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1. 发明申请

US20050263379A1 Reduction of oxides in a fluid-based switch 失效
标题翻译：减少基于流体的开关中的氧化物
公开(公告)号：US20050263379A1
公开(公告)日：2005-12-01
申请号：US11190041
申请日：2005-07-26
申请人： John Ralph Lindsey
发明人： John Ralph Lindsey
IPC分类号： H01H61/00 , G02B6/35 , H01H1/66 , H01H11/02 , H01H29/00 , H01H29/04 , H01H29/06 , H01H29/28 , H01H57/00
CPC分类号： H01H29/04 , G02B6/353 , G02B6/3538 , G02B6/3552 , G02B6/3576 , G02B6/3578 , G02B6/3594 , H01H1/66 , H01H11/02 , H01H29/28 , H01H2029/008
摘要： In one embodiment, a switch includes first and second mated substrates defining therebetween a number of cavities. A plurality of wettable elements are exposed within one or more of the cavities. A switching fluid is held within one or more of the cavities. The switching fluid serves to connect and disconnect at least a pair of the plurality of wettable elements in response to forces that are applied to the switching fluid. A gas is also held within one or more of the cavities. The gas is provided to react with oxides on or in the cavities. An actuating fluid is held within one or more of the cavities and applies the forces to the switching fluid. Methods of making such a switch are also disclosed.
摘要翻译：在一个实施例中，开关包括在其间限定多个空腔的第一和第二配合衬底。多个可湿性元件暴露在一个或多个空腔内。开关流体保持在一个或多个空腔内。开关流体用于响应于施加到开关流体的力而连接和断开至少一对多个可润湿元件。气体也保持在一个或多个空腔内。提供气体以与空腔中或其中的氧化物反应。致动流体被保持在一个或多个空腔内并将力施加到开关流体。还公开了制造这种开关的方法。

2. 发明授权

US06924443B2 Reducing oxides on a switching fluid in a fluid-based switch 失效
标题翻译：减少基于流体的开关中的开关流体上的氧化物
公开(公告)号：US06924443B2
公开(公告)日：2005-08-02
申请号：US10413794
申请日：2003-04-14
申请人： Marvin Glenn Wong , John Ralph Lindsey
发明人： Marvin Glenn Wong , John Ralph Lindsey
IPC分类号： H01H61/00 , G02B6/35 , H01H1/66 , H01H11/02 , H01H29/00 , H01H29/04 , H01H29/06 , H01H29/28 , H01H57/00
CPC分类号： G02B6/353 , G02B6/3538 , G02B6/3552 , G02B6/3576 , G02B6/3578 , G02B6/3594 , H01H1/66 , H01H11/02 , H01H29/04 , H01H29/28 , H01H2029/008
摘要： Fluid-based switch and methods for reducing oxides on switching fluid are disclosed. In one method, oxides are reduced by depositing a switching fluid on a first substrate, mating the first substrate to a second substrate, the first substrate and the second substrate defining therebetween a cavity holding the switching fluid, the cavity being sized to allow movement of the switching fluid between first and second states, and creating a gas in the cavity holding the switching fluid, the gas to react with at least one of oxygen in the cavity and oxides on the switching fluid.
摘要翻译：公开了基于流体的开关和用于减少开关流体上的氧化物的方法。在一种方法中，通过在第一衬底上沉积切换流体来减少氧化物，将第一衬底与第二衬底配合，第一衬底和第二衬底在其间限定保持开关流体的空腔，空腔的尺寸适于允许在第一状态和第二状态之间的开关流体，并且在保持开关流体的空腔中产生气体，气体与空腔中的氧中的至少一种和开关流体上的氧化物反应。

3. 发明授权

US07071432B2 Reduction of oxides in a fluid-based switch 失效
标题翻译：减少基于流体的开关中的氧化物
公开(公告)号：US07071432B2
公开(公告)日：2006-07-04
申请号：US11190041
申请日：2005-07-26
申请人： John Ralph Lindsey
发明人： John Ralph Lindsey
IPC分类号： H01H29/00
CPC分类号： H01H29/04 , G02B6/353 , G02B6/3538 , G02B6/3552 , G02B6/3576 , G02B6/3578 , G02B6/3594 , H01H1/66 , H01H11/02 , H01H29/28 , H01H2029/008
摘要： In one embodiment, a switch includes first and second mated substrates defining therebetween a number of cavities. A plurality of wettable elements are exposed within one or more of the cavities. A switching fluid is held within one or more of the cavities. The switching fluid serves to connect and disconnect at least a pair of the plurality of wettable elements in response to forces that are applied to the switching fluid. A gas is also held within one or more of the cavities. The gas is provided to react with oxides on or in the cavities. An actuating fluid is held within one or more of the cavities and applies the forces to the switching fluid. Methods of making such a switch are also disclosed.
摘要翻译：在一个实施例中，开关包括在其间限定多个空腔的第一和第二配合衬底。多个可湿性元件暴露在一个或多个空腔内。开关流体保持在一个或多个空腔内。开关流体用于响应于施加到开关流体的力而连接和断开至少一对多个可润湿元件。气体也保持在一个或多个空腔内。提供气体以与空腔中或其中的氧化物反应。致动流体被保持在一个或多个空腔内并将力施加到开关流体。还公开了制造这种开关的方法。

