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    • 6. 发明授权
    • Method of reducing trapped holes induced by erase operations in the tunnel oxide of flash memory cells
    • 减少由闪存单元的隧道氧化物中的擦除操作引起的被捕获的空穴的方法
    • US06426898B1
    • 2002-07-30
    • US09797682
    • 2001-03-05
    • Andrei MihneaJeffrey KessenichChun Chen
    • Andrei MihneaJeffrey KessenichChun Chen
    • G11C700
    • G11C16/3409G11C16/16G11C16/3404G11C16/3445
    • A method of erasing memory cells in a flash memory device that recombines holes trapped in the tunnel oxide (after an erase operation) with electrons passing through the tunnel oxide is disclosed. The method uses an erase operation that over-erases all memory cells undergoing the erase operation. A cell healing operation is performed on the over-erased cells. The healing operation causes electrons to pass through the tunnel oxide and recombine with trapped holes. The recombination substantially reduces the trapped holes within the tunnel oxide without reducing the speed of the erase operation. Moreover, by reducing trapped holes, charge retention, overall performance and endurance of the flash memory cells are substantially increased.
    • 公开了一种擦除闪存器件中的存储单元的方法,该闪速存储器件将通过隧道氧化物的电子重新捕获隧道氧化物中的空穴(在擦除操作之后)。 该方法使用擦除操作,擦除所有进行擦除操作的存储单元。 对过度消耗的细胞进行细胞愈合操作。 愈合操作使电子通过隧道氧化物并与被捕获的孔重组。 该复合基本上减少了隧道氧化物内的被捕获的孔,而不降低擦除操作的速度。 此外,通过减少捕获的空穴,闪存单元的电荷保持率,总体性能和耐久性显着增加。