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1. 发明申请

US20120216598A1 SYSTEM FOR MEASURING ABSOLUTE QUANTITY OF EACH COMPONENT OF GAS USING QMS 审中-公开
标题翻译：用QMS测量各种气体成分的绝对数量的系统
公开(公告)号：US20120216598A1
公开(公告)日：2012-08-30
申请号：US13510547
申请日：2010-11-25
申请人： Seok Rae Yoon , Seong Kweon Joh , Won Young Park , Keu Chan Lee , Jin Seong Kim , Jin Bok Lee , Dong Min Moon , Kwang Seob Kim
发明人： Seok Rae Yoon , Seong Kweon Joh , Won Young Park , Keu Chan Lee , Jin Seong Kim , Jin Bok Lee , Dong Min Moon , Kwang Seob Kim
IPC分类号： G01N7/00
CPC分类号： G01N7/00 , H01J49/00
摘要： The present invention relates to a system for measuring an absolute quantity of each component of a gas using a QMS, more particularly to a system for measuring an absolute quantity of each component of a gas using a QMS, which is capable of performing not only a qualitative analysis but also a quantitative analysis in an accurate manner, using just a trace amount of gas introduced through a pinhole. According to the present invention, the productivity of products can be improved, and production management can be performed in an efficient manner, thereby improving industrial competitiveness.
摘要翻译：本发明涉及一种用于使用QMS来测量气体的每个组分的绝对量的系统，更具体地说，涉及一种使用QMS测量气体的每个组分的绝对量的系统，该系统不仅可以执行定性分析，而且以准确的方式进行定量分析，仅使用通过针孔引入的微量气体。根据本发明，可以提高产品的生产率，并且可以有效地进行生产管理，从而提高工业竞争力。

2. 发明申请

US20100123074A1 DETECTION METHOD OF AIRBORNE NOXIOUS SUBSTANCE 审中-公开
标题翻译：空气中有害物质的检测方法
公开(公告)号：US20100123074A1
公开(公告)日：2010-05-20
申请号：US12613027
申请日：2009-11-05
申请人： Jung Ki SUH , Namgoo KANG , Jin Bok LEE
发明人： Jung Ki SUH , Namgoo KANG , Jin Bok LEE
IPC分类号： H01J49/26
CPC分类号： H01J49/105
摘要： Provided is a method for detecting an airborne noxious substance using radio-frequency inductive coupled plasma-mass spectroscopy (ICP-MS). The method includes: supplying a gas to be detected to a radio-frequency inductive coupled plasma; supplying oxygen gas to the gas introduced to the plasma to generate the oxide ion of a noxious element; and detecting the mass of the oxide ion of the noxious element. The method requires no separate pretreatment for detecting an airborne noxious substance, uses the ambient air itself as an analyte, and allows detection of the existence and amount of a noxious substance with high accuracy in a rapid and simple manner.
摘要翻译：提供了使用射频感应耦合等离子体质谱（ICP-MS）检测空气中的有害物质的方法。该方法包括：将待检测的气体供应到射频感应耦合等离子体; 向引入等离子体的气体供给氧气以产生有害元素的氧化物离子; 并检测有害元素的氧化物离子的质量。该方法不需要单独的预处理来检测空气中的有害物质，使用环境空气本身作为分析物，并且能够以快速和简单的方式高精度地检测有害物质的存在和量。

3. 发明授权

US08881575B2 Apparatus for collecting gas sample in foam, and analysis method using the same 有权
标题翻译：用于收集泡沫中气体样品的装置及其分析方法
公开(公告)号：US08881575B2
公开(公告)日：2014-11-11
申请号：US13139635
申请日：2009-12-15
申请人： Jin-Bok Lee , Jin-Seog Kim , Dong-Min Moon , Kwang-Sup Kim , Jeong-Soon Lee
发明人： Jin-Bok Lee , Jin-Seog Kim , Dong-Min Moon , Kwang-Sup Kim , Jeong-Soon Lee
IPC分类号： G01N7/00 , G01N7/14 , G01N1/28 , G01N1/22
CPC分类号： G01N7/14 , G01N1/22 , G01N1/286 , G01N2001/2866
摘要： Provided are an apparatus for collecting gas samples in a foam and an analysis method using the same, and more particularly, to an apparatus for collecting gas samples in a foam in which the foam is grinded, such that the gas sample in the foam may be effectively collected, and pressure before and after collection of the gas samples may be measured to thereby increase accuracy of gas analysis, such that characteristics of the foam may be more accurately evaluated, and an analysis method using the same.
摘要翻译：提供了一种用于收集泡沫中气体样品的装置和使用其的分析方法，更具体地，涉及一种用于收集泡沫中的气体样品的装置，其中泡沫体被研磨，使得泡沫中的气体样品可以是可以测量气体样品收集之前和之后的压力，从而提高气体分析的精度，从而可以更准确地评估泡沫的特性，以及使用其的分析方法。

