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1. 发明申请

US20110189037A1 Pump Assembly For Evaporative Cooler 有权
标题翻译：蒸发冷却器泵组件
公开(公告)号：US20110189037A1
公开(公告)日：2011-08-04
申请号：US12762599
申请日：2010-04-19
申请人： Karl Armstrong
发明人： Karl Armstrong
IPC分类号： F04D13/00 , F04D29/40
CPC分类号： F04D13/00 , F04D29/40
摘要： A pump assembly for circulating water in an evaporative cooler is provided. The pump assembly may include a housing which defines a cavity. The pump assembly may also include an impeller received in the cavity of the housing. Further, the pump assembly may include a rod which may be operatively associated with the impeller and extends out of the housing. Moreover, the pump assembly may include a connecting member which is operatively associated with the rod, and may be adapted to be operatively associated with a shaft of a fan assembly incorporated into the evaporative cooler. The connecting member may be adapted to transmit rotary motion of the shaft to the impeller, thereby enabling the pump assembly to circulate water in the evaporative cooler.
摘要翻译：提供了一种用于在蒸发冷却器中循环水的泵组件。泵组件可以包括限定空腔的壳体。泵组件还可以包括容纳在壳体的空腔中的叶轮。此外，泵组件可以包括杆，其可以与叶轮可操作地关联并延伸出壳体。此外，泵组件可以包括与杆可操作地相关联的连接构件，并且可以适于与结合到蒸发冷却器中的风扇组件的轴可操作地相关联。连接构件可以适于将轴的旋转运动传递到叶轮，从而使得泵组件能够使蒸发冷却器中的水循环。

2. 发明授权

US08556595B2 Pump assembly for evaporative cooler 有权
标题翻译：蒸发冷却器泵组件
公开(公告)号：US08556595B2
公开(公告)日：2013-10-15
申请号：US12762599
申请日：2010-04-19
申请人： Karl Armstrong
发明人： Karl Armstrong
IPC分类号： F04B23/14
CPC分类号： F04D13/00 , F04D29/40
摘要： A pump assembly for circulating water in an evaporative cooler is provided. The pump assembly may include a housing which defines a cavity. The pump assembly may also include an impeller received in the cavity of the housing. Further, the pump assembly may include a rod which may be operatively associated with the impeller and extends out of the housing. Moreover, the pump assembly may include a connecting member which is operatively associated with the rod, and may be adapted to be operatively associated with a shaft of a fan assembly incorporated into the evaporative cooler. The connecting member may be adapted to transmit rotary motion of the shaft to the impeller, thereby enabling the pump assembly to circulate water in the evaporative cooler.
摘要翻译：提供了一种用于在蒸发冷却器中循环水的泵组件。泵组件可以包括限定空腔的壳体。泵组件还可以包括容纳在壳体的空腔中的叶轮。此外，泵组件可以包括杆，其可以与叶轮可操作地关联并延伸出壳体。此外，泵组件可以包括与杆可操作地相关联的连接构件，并且可以适于与结合到蒸发冷却器中的风扇组件的轴可操作地相关联。连接构件可以适于将轴的旋转运动传递到叶轮，从而使得泵组件能够使蒸发冷却器中的水循环。

3. 发明申请

US20130248352A1 Multiple Frequency Sputtering for Enhancement in Deposition Rate and Growth Kinetics of Dielectric Materials 审中-公开
标题翻译：用于增强介电材料的沉积速率和生长动力学的多频率溅射
公开(公告)号：US20130248352A1
公开(公告)日：2013-09-26
申请号：US13609178
申请日：2012-09-10
申请人： Chong Jiang , Byung-Sung Leo Kwak , Michael Stowell , Karl Armstrong
发明人： Chong Jiang , Byung-Sung Leo Kwak , Michael Stowell , Karl Armstrong
IPC分类号： C23C14/34
CPC分类号： C23C14/345 , C23C14/00 , C23C14/3471 , H01J37/32165 , H01J37/3405
摘要： A method of sputter depositing dielectric thin films may comprise: providing a substrate on a substrate pedestal in a process chamber, the substrate being positioned facing a sputter target; simultaneously applying a first RF frequency from a first power supply and a second RF frequency from a second power supply to the sputter target; and forming a plasma in the process chamber between the substrate and the sputter target, for sputtering the target; wherein the first RF frequency is less than the second RF frequency, the first RF frequency is chosen to control the ion energy of the plasma and the second RF frequency is chosen to control the ion density of the plasma. The self-bias of surfaces within said process chamber may be selected; this is enabled by connecting a blocking capacitor between the substrate pedestal and ground.
摘要翻译：溅射沉积电介质薄膜的方法可以包括：在处理室中的衬底基座上提供衬底，衬底被定位成面对溅射靶; 同时将来自第一电源的第一RF频率和来自第二电源的第二RF频率施加到溅射靶; 以及在所述基板和所述溅射靶之间的所述处理室中形成等离子体，用于溅射所述靶; 其中所述第一RF频率小于所述第二RF频率，选择所述第一RF频率以控制所述等离子体的离子能量，并且选择所述第二RF频率以控制所述等离子体的离子密度。可以选择所述处理室内的表面的自偏压; 这可以通过在衬底基座和接地之间连接隔离电容器来实现。

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