专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08057954B2 Membrane-electrode assembly including guard gasket 有权
标题翻译：膜 - 电极组件包括保护垫片
公开(公告)号：US08057954B2
公开(公告)日：2011-11-15
申请号：US12345311
申请日：2008-12-29
申请人： Hyoung-Juhn Kim , Jeung Woo Lee , Jong Hyung Jang , Eun Ae Cho , Sung Pil Yoon , Suk-woo Nam , In Hwan Oh , Seong Ahn Hong , Tae Hoon Lim
发明人： Hyoung-Juhn Kim , Jeung Woo Lee , Jong Hyung Jang , Eun Ae Cho , Sung Pil Yoon , Suk-woo Nam , In Hwan Oh , Seong Ahn Hong , Tae Hoon Lim
IPC分类号： H01M2/14 , H01M2/08 , H01M8/24
CPC分类号： H01M8/1004 , H01M8/0284 , H01M2008/1095 , H01M2300/0082 , Y02P70/56
摘要： Disclosed is a membrane-electrode assembly (MEA) that prevents an electrolyte membrane from being damaged upon the fabrication of a single cell or a stack of fuel cells. The MEA further includes a guard gasket interposed between conventional gaskets, wherein the guard gasket has a thickness corresponding to 70%-95% of the thickness of the electrolyte membrane. The MEA ensures mechanical protection of the electrolyte membrane, and thus prevents the electrolyte membrane from being damaged by an excessive binding pressure upon the fabrication of a single cell or a stack of fuel cells. Furthermore, the contact resistance between the electrolyte membrane and the catalyst layer and the contact resistance between the gas diffusion layer and the catalyst layer can be minimized, thereby improving the quality of a fuel cell.
摘要翻译：公开了一种膜 - 电极组件（MEA），其防止在单个电池或一堆燃料电池的制造时电解质膜被损坏。 MEA还包括插入传统垫圈之间的防护垫片，其中防护垫片具有对应于电解质膜厚度的70％-95％的厚度。 MEA确保电解质膜的机械保护，从而防止电解质膜在单个电池或一堆燃料电池的制造时被过大的结合压力损坏。此外，可以使电解质膜与催化剂层之间的接触电阻和气体扩散层与催化剂层之间的接触电阻最小化，从而提高燃料电池的质量。

2. 发明申请

US20080241627A1 Partially sulfonated polybenzimidazole based polymer, method for preparing the same, MEA for fuel cell using the polybenzimidazole based polymer and method for preparing the same 有权
标题翻译：部分磺化聚苯并咪唑类聚合物及其制备方法，使用聚苯并咪唑类聚合物的燃料电池用MEA及其制备方法
公开(公告)号：US20080241627A1
公开(公告)日：2008-10-02
申请号：US12004274
申请日：2007-12-19
申请人： Hyoung-Juhn Kim , Jeung Woo Lee , Tae-Hoon Lim , Suk Woo Nam , Seong-Ahn Hong , In-Hwan Oh , Hyung Chul Ham , Sang-Yeop Lee
发明人： Hyoung-Juhn Kim , Jeung Woo Lee , Tae-Hoon Lim , Suk Woo Nam , Seong-Ahn Hong , In-Hwan Oh , Hyung Chul Ham , Sang-Yeop Lee
IPC分类号： H01M8/10
CPC分类号： C08J5/2256 , C08G73/18 , C08J2379/04 , H01M8/103 , H01M8/1048 , H01M8/1072 , H01M2300/0082 , Y02P70/56
摘要： A partially sulfonated polybenzimidazole based polymer for fuel cell membrane is prepared by copolymerizing monomers of 3,3′-diaminobenzidine, isophthalic acid and 5-sulfoisophthalic acid to obtain a partially sulfonated polybenzimidazole, and doping the partially sulfonated polybenzimidazole with inorganic acid.
摘要翻译：通过共聚3,3'-二氨基联苯胺，间苯二甲酸和5-磺基间苯二甲酸的单体制备用于燃料电池膜的部分磺化的聚苯并咪唑基聚合物，以获得部分磺化的聚苯并咪唑，并用无机酸掺杂部分磺化的聚苯并咪唑。

