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    • 1. 发明申请
    • Nonvolatile semiconductor memory capable of storing data of two bits or more per cell
    • 能够存储每个单元两位或更多位数据的非易失性半导体存储器
    • US20060081891A1
    • 2006-04-20
    • US11252619
    • 2005-10-19
    • Kenichirou Nakagawa
    • Kenichirou Nakagawa
    • H01L29/80
    • H01L27/11568H01L27/115H01L29/40117H01L29/7923
    • A nonvolatile semiconductor memory includes a gate insulating layer, a control gate layer, a first silicide layer, charge accumulating layers, memory gate layers and second silicide layers. The gate insulating layer is formed on a first region of a semiconductor substrate. The control gate layer is formed on the gate insulating layer. The first silicide layer is formed on the control gate layer. The charge accumulating layer is formed on one side of the first region of the semiconductor substrate, and capable to accumulate charges. The memory gate layers is formed on the charge accumulating layer, away from the control gate layer. The second silicide layer is formed on the memory gate layer. The memory gate layer includes a thick gate layer and a thin gate layer. The thick gate layer is formed far side from the control gate layer, and bonded to the second silicide layer. The thin gate layer is formed near side from the control gate layer, thinner in a layer thickness than the thick gate layer and shorter in a height than the control gate layer.
    • 非易失性半导体存储器包括栅极绝缘层,控制栅极层,第一硅化物层,电荷累积层,存储栅极层和第二硅化物层。 栅极绝缘层形成在半导体衬底的第一区域上。 控制栅极层形成在栅极绝缘层上。 第一硅化物层形成在控制栅极层上。 电荷累积层形成在半导体衬底的第一区域的一侧上,并且能够积累电荷。 存储栅极层形成在电荷累积层上,远离控制栅极层。 第二硅化物层形成在存储器栅极层上。 存储栅极层包括厚栅极层和薄栅极层。 厚栅极层与控制栅极层远离,并与第二硅化物层结合。 薄栅层形成在靠近控制栅极层的一侧,层厚度比厚栅极薄,层厚比控制栅极层高。