会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Low-voltage image sensor with sensing control unit formed within
    • 低压图像传感器与感应控制单元组成
    • US08169010B2
    • 2012-05-01
    • US11932922
    • 2007-10-31
    • Mi Jin KimBong Ki MheenYoung Joo SongSeong Su Park
    • Mi Jin KimBong Ki MheenYoung Joo SongSeong Su Park
    • H01L31/00
    • H01L27/14609H04N5/235H04N5/3559H04N5/3597H04N5/374
    • Provided are an image sensor and a method of sensing the same. The image sensor includes: a light receiving device; a signal conversion unit including a transfer transistor having a plurality of transfer gates and for converting photocharges generated by the light receiving device into a voltage to output the voltage; and a sensing control unit for generating at least two reset signals and/or at least two transfer signals applied to the transfer gates of the transfer transistor during a one-time photosensing cycle. The image sensor is obtained by changing the structure and driving method of a transfer transistor of a typical 4-transistor CMOS image sensor and employs a deep depletion operation and a multiple reset operation, thereby reducing an image lag and increasing the well capacity of the light receiving device.
    • 提供了一种图像传感器及其感测方法。 图像传感器包括:光接收装置; 信号转换单元,包括具有多个传输门并将由光接收装置产生的光电荷转换成电压以输出电压的传输晶体管; 以及感测控制单元,用于在一次光敏周期期间产生施加到传输晶体管的传输门的至少两个复位信号和/或至少两个传输信号。 图像传感器通过改变典型的4晶体管CMOS图像传感器的传输晶体管的结构和驱动方法获得,并且采用深度耗尽操作和多重复位操作,从而减少图像滞后并增加光阱的容量 接收设备。
    • 7. 发明申请
    • CONTACT STRUCTURE OF A WIRES AND METHOD MANUFACTURING THE SAME, AND THIN FILM TRANSISTOR SUBSTRATE INCLUDING THE CONTACT STRUCTURE AND METHOD MANUFACTURING THE SAME
    • 一种线的接触结构及其制造方法,以及包括接触结构的薄膜晶体管基板及其制造方法
    • US20100096176A1
    • 2010-04-22
    • US12645458
    • 2009-12-22
    • Seung-Taek LIMMun-Pyo HongNam-Seok RohYoung-Joo SongSang-Ki KwakKwon-Young ChoiKeun-Kyu Song
    • Seung-Taek LIMMun-Pyo HongNam-Seok RohYoung-Joo SongSang-Ki KwakKwon-Young ChoiKeun-Kyu Song
    • H05K1/11
    • G02F1/13458G02F1/136227G02F1/136286G02F2001/13629H01L21/76805H01L21/76816H01L23/53223H01L27/124H01L2924/0002H01L2924/00
    • In a method of fabricating a thin film transistor array substrate for a liquid crystal display, a gate line assembly is formed on a substrate with a chrome-based under-layer and an aluminum alloy-based over-layer while proceeding in the horizontal direction. The gate line assembly has gate lines, and gate electrodes, and gate pads. A gate insulating layer is deposited onto the insulating substrate such that the gate insulating layer covers the gate line assembly. A semiconductor layer and an ohmic contact layer are sequentially formed on the gate insulating layer. A data line assembly is formed on the ohmic contact layer with a chrome-based under-layer and an aluminum alloy-based over-layer. The data line assembly has data lines crossing over the gate lines, source electrodes, drain electrodes, and data pads. A protective layer is deposited onto the substrate, and patterned to thereby form contact holes exposing the drain electrodes, the gate pads, and the data pads. The sidewall of the under-layers for the gate line assembly and the data line assembly is exposed through the contact holes. An IZO-based layer is deposited onto the substrate, and patterned to thereby form pixel electrodes, subsidiary gate pads, and subsidiary data pads. The pixel electrodes are connected to the sidewall of the drain electrodes, and the subsidiary gate and data pads are connected to the sidewall of the gate and the data pads.
