会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • System and method for allocating multi-function resources for a wetdeck process in semiconductor wafer fabrication
    • 用于在半导体晶片制造中为湿法工艺分配多功能资源的系统和方法
    • US07184850B1
    • 2007-02-27
    • US11263589
    • 2005-10-31
    • George LogsdonGary ElmoreJohn Devlin
    • George LogsdonGary ElmoreJohn Devlin
    • G05B19/00
    • G05B19/41865G05B2219/31264G05B2219/31379G05B2219/45031G06Q10/0631Y02P90/20
    • A system and method is disclosed for allocating multi-function resources among a plurality of tasks within a wetdeck process in semiconductor wafer fabrication. A resource allocator allocates multi-function resources among tasks within a process system that executes at least one application process. The resource allocator comprises a monitoring controller, model of the process system and a resource allocation controller. The monitoring controller monitors measurable characteristics associated with the executing application process, multi-function resources and tasks. The model represents the multi-function resources and the tasks, and defines relationships among them. The resource allocation controller operates the model in response to the monitored measurable characteristics and allocates ones of the multi-function resources among ones of the tasks to efficiently execute the wetdeck process of the semiconductor wafer fabrication process.
    • 公开了一种用于在半导体晶片制造中的湿地工艺中的多个任务之间分配多功能资源的系统和方法。 资源分配器在执行至少一个应用进程的进程系统内的任务之间分配多功能资源。 资源分配器包括监视控制器,过程系统的模型和资源分配控制器。 监视控制器监视与执行的应用进程相关的可测量特征,多功能资源和任务。 该模型代表多功能资源和任务,并定义了它们之间的关系。 资源分配控制器响应于可监测的可测量特性来操作模型,并且在任务之一中分配多个功能资源中的一个以有效地执行半导体晶片制造过程的湿法处理。