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1. 发明授权

US06633017B1 System for plasma ignition by fast voltage rise 失效
标题翻译：快速升压等离子体点火系统
公开(公告)号：US06633017B1
公开(公告)日：2003-10-14
申请号：US09529431
申请日：2000-04-12
申请人： Geoffrey N. Drummond , George McDonough , Richard A. Scholl , Tim Kerr , John G. Harpold
发明人： Geoffrey N. Drummond , George McDonough , Richard A. Scholl , Tim Kerr , John G. Harpold
IPC分类号： B23K1000
CPC分类号： H01J37/32009 , H05H1/46
摘要： An improved system of igniting a plasma using a rapid voltage rise and thus causing ions that may be pre-existing to create secondary electron emission or the like is provided. In one embodiment, the voltage rise can be timed to be comparable to the transit time of the electrons across the plasma. It can also be arranged to achieve a voltage rise in less than 1000 microseconds, to result in a transition time that is less than one hundred times the transit time, to maximize the emission of secondary electrons, or even to merely result in collision energies ranging from 5 to 500 electron volts. The transition time can be controlled through an ignition control that may be programmable, may involve charging output storage devices, or may involve delayed switching to supply the increased voltage to the plasma after the storage elements have been more fully charged.
摘要翻译：提供了使用快速电压升高点燃等离子体并因此引起可能预先存在以产生二次电子发射等的离子的改进的系统。在一个实施例中，电压上升可以被定时以与电子穿过等离子体的传播时间相当。它还可以被设置为在小于1000微秒内实现电压上升，从而导致小于传输时间的百倍的转换时间，以使二次电子的发射最大化，或者甚至仅导致碰撞能量范围从5到500电子伏特。可以通过可编程的点火控制来控制转换时间，可能涉及对输出存储设备进行充电，或者可能涉及延迟开关，以在存储元件充满电后向等离子体提供增加的电压。

2. 发明授权

US4936960A Method and apparatus for recovery from low impedance condition during cathodic arc processes 失效
标题翻译：在阴极电弧过程中从低阻抗状态恢复的方法和装置
公开(公告)号：US4936960A
公开(公告)日：1990-06-26
申请号：US293179
申请日：1989-01-03
申请人： Jerry D. Siefkes , John G. Harpold , Douglas S. Schatz
发明人： Jerry D. Siefkes , John G. Harpold , Douglas S. Schatz
IPC分类号： H01J37/32 , H05B7/00
CPC分类号： H01J37/32055 , H05B7/00
摘要： Techniques for recovery from a low impedance conditions during cathodic arc or electric vapor thin film processes are disclosed. Sensing of a low impedance condition is achieved followed automatically by active clearing of the cloud to return it to the proper impedance or resistance state. Active clearing is accomplished by a progressive increase in the output of bias voltage supply. Regulation of the bias voltage supply switches between voltage or power modes and a current mode of regulation. Circuitry disclosed is designed to readily modify existing power supplies to achieve the methods discussed and to linearly increase the current output by it.
摘要翻译：公开了在阴极电弧或电蒸汽薄膜工艺期间从低阻抗条件恢复的技术。通过主动清除云以使其恢复到适当的阻抗或电阻状态，自动实现低阻抗条件的检测。主动清除是通过逐渐增加偏置电压输出来实现的。调节偏压电源在电压或功率模式之间切换和当前的调节方式。所公开的电路被设计为容易地修改现有电源以实现所讨论的方法并且通过它线性增加电流输出。

3. 发明授权

US4963238A Method for removal of electrical shorts in a sputtering system 失效
标题翻译：在溅射系统中去除电短路的方法
公开(公告)号：US4963238A
公开(公告)日：1990-10-16
申请号：US297707
申请日：1989-01-13
申请人： Jerry D. Siefkes , John G. Harpold , Douglas S. Schatz
发明人： Jerry D. Siefkes , John G. Harpold , Douglas S. Schatz
IPC分类号： C23C14/56 , H01J37/34
CPC分类号： H01J37/34 , C23C14/564 , H01J2237/0206 , H01J2237/022
摘要： Techniques for removing an electrical short caused by a flake in a thin film sputtering system are disclosed. The flake typically bridges the dark space between target and anode or shield and is removed through manipulation of the power supply utilized for normal operations. Sensing of the flake and discrimination between recoverable arcs is accomplished by timing the duration of an over-current condition. Removal involves switching between power mode or some other initial mode of regulation and current modes and progressively increasing current to melt the flake. Circuitry automatically removes the flake and is easily adapted to power supplies particularly more sophisticated, high frequency, lower energy storage DC supplies.
摘要翻译：公开了用于去除由薄膜溅射系统中的薄片引起的电短路的技术。薄片通常桥接目标和阳极或屏蔽之间的暗空间，并通过操纵用于正常操作的电源来移除。通过对过电流条件的持续时间进行定时，可以实现薄片的感测和可恢复电弧之间的辨别。去除涉及在功率模式或一些其他初始调节模式和电流模式之间切换，并逐渐增加电流以熔化薄片。电路自动去除薄片，并且易于适应电源，特别是更复杂，高频，更低能量存储的直流电源。

4. 发明授权

US5009764A Apparatus for removal of electrical shorts in a sputtering system 失效
标题翻译：用于在溅射系统中去除电短路的装置
公开(公告)号：US5009764A
公开(公告)日：1991-04-23
申请号：US494554
申请日：1990-03-16
申请人： Jerry D. Siefkes , John G. Harpold , Douglas S. Schatz
发明人： Jerry D. Siefkes , John G. Harpold , Douglas S. Schatz
IPC分类号： C23C14/56 , H01J37/34
CPC分类号： C23C14/564 , H01J37/34 , H01J2237/0206 , H01J2237/022
摘要： Techniques for removing an electrical short caused by a flake in a thin film sputtering system are disclosed. The flake typically bridges the dark space between target and anode or shield and is removed through manipulation of the power supply utilized for normal operations. Sensing of the flake and discrimination between recoverable arcs is accomplished by timing the duration of an over-current condition. Removal involves switching between power mode or some other initial mode of regulation and current modes and progressively increasing current to melt the flake. Circuitry automatically removes the flake and is easily adapted to power supplies particularly more sophisticated, high frequency, lower energy storage DC supplies.
摘要翻译：公开了用于去除由薄膜溅射系统中的薄片引起的电短路的技术。薄片通常桥接目标和阳极或屏蔽之间的暗空间，并通过操纵用于正常操作的电源来移除。通过对过电流条件的持续时间进行定时，可以实现薄片的感测和可恢复电弧之间的辨别。去除涉及在功率模式或一些其他初始调节模式和电流模式之间切换，并逐渐增加电流以熔化薄片。电路自动去除薄片，并且易于适应电源，特别是更复杂，高频，更低能量存储的直流电源。

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