3. 发明授权

US06841338B2 Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio 有权
标题翻译：光刻胶组合物和形成具有受控残留比的光致抗蚀剂图案的方法
公开(公告)号：US06841338B2
公开(公告)日：2005-01-11
申请号：US10173375
申请日：2002-06-17
申请人： Dae-youp Lee , Jeong-lim Nam , Do-yul Yoo , Jeung-woo Lee
发明人： Dae-youp Lee , Jeong-lim Nam , Do-yul Yoo , Jeung-woo Lee
IPC分类号： C08F212/14 , G03F1/14 , G03F7/004 , G03F7/039 , G03F7/30 , G03F7/32 , G03F7/40 , H01L21/027 , G03C5/00
CPC分类号： G03F7/0392 , G03F1/50
摘要： A photoresist composition may include formulas 1 and 2: where R is an acetal group or a ter-butyloxy carbonyl (t-BOC) group, n and m are integers, n/(m+n) is 0.01−0.8, and m/(m+n) is 1−[n/(m+n)], where r is an integer between 8-40. A method for forming photoresist patterns may include forming a photoresist layer on a semiconductor substrate and exposing and developing the photoresist layer using a mask pattern that includes first areas having a light transmissivity of about 100% and second areas having a light transmissivity of between about 10% and about 30%.
摘要翻译：光致抗蚀剂组合物可以包括式1和2：其中R是缩醛基或叔丁氧基羰基（t-BOC）基团，n和m是整数，n /（m + n）是0.01-0.8，m / （m + n）是1- [n /（m + n）]，其中r是8-40之间的整数。一种用于形成光致抗蚀剂图案的方法可以包括在半导体衬底上形成光致抗蚀剂层并曝光和显影光致抗蚀剂层，其使用包括具有约100％的光透射率的第一区域和具有约10％至约30％的透光率的第二区域的掩模图案。

4. 发明授权

US06571384B2 Method of forming fine patterns on semiconductor device 失效
标题翻译：在半导体器件上形成精细图案的方法
公开(公告)号：US06571384B2
公开(公告)日：2003-05-27
申请号：US09847290
申请日：2001-05-03
申请人： Hye-Soo Shin , Suk-Joo Lee , Jeung-Woo Lee , Dae-Youp Lee
发明人： Hye-Soo Shin , Suk-Joo Lee , Jeung-Woo Lee , Dae-Youp Lee
IPC分类号： G06F1750
CPC分类号： H01L21/32139 , Y10S438/975
摘要： A method of forming fine patterns in a semiconductor device through a double photo lithography process. A layer to be etched and a hard mask layer are sequentially formed on a semiconductor substrate. A first photo resist pattern is formed on the hard mask layer. A first hard mask layer pattern is formed by etching the hard mask layer using the first photo resist pattern. After the first photo resist pattern is removed, a second photo resist pattern is formed on the resultant structure. A second hard mask layer pattern is formed by etching the first hard mask layer pattern using the second photo resist pattern. The layer to be etched is then etched using the second hard mask layer pattern after the second photo resist pattern has been removed, resulting in patterns have line edges without rounding.
摘要翻译：一种通过双光刻工艺在半导体器件中形成精细图案的方法。在半导体衬底上依次形成待蚀刻的层和硬掩模层。第一光刻胶图案形成在硬掩模层上。通过使用第一光致抗蚀剂图案蚀刻硬掩模层来形成第一硬掩模层图案。在去除第一光致抗蚀剂图案之后，在所得结构上形成第二光致抗蚀剂图案。通过使用第二光刻胶图案蚀刻第一硬掩模层图案来形成第二硬掩模层图案。然后在去除第二光致抗蚀剂图案之后，使用第二硬掩模层图案蚀刻待蚀刻的层，导致图案具有没有圆化的线边。

