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    • 1. 发明授权
    • Surface defect inspection method and apparatus
    • 表面缺陷检查方法及装置
    • US08502966B2
    • 2013-08-06
    • US13646066
    • 2012-10-05
    • Kenichi ShitaraHiroshi Nakajima
    • Kenichi ShitaraHiroshi Nakajima
    • G01N21/00
    • G01N21/9501G01N21/47
    • The present invention provides an apparatus and method which enable detecting a microscopic defect sensitively by efficiently collecting and detecting scattering light from a defect in a wider region without enlarging the apparatus. In the apparatus for inspecting a defect on a surface of a sample, including illumination means which irradiates a surface of a sample with laser, reflected light detection means which detects reflected light from the sample, and signal processing means which processes a detected signal and detecting a defect on the sample, the reflected light detection means is configured to include a scattering light detection unit which collects scattering light components of the reflected light from the sample by excluding specularly reflected light components by using an aspheric flannel lens and detecting the scattering light components.
    • 本发明提供了一种能够通过在不扩大设备的情况下有效地收集和检测来自较宽区域的缺陷的散射光而敏感地检测微观缺陷的装置和方法。 在用于检查样品表面上的缺陷的装置中,包括用激光照射样品表面的照射装置,检测来自样品的反射光的反射光检测装置和处理检测信号的信号处理装置, 反射光检测装置被配置为包括:散射光检测单元,其通过使用非球面法兰绒透镜排除镜面反射光分量并且检测散射光分量来收集来自样品的反射光的散射光分量 。
    • 2. 发明授权
    • Surface defect inspection method and apparatus
    • 表面缺陷检查方法及装置
    • US08294888B2
    • 2012-10-23
    • US12855873
    • 2010-08-13
    • Kenichi ShitaraHiroshi Nakajima
    • Kenichi ShitaraHiroshi Nakajima
    • G01N21/00
    • G01N21/9501G01N21/47
    • The present invention provides an apparatus and method which enable detecting a microscopic defect sensitively by efficiently collecting and detecting scattering light from a defect in a wider region without enlarging the apparatus. In the apparatus for inspecting a defect on a surface of a sample, including illumination means which irradiates a surface of a sample with laser, reflected light detection means which detects reflected light from the sample, and signal processing means which processes a detected signal and detecting a defect on the sample, the reflected light detection means is configured to include a scattering light detection unit which collects scattering light components of the reflected light from the sample by excluding specularly reflected light components by using an aspheric flannel lens and detecting the scattering light components.
    • 本发明提供了一种能够通过在不扩大设备的情况下有效地收集和检测来自较宽区域的缺陷的散射光而敏感地检测微观缺陷的装置和方法。 在用于检查样品表面上的缺陷的装置中,包括用激光照射样品表面的照射装置,检测来自样品的反射光的反射光检测装置和处理检测信号的信号处理装置, 反射光检测装置被配置为包括:散射光检测单元,其通过使用非球面法兰绒透镜排除镜面反射光分量并且检测散射光分量来收集来自样品的反射光的散射光分量 。
    • 4. 发明申请
    • METHOD AND ITS APPARATUS FOR INSPECTING A MAGNETIC DISK
    • 用于检查磁盘的方法及其装置
    • US20110188143A1
    • 2011-08-04
    • US13012883
    • 2011-01-25
    • Kenichi SHITARAAyumu ISHIHARA
    • Kenichi SHITARAAyumu ISHIHARA
    • G11B19/04
    • G11B19/04
    • In order to implement efficient read/write testing by firstly determining read/write test area-sampling positions based on position information relating to any defects detected during optical inspection, and then conducting read/write tests only upon areas neighboring the defects detected during the optical inspection, a magnetic disk to be inspected is retained on a spindle and moved under this state between an optical type of inspection apparatus and a read/write test apparatus, in which apparatus configuration the read/write test apparatus uses position information on any defects detected by the optical type of inspection apparatus and conducts read/write tests only upon neighboring areas of the defects detected by the optical type of inspection apparatus.
    • 为了实现高效的读/写测试,首先根据与光学检测期间检测到的任何缺陷相关的位置信息确定读/写测试区域采样位置,然后仅在与光学期间检测到的缺陷相邻的区域进行读/写测试 检查中,要检查的磁盘被保持在主轴上并且在该状态下在光学类型的检查装置和读/写测试装置之间移动,其中读/写测试装置使用检测到的任何缺陷的位置信息 通过光学类型的检查装置,仅对由光学型检查装置检测到的缺陷的相邻区域进行读/写测试。
    • 9. 发明授权
    • Method for measuring optimum seeking time and inspection apparatus using the same
    • 测量最佳寻道时间的方法及使用该方法的检查装置
    • US08031421B2
    • 2011-10-04
    • US12788481
    • 2010-05-27
    • Kenichi ShitaraSumihiro Maeda
    • Kenichi ShitaraSumihiro Maeda
    • G11B27/36
    • G11B27/36G11B5/09G11B5/455G11B5/5547
    • The present invention provides a method for measuring an optimum seeking time and an inspection apparatus using this method capable of measuring and setting an optimum seeking time for inspection of a magnetic disk or magnetic head. The method samples average level differences of sector-wise read signals in positive and negative domains for one round of track and detects a minimum value H and a minimum value L among these differences. The method recalculates the seeking time while changing the settling time. After writing and reading test data, calculates a deviation DEV of average levels DEV=(H−L)/(H+L). The method is adapted to obtain a minimum one of the values of settling time having measured when the deviation DEV of average levels is equal to or less than a predetermined value as an optimum settling time or an optimum seeking time.
    • 本发明提供了一种用于测量最佳寻找时间的方法和使用该方法的检查装置,该方法能够测量和设置用于检查磁盘或磁头的最佳寻找时间。 该方法对一轮轨道的正域和负域中的扇区读信号的平均电平差进行采样,并检测这些差中的最小值H和最小值L. 该方法在改变建立时间的同时重新计算寻找时间。 在写入和读取测试数据之后,计算平均电平DEV =(H-L)/(H + L)的偏差DEV。 该方法适于获得当平均电平的偏差DEV等于或小于预定值作为最佳建立时间或最佳寻找时间时测量的建立时间值中的最小值。