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    • 1. 发明授权
    • Correction device for the correction of lens aberrations in
particle-optical apparatus
    • 用于校正粒子光学装置中的透镜像差的校正装置
    • US5838011A
    • 1998-11-17
    • US861345
    • 1997-05-21
    • Marcellinus P.C.M. KrijnAlexander HenstraKarel D. Van Den Mast
    • Marcellinus P.C.M. KrijnAlexander HenstraKarel D. Van Den Mast
    • H01J37/153
    • H01J37/153H01J2237/1534
    • Particle-optical rotationally-symmetrical lenses inevitably exhibit spherical and chromatic aberration. These lens aberrations usually determine the limit of the resolution of the known particle-optical apparatus. Said lens aberrations cannot be eliminated by compensation by means of rotationally-symmetrical fields. In order to enhance the resolution of particle-optical apparatus nevertheless, it is proposed to reduce said lens aberrations by means of a "Wien-type" corrector. Such a configuration must satisfy very severe requirements as regards manufacturing precision, mechanical stability (inter alia with a view to thermal drift), alignment of the various elements relative to one another, and stability of the electric currents and voltages for the excitation of the electric and magnetic poles. Because the known correction device is composed of a number of separate components, it is extremely difficult to satisfy the requirements as regards manufacturing precision, mechanical stability and alignment simultaneously for all of these components. In the corrector in accordance with the invention said requirements in respect of mechanical stability and precision are satisfied in a simpler manner in that the pole faces determining hexapole fields are arranged adjacent one another without other particle-optical elements being arranged therebetween.
    • 颗粒光学旋转对称透镜不可避免地呈现球面和色差。 这些透镜像差通常决定了已知粒子光学装置的分辨率的极限。 所述透镜像差不能通过旋转对称场的补偿来消除。 然而,为了提高粒子光学装置的分辨率,提出了通过“维恩型”校正器来减少所述透镜像差。 这种构造在制造精度,机械稳定性(特别是考虑到热漂移),各种元件相对于彼此的对准以及用于激发电气的电流和电压的稳定性方面必须满足非常严格的要求 和磁极。 由于已知的校正装置由多个单独的部件组成,因此对于所有这些部件的制造精度,机械稳定性和对准性的要求也是非常困难的。 在根据本发明的校正器中,关于机械稳定性和精度的所有要求以更简单的方式得到满足,因为确定六极场的极面彼此相邻地布置,而不在其间布置其它颗粒光学元件。