/3211 , H01J37/32357
摘要： Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.
摘要翻译：本发明的实施例通常提供一种等离子体源装置及其使用方法，其能够通过使用电磁能量在等离子体产生区域内产生自由基和/或气体离子，所述等离子体产生区域围绕磁芯元件对称地定位资源。通常，等离子体产生区域和磁芯的取向和形状允许将输送的电磁能量有效均匀地耦合到设置在等离子体产生区域中的气体。通常，等离子体产生区域中形成的等离子体的改进的特性能够改善在设置在等离子体产生区域下游的衬底或处理室的一部分上进行的沉积，蚀刻和/或清洁过程。

6. 发明申请

US20110114601A1 PLASMA SOURCE DESIGN 有权
公开(公告)号：US20110114601A1
公开(公告)日：2011-05-19
申请号：US12949661
申请日：2010-11-18
申请人： Dmitry LUBOMIRSKY , Jang-Gyoo YANG , Matthew MILLER , Jay PINSON , Kien CHUC
发明人： Dmitry LUBOMIRSKY , Jang-Gyoo YANG , Matthew MILLER , Jay PINSON , Kien CHUC
IPC分类号： C23F1/08 , C23C16/44 , C23C16/505 , H05H1/24 , C23F1/00
CPC分类号： H01J37/32357 , H01J37/3211
摘要： Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

7. 发明申请

US20070289534A1 PROCESS CHAMBER FOR DIELECTRIC GAPFILL 审中-公开
标题翻译：电介质加工室
公开(公告)号：US20070289534A1
公开(公告)日：2007-12-20
申请号：US11754858
申请日：2007-05-29
申请人： Dmitry Lubomirsky , Qiwei Liang , Soonam Park , Kien Chuc , Ellie Yieh
发明人： Dmitry Lubomirsky , Qiwei Liang , Soonam Park , Kien Chuc , Ellie Yieh
IPC分类号： C23C16/452
CPC分类号： C23C16/46 , C23C16/452 , C23C16/45565 , C23C16/45574 , H01L21/67115
摘要： A system to form a dielectric layer on a substrate from a plasma of dielectric precursors is described. The system may include a deposition chamber, a substrate stage in the deposition chamber to hold the substrate, and a remote plasma generating system coupled to the deposition chamber, where the plasma generating system is used to generate a dielectric precursor having one or more reactive radicals. The system may also include a radiative heating system to heat the substrate that includes at least one light source, where at least some of the light emitted from the light source travels through the top side of the deposition chamber before reaching the substrate. The system may also include a precursor distribution system to introduce the reactive radical precursor and additional dielectric precursors to the deposition chamber. An in-situ plasma generating system may also be included to generate the plasma in the deposition chamber from the dielectric precursors supplied to the deposition chamber.
摘要翻译：描述了从电介质前体的等离子体在衬底上形成电介质层的系统。该系统可以包括沉积室，用于保持衬底的沉积室中的衬底台和耦合到沉积室的远程等离子体生成系统，其中等离子体产生系统用于产生具有一个或多个反应性基团的电介质前体。该系统还可以包括辐射加热系统以加热包括至少一个光源的基板，其中从光源发射的至少一些光在到达基板之前穿过沉积室的顶侧。该系统还可以包括将反应性基团前体和另外的电介质前体引入沉积室的前体分配系统。还可以包括原位等离子体产生系统，以从沉积室中提供的电介质前体在沉积室中产生等离子体。

8. 发明申请

US20070277734A1 PROCESS CHAMBER FOR DIELECTRIC GAPFILL 审中-公开
标题翻译：电介质加工室
公开(公告)号：US20070277734A1
公开(公告)日：2007-12-06
申请号：US11754916
申请日：2007-05-29
申请人： Dmitry Lubomirsky , Qiwei Liang , Soonam Park , Kien Chuc , Ellie Yieh
发明人： Dmitry Lubomirsky , Qiwei Liang , Soonam Park , Kien Chuc , Ellie Yieh
IPC分类号： C23C16/00
CPC分类号： C23C16/45565 , C23C16/402 , C23C16/45574 , C23C16/505
摘要： A system to form a dielectric layer on a substrate from a plasma of dielectric precursors is described. The system may include a deposition chamber, a substrate stage in the deposition chamber to hold the substrate, and a remote plasma generating system coupled to the deposition chamber, where the plasma generating system is used to generate a dielectric precursor having one or more reactive radicals. The system may also include a precursor distribution system comprising a dual-channel showerhead positioned above the substrate stage. The showerhead may have a faceplate with a first set of openings through which the reactive radical precursor enters the deposition chamber, and a second set of openings through which a second dielectric precursor enters the deposition chamber. An in-situ plasma generating system may also be included to generate the plasma in the deposition chamber from the dielectric precursors supplied to the deposition chamber.
摘要翻译：描述了从电介质前体的等离子体在衬底上形成电介质层的系统。该系统可以包括沉积室，用于保持衬底的沉积室中的衬底台和耦合到沉积室的远程等离子体生成系统，其中等离子体产生系统用于产生具有一个或多个反应性基团的电介质前体。该系统还可以包括前体分配系统，其包括位于衬底台上方的双通道喷头。喷头可以具有面板，其具有第一组开口，反应性自由基前体通过该开口进入沉积室，以及第二组开口，第二介电体前体通过该开口进入沉积室。还可以包括原位等离子体产生系统，以从沉积室中提供的电介质前体在沉积室中产生等离子体。

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