4. 发明授权

US06774325B1 Reducing oxides on a switching fluid in a fluid-based switch 失效
标题翻译：减少基于流体的开关中的开关流体上的氧化物
公开(公告)号：US06774325B1
公开(公告)日：2004-08-10
申请号：US10414130
申请日：2003-04-14
申请人： Marvin Glenn Wong , John Ralph Lindsey
发明人： Marvin Glenn Wong , John Ralph Lindsey
IPC分类号： H01H2900
CPC分类号： H01H29/06 , G02B26/004 , H01H29/28 , H01H2029/008
摘要： A fluid-based switch and method for producing the same are disclosed. In one embodiment, the switch is produced by depositing switching fluid on a first substrate; depositing a reducing material so that the reducing material contacts at least a portion of the switching fluid, the reducing material to react with oxides on the switching fluid, and mating a first substrate to a second substrate, the first substrate and the second substrate defining therebetween a cavity holding the switching fluid, the cavity being sized to allow movement of the switching fluid between first and second states.
摘要翻译：公开了一种基于流体的开关及其制造方法。在一个实施例中，通过在第一衬底上沉积开关流体来产生开关; 沉积还原材料，使得还原材料接触开关流体的至少一部分，还原材料与开关流体上的氧化物反应，并将第一衬底与第二衬底配合，第一衬底和第二衬底在其间限定保持开关流体的腔体，空腔的尺寸设计成允许开关流体在第一和第二状态之间移动。

5. 发明授权

US06747222B1 Feature formation in a nonphotoimagable material and switch incorporating same 失效
标题翻译：特征形成在不可光成像的材料和结合相同的开关
公开(公告)号：US06747222B1
公开(公告)日：2004-06-08
申请号：US10357794
申请日：2003-02-04
申请人： Marvin Glenn Wong , You Kondoh , John Ralph Lindsey
发明人： Marvin Glenn Wong , You Kondoh , John Ralph Lindsey
IPC分类号： H01H2900
CPC分类号： H01H29/28 , H01H11/02 , H01H2029/008
摘要： A first resist is deposited on at least a portion of a substrate (or existing feature on the substrate) that will underlie a feature in a nonphotoimagable material that is to be deposited on the substrate. Thereafter, the nonphotoimagable material is deposited so that it overlaps at least a portion of the first resist. A second resist is then deposited on at least a portion of the nonphotoimagable material, and a feature is patterned on the second resist. Subsequently, the part is sandblasted until the first resist is exposed, and the first and second resists are then removed. In one embodiment, the nonphotoimagable material is deposited on a channel plate and used to seal at least a switching fluid between the channel plate and another substrate.
摘要翻译：第一抗蚀剂沉积在基底（或基底上的现有特征）的至少一部分上，该基底将位于要沉积在基底上的不可光化材料中的特征的下面。此后，非光成像材料沉积成与第一抗蚀剂的至少一部分重叠。然后将第二抗蚀剂沉积在非可光成像材料的至少一部分上，并且将特征图案化在第二抗蚀剂上。随后，将该部分喷砂直到第一抗蚀剂暴露，然后除去第一和第二抗蚀剂。在一个实施例中，非可光成像材料沉积在通道板上并且用于至少密封通道板和另一基板之间的开关流体。

6. 发明授权

US5920013A Silicon micromachine with sacrificial pedestal 失效
标题翻译：具有牺牲基座的硅微机械
公开(公告)号：US5920013A
公开(公告)日：1999-07-06
申请号：US797376
申请日：1997-02-07
申请人： William John Boardman , John Crumlin , John Ralph Lindsey , Paul Thomas Carson , Judd Steven Carper , John Ames , Paul Elwin Stevenson
发明人： William John Boardman , John Crumlin , John Ralph Lindsey , Paul Thomas Carson , Judd Steven Carper , John Ames , Paul Elwin Stevenson
IPC分类号： B81C1/00 , G01P15/125
CPC分类号： B81C1/00801 , B81C2201/0133 , B81C2201/014 , B81C2203/031
摘要： A protective coating is utilized to protect the silicon during a wet chemical etch step in the process of making a micromachine, thereby preventing the formation of etched holes or pits in the micromachine. In another embodiment, silicon sacrificial pedestals are used to eliminate or greatly reduces the electrical potential difference between metal on the glass substrate and the silicon, thereby eliminating arcing and the resulting damage to silicon and metal. These pedestals may be removed after the anodic bond.
摘要翻译：在制造微机械过程中的湿化学蚀刻步骤期间，使用保护涂层来保护硅，从而防止在微机械中形成蚀刻的孔或凹坑。在另一个实施例中，硅牺牲基座用于消除或大大降低玻璃基板和硅之间的金属之间的电位差，由此消除电弧和由此导致的对硅和金属的损坏。这些基座可能在阳极结合之后被去除。

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