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    • 5. 发明授权
    • Semiconductor process residue removal composition and process
    • 半导体工艺残渣去除组成和工艺
    • US07528098B2
    • 2009-05-05
    • US10995239
    • 2004-11-24
    • Wai Mun LeeKaty IpXuan-Dung DinhDavid John Maloney
    • Wai Mun LeeKaty IpXuan-Dung DinhDavid John Maloney
    • H01L21/302
    • H01L21/02071C11D3/30C11D7/3218C11D11/0047G03F7/425
    • A residue remover for removing polymeric material and etch residue includes 2-(2-aminoethylamino)-ethanol and optionally another two-carbon atom linkage alkanolamine compound, gallic acid or catechol, water, a polar organic solvent, and hydroxylamine. A process for removing photoresist or other residue from a substrate, such as an integrated circuit semiconductor wafer including titanium metallurgy, includes the steps of contacting the substrate with the above composition for a time and at a temperature sufficient to remove the photoresist or other residue from the substrate. Use of 2-(2-aminoethylamino)-ethanol in the composition and process provides superior residue removal without attacking titanium or other metallurgy on the substrate. The composition preferably has a flash point greater than about 130° C.
    • 用于除去聚合物材料和蚀刻残渣的残留物除去剂包括2-(2-氨基乙基氨基) - 乙醇和任选的另外的两个碳原子键链烷醇胺化合物,没食子酸或邻苯二酚,水,极性有机溶剂和羟胺。 用于从衬底(例如包括钛冶金的集成电路半导体晶片)去除光致抗蚀剂或其它残留物的方法包括以下步骤:将衬底与上述组合物接触一段时间并在足以将光致抗蚀剂或其它残余物除去的温度 底物。 在组合物和方法中使用2-(2-氨基乙基氨基) - 乙醇提供优异的残余物去除而不侵蚀基材上的钛或其他冶金。 组合物优选具有大于约130℃的闪点
    • 8. 发明申请
    • BULLET TRAP
    • US20110056364A1
    • 2011-03-10
    • US12596597
    • 2008-04-03
    • Bruce KennedyDavid John MaloneyTrevor John Pearce
    • Bruce KennedyDavid John MaloneyTrevor John Pearce
    • F41A21/32
    • F41A21/32F41A21/26F42B30/06
    • A bullet trap (1) is provided that connects to a muzzle end (5) of a weapon (3). The bullet trap (1) has a body (11) with a chamber (17) into which a bullet can be fired. The chamber (17) has a plurality of baffles (27) located one behind the other in an aligned series arrangement. The baffles (27) absorb kinetic energy of a fired bullet and enable the bullet to be trapped within the body (11). The baffles (27) have a thickness at a centre of axis of travel of a bullet less than the thickness at a radially outwardly distant position to provide for a deformation at the centre of a first of a series of baffles (27) before there will be engagement of a centre of second and subsequent baffles (27).
    • 提供连接到武器(3)的枪口端(5)的子弹捕获器(1)。 子弹捕获器(1)具有主体(11),其具有腔室(17),子弹可以被射出。 腔室(17)具有多个以对齐的排列方式一个位于彼此之间的挡板(27)。 挡板(27)吸收发射的子弹的动能并使子弹被捕获在主体(11)内。 挡板(27)的厚度在子弹的行进中心处小于径向向外远的位置处的厚度,以在一系列挡板(27)的第一个中心处形成变形,之后将会有 接合第二和后续挡板(27)的中心。
    • 9. 发明申请
    • Method for evaluating ply wire anomalies in a tire
    • 评估轮胎中钢丝网异常的方法
    • US20070029027A1
    • 2007-02-08
    • US11196170
    • 2005-08-03
    • George StoilaWilliam DuttShaun ImmelEric OsbornJohn MaloneyDavid SchweitzerNormajean SelbyLuis Cabrera Arevalo
    • George StoilaWilliam DuttShaun ImmelEric OsbornJohn MaloneyDavid SchweitzerNormajean SelbyLuis Cabrera Arevalo
    • B29D30/06
    • B29D30/06B29D2030/0077
    • A method for detecting ply wire anomalies in a tire carcass ply having a plurality of spaced apart ply wires extending across a tire carcass, the method comprising the steps: constructing a green tire carcass in a diametrically expanded toroidal configuration, the carcass comprising a pair of beads, the carcass ply extending from bead to bead, at least one crown layer covering the carcass ply and having a peripheral skirt region; and sidewalls covering the carcass ply and extending from the beads to the crown layer and having edge portions intersecting the crown layer; mounting a wire sensor apparatus proximal to the tire carcass ply, the wire sensor apparatus including a wire sensor for detecting the presence of a proximal ply wire; establishing relative movement between the wire sensor and the tire carcass whereby the plurality of spaced apart ply wires are sequentially placed into proximal relationship with the wire sensor; and generating sequential data from the wire sensor indicative of at least one ply wire parameter of the plurality of spaced apart ply wires.