5. 发明授权

US08293138B2 Partially sulfonated polybenzimidazole based polymer, method for preparing the same, MEA for fuel cell using the polybenzimidazole based polymer and method for preparing the same 有权
标题翻译：部分磺化聚苯并咪唑类聚合物及其制备方法，使用聚苯并咪唑类聚合物的燃料电池用MEA及其制备方法
公开(公告)号：US08293138B2
公开(公告)日：2012-10-23
申请号：US12004274
申请日：2007-12-19
申请人： Hyoung-Juhn Kim , Jeung Woo Lee , Tae-Hoon Lim , Suk Woo Nam , Seong-Ahn Hong , In-Hwan Oh , Hyung Chul Ham , Sang-Yeop Lee
发明人： Hyoung-Juhn Kim , Jeung Woo Lee , Tae-Hoon Lim , Suk Woo Nam , Seong-Ahn Hong , In-Hwan Oh , Hyung Chul Ham , Sang-Yeop Lee
IPC分类号： H01B1/12 , C08G73/06
CPC分类号： C08J5/2256 , C08G73/18 , C08J2379/04 , H01M8/103 , H01M8/1048 , H01M8/1072 , H01M2300/0082 , Y02P70/56
摘要： A partially sulfonated polybenzimidazole based polymer for fuel cell membrane is prepared by copolymerizing monomers of 3,3′-diaminobenzidine, isophthalic acid and 5-sulfoisophthalic acid to obtain a partially sulfonated polybenzimidazole, and doping the partially sulfonated polybenzimidazole with inorganic acid.
摘要翻译：通过共聚3,3'-二氨基联苯胺，间苯二甲酸和5-磺基间苯二甲酸的单体制备用于燃料电池膜的部分磺化的聚苯并咪唑基聚合物，以获得部分磺化的聚苯并咪唑，并用无机酸掺杂部分磺化的聚苯并咪唑。

6. 发明申请

US20100075202A1 MEMBRANE-ELECTRODE ASSEMBLY INCLUDING GUARD GASKET 有权
标题翻译：膜电极组件，包括护套垫圈
公开(公告)号：US20100075202A1
公开(公告)日：2010-03-25
申请号：US12345311
申请日：2008-12-29
申请人： Hyoung-Juhn Kim , Jeung Woo Lee , Jong Hyun Jang , Eun Ae Cho , Sung Pil Yoon , Suk-Woo Nam , In Hwan Oh , Seong Ahn Hong , Tae Hoon Lim
发明人： Hyoung-Juhn Kim , Jeung Woo Lee , Jong Hyun Jang , Eun Ae Cho , Sung Pil Yoon , Suk-Woo Nam , In Hwan Oh , Seong Ahn Hong , Tae Hoon Lim
IPC分类号： H01M4/00
CPC分类号： H01M8/1004 , H01M8/0284 , H01M2008/1095 , H01M2300/0082 , Y02P70/56
摘要： Disclosed is a membrane-electrode assembly (MEA) that prevents an electrolyte membrane from being damaged upon the fabrication of a single cell or a stack of fuel cells. The MEA further includes a guard gasket interposed between conventional gaskets, wherein the guard gasket has a thickness corresponding to 70%-95% of the thickness of the electrolyte membrane. The MEA ensures mechanical protection of the electrolyte membrane, and thus prevents the electrolyte membrane from being damaged by an excessive binding pressure upon the fabrication of a single cell or a stack of fuel cells. Furthermore, the contact resistance between the electrolyte membrane and the catalyst layer and the contact resistance between the gas diffusion layer and the catalyst layer can be minimized, thereby improving the quality of a fuel cell.
摘要翻译：公开了一种膜 - 电极组件（MEA），其防止在单个电池或一堆燃料电池的制造时电解质膜被损坏。 MEA还包括插入传统垫圈之间的防护垫片，其中防护垫片具有对应于电解质膜厚度的70％-95％的厚度。 MEA确保电解质膜的机械保护，从而防止电解质膜在单个电池或一堆燃料电池的制造时被过大的结合压力损坏。此外，可以使电解质膜与催化剂层之间的接触电阻和气体扩散层与催化剂层之间的接触电阻最小化，从而提高燃料电池的质量。

