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1. 发明授权

US5131752A Method for film thickness endpoint control 失效
标题翻译：薄膜厚度终点控制方法
公开(公告)号：US5131752A
公开(公告)日：1992-07-21
申请号：US545997
申请日：1990-06-28
申请人： Chorng-Tao Yu , Kenneth H. Isaak
发明人： Chorng-Tao Yu , Kenneth H. Isaak
IPC分类号： G01B11/06 , G01N21/21 , H01L21/66
CPC分类号： B24B37/013 , G01B11/0683 , G01N21/211 , H01L22/26
摘要： Endpoint control of thickness of a film being deposited or etched is achieved by use of an ellipsometer that derives delta and psi coordinates of a polarized light beam reflected from the work piece during the course of processing. Measured film thickness is a function of the delta and psi coordinates and other parameters. Delta and psi coordinates of a selected end point (final film thickness) of the process are calculated, and an unbounded line through the endpoint perpendicular to the direction of a plot of delta and psi coordinates adjacent the endpoint is defined. As the processing continues, an ERROR is generated that becomes zero when measured delta and psi coordinates are on the line. When this error changes sign, in the appropriate cycle and within a reasonable range of the endpoint, the desired thickness has been attained, and the process is stopped. The improved film thickness endpoint control is used in a rapid thermal processing system wherein temperatures are changed at a rate of 100.degree. C. or more to deposit or etch film on a substrate. Instead of using a fixed time and other fixed parameters to control film thickness, the described precision endpoint control is employed to obtain increased accuracy of control of the rapid thermal processing system.
摘要翻译：通过使用椭圆偏振仪来实现沉积或蚀刻的膜的厚度的端点控制，所述椭偏仪在处理过程中导出从工件反射的偏振光束的δ和psi坐标。测量的膜厚度是Δ和psi坐标等参数的函数。计算过程的选定终点（最终膜厚度）的Δ和psi坐标，并且定义通过垂直于邻近该端点的Δ和psi坐标图的方向的端点的无界线。随着处理的进行，产生一个ERROR，当测量的delta和psi坐标在线上时，该值将变为零。当该错误改变符号时，在适当的循环中并且在端点的合理范围内，已经达到所需的厚度，并且该过程被停止。改进的膜厚度终点控制用于快速热处理系统，其中以100℃或更高的速率改变温度以在衬底上沉积或蚀刻膜。代替使用固定时间和其他固定参数来控制膜厚度，采用所描述的精确端点控制来获得快速热处理系统的控制精度。

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