    • 一种用于检测轮胎胎体帘布层中的帘线异常的方法,所述轮胎胎体帘布层具有延伸穿过轮胎胎体的多个间隔开的帘布层线,所述方法包括以下步骤:构造为径向膨胀的环形构造的生胎轮胎,所述胎体包括一对 珠,胎体帘布层从胎圈延伸到胎圈,至少一个冠层覆盖胎体帘布层并具有周边裙部区域; 以及覆盖所述胎体帘布层并且从所述胎圈延伸到所述冠层并且具有与所述冠层相交的边缘部分的侧壁; 在所述轮胎胎体帘布层附近安装线传感器装置,所述线传感器装置包括用于检测近端帘布层线的存在的线传感器; 建立线传感器和轮胎胎体之间的相对运动,由此多个间隔开的帘布层帘布层依次放置成与线传感器的近端关系; 以及从所述线传感器生成指示所述多个间隔开的层叠线中的至少一个层线参数的顺序数据。
    • 10. 发明申请
    • Fabrication methods and structures for micro-reservoir devices
    • 微储层装置的制造方法和结构
    • US20060105275A1
    • 2006-05-18
    • US10988667
    • 2004-11-15
    • John MaloneyZouhair SbiaaJohn SantiniNorman SheppardScott Uhland
    • John MaloneyZouhair SbiaaJohn SantiniNorman SheppardScott Uhland
    • G03F7/00
    • B01L3/50853A61K9/0024A61K9/0097B01L2200/12B01L2300/0819B01L2400/0677
    • Methods are provided for making a multi-reservoir device comprising (i) patterning one or more photoresist layers on a substrate; (ii) depositing onto the substrate at least one metal layer by a sputtering process to form a plurality of reservoir caps and conductive traces; (iii) removing the photoresist layers using a liftoff process; (iv) forming a plurality of reservoirs in the substrate; (v) loading each reservoir with reservoir contents (such as a drug or sensor); and (vi) sealing each reservoir. Optionally, the reservoir cap comprises a first conductive metal layer coated with one or more protective noble metal films. To enhance the resistance of the substrate (e.g., a silicon substrate) to etching in vivo, the interior sidewalls of the reservoirs optionally can include a protective coating (e.g., gold, platinum, carbon, silicon carbide, silicon dioxide, and platinum silicide), or sidewalls comprising silicon can be doped with boron or another impurity.
    • 提供了用于制造多贮存器器件的方法,包括(i)在衬底上图案化一个或多个光致抗蚀剂层; (ii)通过溅射工艺在衬底上沉积至少一个金属层以形成多个储存器盖和导电迹线; (iii)使用剥离工艺除去光致抗蚀剂层; (iv)在所述基板中形成多个储存器; (v)向每个储存器装载储存器内容物(例如药物或传感器); 和(vi)密封每个储存器。 可选地,储存器盖包括涂覆有一个或多个保护性贵金属膜的第一导电金属层。 为了增强衬底(例如,硅衬底)在体内蚀刻的电阻,存储器的内侧壁任选地可以包括保护涂层(例如金,铂,碳,碳化硅,二氧化硅和硅化铂) ,或者包含硅的侧壁可以掺杂硼或另一种杂质。