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1. 发明申请

US20060291020A1 Illumination device and method using adaptable source and output format 有权
公开(公告)号：US20060291020A1
公开(公告)日：2006-12-28
申请号：US11073893
申请日：2005-03-07
申请人： Richard Knox , Kevin Hathaway , David Kappel , Robert Fischer , Biljana Tadic-Galeb
发明人： Richard Knox , Kevin Hathaway , David Kappel , Robert Fischer , Biljana Tadic-Galeb
IPC分类号： G02B5/32
CPC分类号： G02B5/32 , G02B5/0215 , G02B5/0252 , G02B5/0278 , G02B27/0927 , G02B27/0944 , G02B27/48
摘要： Systems and methods for providing illumination suitable for imaging devices such as laser projection systems, wherein the illumination pattern is adjustable by modifying one or more characteristics of a controlled angle diffuser. In one embodiment, a highly collimated (e.g., laser light) beam is passed through a holographic diffuser to create a well defined cone angle for the light emanating from each point on the diffuser. This light is focused into an illumination image that is controlled by the prescription of the diffuser. In one embodiment, the diffuser can be positioned to alternately place different regions having different prescriptions in the optical path corresponding to the illumination image. In one embodiment, the diffuser can be continually moved to eliminate speckling and “worminess” in the illumination image.

2. 发明授权

US06210484B1 Heating device containing a multi-lamp cone for heating semiconductor wafers 失效
标题翻译：包含用于加热半导体晶片的多灯锥体的加热装置
公开(公告)号：US06210484B1
公开(公告)日：2001-04-03
申请号：US09150280
申请日：1998-09-09
申请人： Kevin Hathaway
发明人： Kevin Hathaway
IPC分类号： C23C1600
CPC分类号： H01L21/67115
摘要： An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the present invention is directed to a heating device that contains at least one heating cone. The heating cone of the present invention includes a circular reflector that can be conically-shaped. A plurality of light energy sources are contained within the reflector. The light energy sources can be vertically oriented or can be tilted slightly towards the central axis of the heating cone. In this arrangement, it has been discovered that the heating cone produces a uniform irradiance distribution over a wafer being heated.
摘要翻译：公开了一种用于热处理半导体晶片的设备。该装置包括加热装置，其包含用于将光能发射到晶片上的光能源组件。特别地，本发明涉及一种包含至少一个加热锥体的加热装置。本发明的加热锥体包括圆锥形的圆形反射器。多个光能源包含在反射器内。光能源可以垂直取向，或者可以朝向加热锥体的中心轴线稍微倾斜。在这种布置中，已经发现加热锥体在被加热的晶片上产生均匀的辐照度分布。

3. 发明授权

US07554737B2 Illumination device and method using adaptable source and output format 有权
标题翻译：照明装置和使用适应源和输出格式的方法
公开(公告)号：US07554737B2
公开(公告)日：2009-06-30
申请号：US11073893
申请日：2005-03-07
申请人： Richard M. Knox , Kevin Hathaway , David Kappel , Robert E. Fischer , Biljana Tadic-Galeb
发明人： Richard M. Knox , Kevin Hathaway , David Kappel , Robert E. Fischer , Biljana Tadic-Galeb
IPC分类号： G02B5/02
CPC分类号： G02B5/32 , G02B5/0215 , G02B5/0252 , G02B5/0278 , G02B27/0927 , G02B27/0944 , G02B27/48
摘要： Systems and methods for providing illumination suitable for imaging devices such as laser projection systems, wherein the illumination pattern is adjustable by modifying one or more characteristics of a controlled angle diffuser. In one embodiment, a highly collimated (e.g., laser light) beam is passed through a holographic diffuser to create a well defined cone angle for the light emanating from each point on the diffuser. This light is focused into an illumination image that is controlled by the prescription of the diffuser. In one embodiment, the diffuser can be positioned to alternately place different regions having different prescriptions in the optical path corresponding to the illumination image. In one embodiment, the diffuser can be continually moved to eliminate speckling and “worminess” in the illumination image.
摘要翻译：用于提供适合于诸如激光投影系统的成像装置的照明的系统和方法，其中照明图案可通过修改受控角度扩散器的一个或多个特性来调节。在一个实施例中，高度准直（例如，激光）光束通过全息漫射器以产生用于从扩散器上的每个点发出的光的良好限定的锥角。该光被聚焦成由扩散器的处方控制的照明图像。在一个实施例中，扩散器可以被定位成在对应于照明图像的光路中交替地放置具有不同处方的不同区域。在一个实施例中，可以连续地移动扩散器以消除照明图像中的斑点和“蠕动”。

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