    • 在制造用于液晶显示器的薄膜晶体管阵列基板的方法中,栅极线组件在沿水平方向前进的基底上形成有铬基底层和基于铝合金的超层。 栅极线组件具有栅极线,栅电极和栅极焊盘。 栅极绝缘层沉积在绝缘基板上,使得栅极绝缘层覆盖栅极线组件。 在栅极绝缘层上依次形成半导体层和欧姆接触层。 数据线组件在欧姆接触层上形成有铬基底层和基于铝合金的超层。 数据线组件具有跨越栅极线,源电极,漏电极和数据焊盘的数据线。 保护层沉积到衬底上,并被图案化,从而形成露出漏电极,栅极焊盘和数据焊盘的接触孔。 用于栅极线组件和数据线组件的下层的侧壁通过接触孔暴露。 将基于IZO的层沉积到衬底上并构图,从而形成像素电极,辅助栅极焊盘和辅助数据焊盘。 像素电极连接到漏电极的侧壁,辅助栅极和数据焊盘连接到栅极和数据焊盘的侧壁。
    • 9. 发明授权
    • Image sensor for low-noise voltage operation
    • 用于低噪声电压操作的图像传感器
    • US07554074B2
    • 2009-06-30
    • US11866698
    • 2007-10-03
    • Bong Ki MheenMin Hyung ChoMi Jin KimYoung Joo Song
    • Bong Ki MheenMin Hyung ChoMi Jin KimYoung Joo Song
    • H03F3/08H01L27/00H04N3/14
    • H04N5/3745H01L27/14603H01L27/14609H04N5/361
    • An image sensor operated in a pseudo pinch-off condition capable of reducing a reset voltage of a photodiode and reducing a dark current and fixed pattern noise generated due to discordance of characteristics between pixels is presented. The image sensor has a photosensitive pixel, a driving circuit and an intermediary circuit. The photosensitive pixel can have a photodiode generating a photoelectrons, a transfer transistor transferring the photoelectrons to a diffusion node, and a reset transistor resetting the diffusion node. The driving circuit generates a driving switching signal with respect to the transfer and resist transistors. The intermediary circuit changes characteristics of the signal to drive the photosensitive pixel in a pseudo pinch-off mode.
    • 提供了一种以能够减少光电二极管的复位电压并且减少由于像素之间的特性不一致而产生的暗电流和固定图案噪声的伪夹断条件操作的图像传感器。 图像传感器具有光敏像素,驱动电路和中间电路。 感光像素可以具有产生光电子的光电二极管,将光电子传输到扩散节点的转移晶体管以及复位扩散节点的复位晶体管。 驱动电路相对于转移和抗蚀剂晶体管产生驱动切换信号。 中间电路改变信号的特性以在伪夹断模式下驱动光敏像素。
    • 10. 发明申请
    • CONTACT STRUCTURE OF A WIRES AND METHOD MANUFACTURING THE SAME, AND THIN FILM TRANSISTOR SUBSTRATE INCLUDING THE CONTACT STRUCTURE AND METHOD MANUFACTURING THE SAME
    • 一种线的接触结构及其制造方法,以及包括接触结构的薄膜晶体管基板及其制造方法
    • US20090096105A1
    • 2009-04-16
    • US12333973
    • 2008-12-12
    • Seung-Taek LIMMun-Pyo HongNam-Seok RohYoung-Joo SongSang-Ki KwakKwon-Young ChoiKeun-Kyu Song
    • Seung-Taek LIMMun-Pyo HongNam-Seok RohYoung-Joo SongSang-Ki KwakKwon-Young ChoiKeun-Kyu Song
    • H01L23/48H01L23/52
    • G02F1/13458G02F1/136227G02F1/136286G02F2001/13629H01L21/76805H01L21/76816H01L23/53223H01L27/124H01L2924/0002H01L2924/00
    • In a method of fabricating a thin film transistor array substrate for a liquid crystal display, a gate line assembly is formed on a substrate with a chrome-based under-layer and an aluminum alloy-based over-layer while proceeding in the horizontal direction. The gate line assembly has gate lines, and gate electrodes, and gate pads. A gate insulating layer is deposited onto the insulating substrate such that the gate insulating layer covers the gate line assembly. A semiconductor layer and an ohmic contact layer are sequentially formed on the gate insulating layer. A data line assembly is formed on the ohmic contact layer with a chrome-based under-layer and an aluminum alloy-based over-layer. The data line assembly has data lines crossing over the gate lines, source electrodes, drain electrodes, and data pads. A protective layer is deposited onto the substrate, and patterned to thereby form contact holes exposing the drain electrodes, the gate pads, and the data pads. The sidewall of the under-layers for the gate line assembly and the data line assembly is exposed through the contact holes. An IZO-based layer is deposited onto the substrate, and patterned to thereby form pixel electrodes, subsidiary gate pads, and subsidiary data pads. The pixel electrodes are connected to the sidewall of the drain electrodes, and the subsidiary gate and data pads are connected to the sidewall of the gate and the data pads.
    • 在制造用于液晶显示器的薄膜晶体管阵列基板的方法中,栅极线组件在沿水平方向前进的基底上形成有铬基底层和基于铝合金的超层。 栅极线组件具有栅极线,栅电极和栅极焊盘。 栅极绝缘层沉积在绝缘基板上,使得栅极绝缘层覆盖栅极线组件。 在栅极绝缘层上依次形成半导体层和欧姆接触层。 数据线组件在欧姆接触层上形成有铬基底层和基于铝合金的超层。 数据线组件具有跨越栅极线,源电极,漏电极和数据焊盘的数据线。 保护层沉积到衬底上,并被图案化,从而形成露出漏电极,栅极焊盘和数据焊盘的接触孔。 用于栅极线组件和数据线组件的下层的侧壁通过接触孔暴露。 将基于IZO的层沉积到衬底上并构图,从而形成像素电极,辅助栅极焊盘和辅助数据焊盘。 像素电极连接到漏电极的侧壁,辅助栅极和数据焊盘连接到栅极和数据焊盘的侧壁。