7. 发明授权

US06673706B2 Method of forming a pattern using a photoresist without exposing the photoresist and silicidation method incorporating the same 失效
标题翻译：使用光致抗蚀剂形成图案而不使光致抗蚀剂暴露的方法和包含该光致抗蚀剂的硅化方法
公开(公告)号：US06673706B2
公开(公告)日：2004-01-06
申请号：US10023982
申请日：2001-12-21
申请人： Ji-yong Yoo , Dae-youp Lee , Jeung-woo Lee , Suk-joo Lee , Jae-han Lee
发明人： Ji-yong Yoo , Dae-youp Lee , Jeung-woo Lee , Suk-joo Lee , Jae-han Lee
IPC分类号： H01L213205
CPC分类号： H01L21/0274 , G03F7/0035 , H01L21/76802 , H01L21/76829
摘要： A photoresist pattern is formed, without being exposed, by using photoresist having a residual layer proportion characteristic by which the photoresist dissolves at a suitable rate in a developing solution. First, a target layer to be patterned and a photoresist layer are sequentially formed on a substrate having a pattern that defines a step on the substrate. Some of the photoresist layer is treated with the developing solution, to thereby form a photoresist pattern whose upper surface is situated beneath the step and hence, exposes part of the target layer. Next, the exposed part of the target layer, and the photoresist pattern are removed. A silicidation process may be carried out thereafter on the area(s) from which the target layer has been removed. The method is relatively simple because it does not involve an exposure process. Furthermore, the method can be used to manufacture devices having very fine linewidths, i.e., a small design rule, because it is not subject to the misalignment errors which can occur during a conventional exposure process.
摘要翻译：通过使用具有残留层比例特性的光致抗蚀剂形成光致抗蚀剂图案，其中光致抗蚀剂以合适的速率溶解在显影溶液中。首先，在具有限定基板上的台阶的图案的基板上依次形成待图案化的目标层和光致抗蚀剂层。用显影液处理一些光致抗蚀剂层，从而形成上表面位于台阶之下的光致抗蚀剂图案，从而露出目标层的一部分。接下来，去除目标层的曝光部分和光刻胶图案。此后可以在去除了目标层的区域上进行硅化处理。该方法相对简单，因为它不涉及曝光过程。此外，该方法可以用于制造具有非常细线宽的装置，即小的设计规则，因为它不会受到常规曝光过程中可能发生的未对准误差的影响。

8. 发明申请

US20100279197A1 Membrane-electrode binder having dual electrode, method of manufacturing the binder, and fuel cell comprising the same 审中-公开
标题翻译：具有双电极的膜 - 电极粘合剂，粘合剂的制造方法和包含该粘合剂的燃料电池
公开(公告)号：US20100279197A1
公开(公告)日：2010-11-04
申请号：US12004273
申请日：2007-12-19
申请人： Hyoung-Juhn Kim , Jeung-woo Lee , Tae-Hoon Lim , Jonghee Han , Heung Yong Ha , Eun Ae Cho , Sung Pil Yoon
发明人： Hyoung-Juhn Kim , Jeung-woo Lee , Tae-Hoon Lim , Jonghee Han , Heung Yong Ha , Eun Ae Cho , Sung Pil Yoon
IPC分类号： H01M8/10 , H01M8/00
CPC分类号： H01M4/8657 , H01M4/8668 , H01M4/8807 , H01M4/881 , H01M4/8821 , H01M4/8828 , H01M4/921 , H01M4/926 , H01M8/0234 , H01M8/1004 , Y02P70/56
摘要： A membrane-electrode binder for a fuel cell, a method of manufacturing the binder, and a fuel cell comprising the binder are provided, in which the membrane-electrode binder comprises a dual electrode constituted by a first electrode and a second electrode in a two-layer form, and a polymer electrolyte membrane disposed on the dual electrode, the dual electrode comprising an electrode substrate and a catalyst layer formed thereon. In detail, the membrane-electrode binder comprises the dual electrode that is constituted by the first electrode obtained by using a PBI-based binder, the second electrode obtained by using a PTFE-based binder, and an inorganic acid doped PBI-based polymer electrolyte membrane disposed on the dual electrode and coming in contact with the first electrode. In the configuration of the dual electrode, the PBI-based binder used for manufacturing the first electrode contributes to enhancing an adhesive strength with the inorganic acid doped PBI-based polymer electrolyte membrane, and the PTFE-based binder used for manufacturing the second electrode contributes to suppressing the emission of an inorganic acid from the inorganic acid doped PBI-based polymer electrolyte membrane, together improving the performance of a fuel cell.
摘要翻译：提供了一种用于燃料电池的膜 - 电极粘合剂，粘合剂的制造方法和包含该粘合剂的燃料电池，其中，所述膜 - 电极接合剂包括由第一电极和第二电极构成的双电极并且设置在双电极上的聚合物电解质膜，所述双电极包括电极基板和形成在其上的催化剂层。详细地说，膜 - 电极粘合剂包括由通过使用基于PBI的粘合剂获得的第一电极，通过使用PTFE基粘合剂获得的第二电极和无机酸掺杂的PBI基聚合物电解质构成的双电极膜设置在双电极上并与第一电极接触。在双电极的结构中，用于制造第一电极的PBI基粘合剂有助于提高与无机酸掺杂的PBI基聚合物电解质膜的粘合强度，并且用于制造第二电极的PTFE基粘合剂有助于为了抑制无机酸掺杂的PBI系聚合物电解质膜的无机酸的排出，共同提高燃料电池的性能。

