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    • 4. 发明申请
    • X-RAY SCATTEROMETRY APPARATUS
    • X射线扫描仪
    • US20150369759A1
    • 2015-12-24
    • US14735162
    • 2015-06-10
    • JORDAN VALLEY SEMICONDUCTORS LTD.
    • Isaac MazorAlex KrokhmalAlex DikopoltsevMatthew Wormington
    • G01N23/201G01N23/205G01N23/20
    • G01N23/201G01N2223/6116
    • Apparatus, including a sample-support that retains a sample in a plane having an axis, the plane defining first and second regions separated by the plane. A source-mount in the first region rotates about the axis, and an X-ray source on the source-mount directs first and second incident beams of X-rays to impinge on the sample at first and second angles along beam axes that are orthogonal to the axis. A detector-mount in the second region moves in a plane orthogonal to the axis and an X-ray detector on the detector-mount receives first and second diffracted beams of X-rays transmitted through the sample in response to the first and second incident beams, and outputs first and second signals, respectively, in response to the received first and second diffracted beams. A processor analyzes the first and the second signals so as to determine a profile of a surface of the sample.
    • 一种装置,包括将样品保持在具有轴的平面中的样品支撑体,所述平面限定由平面分隔的第一和第二区域。 第一区域中的源极安装围绕轴线旋转,源极安装座上的X射线源引导X射线的第一和第二入射光束沿着正交的束轴以第一和第二角度以第一和第二角度撞击在样品上 到轴。 第二区域中的检测器安装件在与轴线正交的平面中移动,并且检测器安装座上的X射线检测器响应于第一和第二入射光束接收通过样品传输的第一和第二衍射光束的X射线 并且响应于接收到的第一和第二衍射光束分别输出第一和第二信号。 处理器分析第一和第二信号,以便确定样品表面的轮廓。
    • 8. 发明申请
    • MEASUREMENT OF SMALL FEATURES USING XRF
    • 使用XRF测量小特征
    • US20160123909A1
    • 2016-05-05
    • US14922220
    • 2015-10-26
    • JORDAN VALLEY SEMICONDUCTORS LTD.
    • Matthew WormingtonIsaac MazorAlex TokarAlex Dikopoltsev
    • G01N23/223G01B15/02
    • G01N23/223G01B15/02G01N2223/303
    • A method for X-ray measurement includes, in a calibration phase, scanning a first X-ray beam, having a first beam profile, across a feature of interest on a calibration sample and measuring first X-ray fluorescence (XRF) emitted from the feature and from background areas of the calibration sample surrounding the feature. Responsively to the first XRF and the first beam profile, a relative emission factor is computed. In a test phase, a second X-ray beam, having a second beam profile, different from the first beam profile, is directed to impinge on the feature of interest on a test sample and second XRF emitted from the test sample is measured in response to the second X-ray beam. A property of the feature of interest on the test sample is computed by applying the relative emission factor together with the second beam profile to the measured second XRF.
    • 一种用于X射线测量的方法包括:在校准阶段,扫描具有第一光束轮廓的第一X射线束跨越校准样本上的感兴趣特征,并测量从第二射线谱发射的第一X射线荧光(XRF) 特征和来自该特征周围的校准样本的背景区域。 响应于第一XRF和第一光束轮廓,计算相对排放因子。 在测试阶段,具有不同于第一光束轮廓的第二光束轮廓的第二X射线束被引导以撞击测试样本上的感兴趣特征,并且响应地测量从测试样品发射的第二X射线 到第二个X射线束。 通过将相对放射因子与第二光束轮廓应用于测量的第二XRF来计算测试样品上的感兴趣特征的特性。
    • 9. 发明申请
    • X-RAY SOURCE ASSEMBLY
    • X射线源组件
    • US20150243469A1
    • 2015-08-27
    • US14565474
    • 2014-12-10
    • JORDAN VALLEY SEMICONDUCTORS LTD.
    • Isaac MazorAsher PeledAlex BrandtMatthew Wormington
    • H01J35/04H01J35/02
    • G21K1/06H01J35/14H05G1/52
    • An apparatus includes an X-ray tube, X-ray optics, one or more coils and control circuitry. The X-ray tube is configured to direct an electron beam onto an anode so as to emit an X-ray beam. The X-ray optics which configured to receive the X-ray beam emitted from the X-ray tube and to direct the X-ray beam onto a target. The coils are configured to steer the electron beam in the X-ray tube using electrical currents flowing through the coils. The control circuitry is configured to compensate for misalignment between the X-ray tube and the X-ray optics by analyzing the X-ray beam output by the X-ray optics, and setting the electrical currents based on the analyzed X-ray beam.
    • 一种装置包括X射线管,X射线光学器件,一个或多个线圈和控制电路。 X射线管被配置为将电子束引导到阳极上以发射X射线束。 X射线光学元件,被配置为接收从X射线管发射的X射线束并将X射线束引导到目标上。 线圈构造成使用流过线圈的电流来引导X射线管中的电子束。 控制电路被配置为通过分析由X射线光学器件输出的X射线束并且基于所分析的X射线束来设定电流来补偿X射线管与X射线光学元件之间的未对准。