4. 发明申请

US20130023075A1 Method of Forming Process Substrate Using Thin Glass Substrate and Method of Fabricating Flat Display Device Using the Same 有权
标题翻译：使用薄玻璃基板形成工艺基板的方法和使用其制造平板显示装置的方法
公开(公告)号：US20130023075A1
公开(公告)日：2013-01-24
申请号：US13459781
申请日：2012-04-30
申请人： Jae-Won LEE , Ki-Yong KIM , Jae Young OH , Yong-Su AN , Sung-Ki KIM , Gi-Sang HONG , Jin-Bok LEE , Sang-Hyuk WON , Dong-Kyu LEE
发明人： Jae-Won LEE , Ki-Yong KIM , Jae Young OH , Yong-Su AN , Sung-Ki KIM , Gi-Sang HONG , Jin-Bok LEE , Sang-Hyuk WON , Dong-Kyu LEE
IPC分类号： H01L33/58
CPC分类号： G02F1/1303 , G02F2001/133354 , H01L27/1266
摘要： A method for fabricating a process substrate includes: providing a first substrate; providing a substrate and an auxiliary substrate; contacting the substrate and the auxiliary substrate with each other in a vacuum state, thereby forming micro spaces of a vacuum state between the substrate and the auxiliary substrate; and increasing a pressure at the outside of the contacted substrate and auxiliary substrate to attach the substrate and the auxiliary substrate to each other by a pressure difference between the micro spaces and the outside of the contacted substrate and auxiliary substrate.
摘要翻译：一种制造工艺衬底的方法，包括：提供第一衬底; 提供衬底和辅助衬底; 在真空状态下使基板和辅助基板彼此接触，从而在基板和辅助基板之间形成真空状态的微空间; 并且增加接触的基板和辅助基板的外部的压力，以通过微空间与接触的基板和辅助基板的外部之间的压力差将基板和辅助基板彼此附接。

5. 发明申请

US20120268813A1 MASK FOR BLACK MATRIX 有权
标题翻译：掩蔽黑矩阵
公开(公告)号：US20120268813A1
公开(公告)日：2012-10-25
申请号：US13304020
申请日：2011-11-23
申请人： Jin-Pil Kim , Seung-Ryull Park , So-Young Noh , Jin-Bok Lee
发明人： Jin-Pil Kim , Seung-Ryull Park , So-Young Noh , Jin-Bok Lee
IPC分类号： G03B21/56
CPC分类号： G02F1/133512 , G02F2001/134372 , G03F1/144 , G03F1/36 , G03F1/50 , G03F7/70441
摘要： A mask for forming a black matrix for a display device that includes a data line having a bending structure with respect to a central portion of a pixel region includes a edge frame having a rectangular shape, and a base plate disposed on the edge frame and including a light-transmitting portion and a light-blocking portion, wherein the light-transmitting portion includes first light-transmitting patterns and light-controlling portions between adjacent first light-transmitting patterns, and the light-transmitting portion further includes a bending portion corresponding to the central portion of the pixel region, and wherein the bending portion is disposed with a same distance from the light-transmitting patterns adjacent thereto.
摘要翻译：用于形成用于显示装置的黑矩阵的掩模包括具有相对于像素区域的中心部分的弯曲结构的数据线，包括具有矩形形状的边缘框架和设置在边缘框架上的基板，并且包括光透射部分和遮光部分，其中透光部分包括第一透光图案和相邻的第一透光图案之间的光控制部分，并且透光部分还包括对应于像素区域的中心部分，并且其中弯曲部分设置成与与其相邻的透光图案相同的距离。

6. 发明申请

US20110247395A1 APPARATUS FOR COLLECTING GAS SAMPLE IN FOAM, AND ANALYSIS METHOD USING THE SAME 有权
标题翻译：用于收集泡沫中的气体样品的装置，以及使用其的分析方法
公开(公告)号：US20110247395A1
公开(公告)日：2011-10-13
申请号：US13139635
申请日：2009-12-15
申请人： Jin-Bok Lee , Jin-Seog Kim , Dong-Min Moon , Kwang-Sup Kim , Jeong-Soon Lee
发明人： Jin-Bok Lee , Jin-Seog Kim , Dong-Min Moon , Kwang-Sup Kim , Jeong-Soon Lee
IPC分类号： G01N7/00
CPC分类号： G01N7/14 , G01N1/22 , G01N1/286 , G01N2001/2866
摘要： Provided are an apparatus for collecting gas samples in a foam and an analysis method using the same, and more particularly, to an apparatus for collecting gas samples in a foam in which the foam is grinded, such that the gas sample in the foam may be effectively collected, and pressure before and after collection of the gas samples may be measured to thereby increase accuracy of gas analysis, such that characteristics of the foam may be more accurately evaluated, and an analysis method using the same.
摘要翻译：提供了一种用于收集泡沫中气体样品的装置和使用其的分析方法，更具体地，涉及一种用于收集泡沫中的气体样品的装置，其中泡沫体被研磨，使得泡沫中的气体样品可以是可以测量气体样品收集之前和之后的压力，从而提高气体分析的精度，从而可以更准确地评估泡沫的特性，以及使用其的分析方法。