9. 发明授权

US07754398B2 Photo mask having assist pattern and method of fabricating the same 失效
标题翻译：具有辅助图案的光罩及其制造方法
公开(公告)号：US07754398B2
公开(公告)日：2010-07-13
申请号：US11821762
申请日：2007-06-25
申请人： Hee-bom Kim , Jeung-woo Lee , Sung-min Huh
发明人： Hee-bom Kim , Jeung-woo Lee , Sung-min Huh
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/28 , G03F1/36 , G03F1/46
摘要： A photomask has highly reliable assist patterns, and a method of fabricating the same is provided. The photomask includes a transparent substrate, circuit pattern and assist patterns. The circuit pattern recessed into the transparent substrate relative to a surface thereof has a first thickness, and assist patterns located adjacent to, and spaced apart from, the circuit pattern are recessed into the transparent substrate relative to the surface thereof while having a second thickness less than the first thickness.
摘要翻译：光掩模具有高度可靠的辅助图案，并且提供了其制造方法。光掩模包括透明基板，电路图案和辅助图案。相对于其表面凹入透明基板的电路图案具有第一厚度，并且邻近于电路图案并且与电路图案间隔开的辅助图案相对于其表面凹入到透明基板中，同时具有较小的第二厚度比第一厚度。

10. 发明申请

US20080090156A1 Photo mask having assist pattern and method of fabricating the same 失效
标题翻译：具有辅助图案的光罩及其制造方法
公开(公告)号：US20080090156A1
公开(公告)日：2008-04-17
申请号：US11821762
申请日：2007-06-25
申请人： Hee-Bom Kim , Jeung-woo Lee , Sung-min Huh
发明人： Hee-Bom Kim , Jeung-woo Lee , Sung-min Huh
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/28 , G03F1/36 , G03F1/46
摘要： A photomask has highly reliable assist patterns, and a method of fabricating the same is provided. The photomask includes a transparent substrate, circuit pattern and assist patterns. The circuit pattern recessed into the transparent substrate relative to a surface thereof has a first thickness, and assist patterns located adjacent to, and spaced apart from, the circuit pattern are recessed into the transparent substrate relative to the surface thereof while having a second thickness less than the first thickness.
摘要翻译：光掩模具有高度可靠的辅助图案，并且提供了其制造方法。光掩模包括透明基板，电路图案和辅助图案。相对于其表面凹入透明基板的电路图案具有第一厚度，并且邻近于电路图案并且与电路图案间隔开的辅助图案相对于其表面凹入到透明基板中，同时具有较小的第二厚度比第一厚度。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式