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    • 1. 发明授权
    • Method of manufacturing silicon sulfide
    • 硫化硅的制造方法
    • US5843391A
    • 1998-12-01
    • US839677
    • 1997-04-15
    • Kazutomi YamamotoNobuhiko Ikeda
    • Kazutomi YamamotoNobuhiko Ikeda
    • C01B17/20C01B33/00C01B17/00
    • C01B33/00Y10S423/12
    • Silicon sulfide is manufactured from the fine powder of silicon having a particle size in the range of 60 to 100.mu., covered thoroughly with sulfur at lower temperature less than 700.degree. C. in vacuum. In order to produce the silicon sulfide, silicon should be ground in a non-oxidizing atmosphere to prevent the formation of a silicon oxide layer that remains in the product and degrades the purity of the product. The silicon powder is dispersed sufficiently in the molten sulfur. At this time, the quantity of added sulfur needs more than 1.1 times in comparison with the stoichiometric quantity of silicon sulfide. All surfaces of silicon powder should be covered with sulfur to avoid sintering between silicon particles in the whole process of the reaction.
    • 硫化硅由粒度在60-100微米范围内的硅微粉制成,在真空中低于700℃的较低温度下用硫彻底覆盖。 为了生产硫化硅,应在非氧化性气氛中研磨硅,以防止残留在产品中的氧化硅层的形成并降低产品的纯度。 硅粉充分分散在熔融硫中。 此时,与硫化硅的化学计量量相比,添加硫的量需要1.1倍以上。 硅粉的所有表面均应用硫覆盖,以避免整个反应过程中硅颗粒之间的烧结。