7. 发明授权

US09057907B2 Mask for black matrix 有权
标题翻译：黑矩阵面具
公开(公告)号：US09057907B2
公开(公告)日：2015-06-16
申请号：US13304020
申请日：2011-11-23
申请人： Jin-Pil Kim , Seung-Ryull Park , So-Young Noh , Jin-Bok Lee
发明人： Jin-Pil Kim , Seung-Ryull Park , So-Young Noh , Jin-Bok Lee
IPC分类号： G02F1/1333 , G02F1/1343 , G03F1/00 , G06F17/50 , G02F1/1335 , G03F1/36 , G03F7/20
CPC分类号： G02F1/133512 , G02F2001/134372 , G03F1/144 , G03F1/36 , G03F1/50 , G03F7/70441
摘要： A mask for forming a black matrix for a display device that includes a data line having a bending structure with respect to a central portion of a pixel region includes a edge frame having a rectangular shape, and a base plate disposed on the edge frame and including a light-transmitting portion and a light-blocking portion, wherein the light-transmitting portion includes first light-transmitting patterns and light-controlling portions between adjacent first light-transmitting patterns, and the light-transmitting portion further includes a bending portion corresponding to the central portion of the pixel region, and wherein the bending portion is disposed with a same distance from the light-transmitting patterns adjacent thereto.
摘要翻译：用于形成用于显示装置的黑矩阵的掩模包括具有相对于像素区域的中心部分的弯曲结构的数据线，包括具有矩形形状的边缘框架和设置在边缘框架上的基板，并且包括光透射部分和遮光部分，其中透光部分包括第一透光图案和相邻的第一透光图案之间的光控制部分，并且透光部分还包括对应于像素区域的中心部分，并且其中弯曲部分设置成与与其相邻的透光图案相同的距离。

8. 发明授权

US08802464B2 Method of forming process substrate using thin glass substrate and method of fabricating flat display device using the same 有权
标题翻译：使用薄玻璃基板形成工艺基板的方法和使用其制造平面显示装置的方法
公开(公告)号：US08802464B2
公开(公告)日：2014-08-12
申请号：US13459781
申请日：2012-04-30
申请人： Jae-Won Lee , Ki-Yong Kim , Jae Young Oh , Yong-Su An , Sung-Ki Kim , Gi-Sang Hong , Jin-Bok Lee , Sang-Hyuk Won , Dong-Kyu Lee
发明人： Jae-Won Lee , Ki-Yong Kim , Jae Young Oh , Yong-Su An , Sung-Ki Kim , Gi-Sang Hong , Jin-Bok Lee , Sang-Hyuk Won , Dong-Kyu Lee
IPC分类号： H01L21/58
CPC分类号： G02F1/1303 , G02F2001/133354 , H01L27/1266
摘要： A method for fabricating a process substrate includes: providing a first substrate; providing a substrate and an auxiliary substrate; contacting the substrate and the auxiliary substrate with each other in a vacuum state, thereby forming micro spaces of a vacuum state between the substrate and the auxiliary substrate; and increasing a pressure at the outside of the contacted substrate and auxiliary substrate to attach the substrate and the auxiliary substrate to each other by a pressure difference between the micro spaces and the outside of the contacted substrate and auxiliary substrate.
摘要翻译：一种制造工艺衬底的方法，包括：提供第一衬底; 提供衬底和辅助衬底; 在真空状态下使基板和辅助基板彼此接触，从而在基板和辅助基板之间形成真空状态的微空间; 并且增加接触的基板和辅助基板的外部的压力，以通过微空间与接触的基板和辅助基板的外部之间的压力差将基板和辅助基板彼此附接。

9. 外观设计

USD621322S1 Windscreen wiper 有权
标题翻译：挡风玻璃刮水器
公开(公告)号：USD621322S1
公开(公告)日：2010-08-10
申请号：US29350598
申请日：2009-11-19
申请人： Sang-Cheol Lee , Jin-Bok Lee
设计人： Sang-Cheol Lee , Jin-Bok Lee

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